公开(公告)号：US07912359B2

公开(公告)日：2011-03-22

申请号：US11848359

申请日：2007-08-31

申请人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

发明人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

IPC分类号： F21V9/00 ,  F21V7/04

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H05B3/0047

摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.

摘要翻译： 一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜， 光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。 光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。 由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

公开(公告)号：US20080219650A1

公开(公告)日：2008-09-11

申请号：US11848359

申请日：2007-08-31

申请人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

发明人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

IPC分类号： F21V9/00

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H05B3/0047

摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.

摘要翻译： 一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜， 光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。 光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。 由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

公开(公告)号：US20090214193A1

公开(公告)日：2009-08-27

申请号：US12392481

申请日：2009-02-25

申请人： Shinji SUZUKI ,  Kyohei Seki ,  Tetsuya Kitagawa

发明人： Shinji SUZUKI ,  Kyohei Seki ,  Tetsuya Kitagawa

IPC分类号： F26B3/28

CPC分类号： H01L21/67115

摘要： A light emission type heating apparatus comprises a first lamp unit which includes two or more lamps, in which at least one of the lamps includes two or more filaments in its light emission bulb, and intensity of light emitted from each filament is independently controlled, and a second lamp unit which is made up of two or more lamps, and wherein the lamps of the first lamp unit are grouped, in each of which a filament of at least one of the lamps and a filament of another one of the lamps are arranged to form groups, wherein a temperature of the workpiece is detected, and electric power to be applied to each of the groups of filaments is controlled based on the detected temperature of the workpiece.

摘要翻译： 发光型加热装置包括：第一灯单元，其包括两个或更多个灯，其中至少一个灯在其发光灯泡中包括两根或更多根灯丝，并且独立地控制从每根灯丝发射的光的强度，以及 第二灯单元，其由两个或更多个灯组成，并且其中第一灯单元的灯分组，其中至少一个灯的灯丝和另一个灯的灯丝布置 以形成组，其中检测到工件的温度，并且基于检测到的工件温度来控制施加到每组长丝的电力。

公开(公告)号：US07700899B2

公开(公告)日：2010-04-20

申请号：US11565112

申请日：2006-11-30

申请人： Shinji Suzuki ,  Kyohei Seki

发明人： Shinji Suzuki ,  Kyohei Seki

IPC分类号： A21B1/00

CPC分类号： H05B3/0047 ,  H01L21/67115

摘要： To devise a heating device of the light irradiation type in which costs can reduced by reducing the number of filament lamps and current source parts without adversely affecting the illuminance distribution with respect to a wafer, in a heating device of the light irradiation type that has a light source part, in which several filament lamps are located parallel to one another, in which at least one of the filament lamps has several filaments which are located along the bulb axis are supplied with power individually to produce light which is irradiated from the light source parts onto an article to be treated, the distance between at least some of the adjacent filament lamps to one another is nonuniform.

摘要翻译： 为了设计光照射类型的加热装置，其中通过减少灯丝灯和电流源部件的数量而不会不利地影响相对于晶片的照度分布来降低成本，在具有 光源部分，其中几个白炽灯彼此平行地定位，其中至少一个灯丝灯具有沿着灯泡轴定位的几根灯丝被单独供应以产生从光源照射的光 部件到待处理的物品上，至少一些相邻的白炽灯彼此之间的距离是不均匀的。

公开(公告)号：US07756403B2

公开(公告)日：2010-07-13

申请号：US11536057

申请日：2006-09-28

申请人： Kyohei Seki ,  Shinji Suzuki ,  Yoichi Mizukawa

发明人： Kyohei Seki ,  Shinji Suzuki ,  Yoichi Mizukawa

IPC分类号： A45D20/40

CPC分类号： H01L21/67115

摘要： A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value of the local physical property of the article to be treated, the emissivity distribution is obtained and the distribution pattern of the light intensity on the article to be treated is determined. According to this light intensity pattern, the individual intensity of the light emitted from respective light emitting parts of lamp units of the heating device are determined beforehand. According to this determined result, the intensity of the light emitted from the respective light emitting parts of the lamp units are controlled individually, and thus, the article to be treated is irradiated with light.

摘要翻译： 即使在待处理物品的不对称物理性质的情况下也可以进行均匀加热，或者可以进行加热，使得制品在热处理后获得所需的物理性质的光照射加热过程。 根据待处理物品的局部物理性质的测定值，得到辐射率分布，并确定待处理物品上光强度的分布格局。 根据该光强度图案，预先确定从加热装置的灯单元的各个发光部分发射的光的单独强度。 根据该确定结果，单独控制从灯单元的各个发光部分发射的光的强度，从而照射待处理的物品。

公开(公告)号：US07656079B2

公开(公告)日：2010-02-02

申请号：US11362788

申请日：2006-02-28

申请人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

发明人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

IPC分类号： H01K9/00

CPC分类号： H01K7/00 ,  H01K9/08 ,  H01L21/67115 ,  H05B3/0033 ,  H05B2203/032

摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.

摘要翻译： 即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中， 设备是可能的。 加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

公开(公告)号：US20060197454A1

公开(公告)日：2006-09-07

申请号：US11362788

申请日：2006-02-28

申请人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

发明人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

IPC分类号： H01J13/46

CPC分类号： H01K7/00 ,  H01K9/08 ,  H01L21/67115 ,  H05B3/0033 ,  H05B2203/032

摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.

摘要翻译： 即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中， 设备是可能的。 加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

公开(公告)号：US5677113A

公开(公告)日：1997-10-14

申请号：US436679

申请日：1995-05-08

申请人： Shinji Suzuki ,  Kyohei Seki ,  Nobutoshi Ebashi ,  Tetsuji Arai

发明人： Shinji Suzuki ,  Kyohei Seki ,  Nobutoshi Ebashi ,  Tetsuji Arai

IPC分类号： G03F7/42 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311

CPC分类号： G03F7/42 ,  H01L21/31138

摘要： The object of the invention is to provide an ashing method and an asher in order to avoid damage to semiconductor components occurring during ashing of a photoresist resin film by active oxygen plasma and to avoid a long treatment time occurring in an ashing method using a low pressure mercury discharge lamp. According to the invention, this object is achieved by a method and an apparatus for ashing a photoresist resin film. In the method, a wafer provided with a photoresist resin film is placed in an ozone-containing atmosphere. An activated oxygen is produced through the radiation light of a discharge lamp, which emits a continuous spectrum in a wavelength range of 200 to 300 nm. The photoresist resin film is ashed by the activated oxygen.

摘要翻译： 本发明的目的是提供一种灰化方法和灰化装置，以避免对通过活性氧等离子体在光致抗蚀剂树脂膜进行灰化期间发生的半导体成分的损坏，并且避免在使用低压的灰化方法中发生长时间的处理时间 汞放电灯。 根据本发明，通过用于灰化光致抗蚀剂树脂膜的方法和设备来实现该目的。 在该方法中，将设置有光致抗蚀剂树脂膜的晶片放置在含臭氧气氛中。 通过放电灯的放射线产生活化氧，其在200〜300nm的波长范围内发射连续的光谱。 光致抗蚀剂树脂膜被活化的氧气脱落。

公开(公告)号：US20080237501A1

公开(公告)日：2008-10-02

申请号：US12055361

申请日：2008-03-26

申请人： Tomonao Hosokai ,  Kazuhiko Horioka ,  Hiroshi Mizokoshi ,  Takuma Yokoyama ,  Kyohei Seki

发明人： Tomonao Hosokai ,  Kazuhiko Horioka ,  Hiroshi Mizokoshi ,  Takuma Yokoyama ,  Kyohei Seki

IPC分类号： G01J3/10

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.

摘要翻译： 高温等离子体原料（21）通过用第一能量束（23）照射而气化。 当气化原料到达放电区域时，在电极（11,12）和第二能量束（24）照射之间施加脉冲功率。 以这种方式，等离子体被加热和激发并发生EUV发射。 发射的EUV发射由EUV收集器光学器件收集和提取。 由于第一和第二能量束（23,24）的照射，可以将高温等离子体原料浓度的特殊分布设定为规定的分布，并且可以设定排出通道的位置的分界。 此外，可以通过提供在EUV辐射发射条件下，放电路径中的离子密度几乎与离子密度相同的原料气体来延长极紫外发射的脉冲。

公开(公告)号：US07622727B2

公开(公告)日：2009-11-24

申请号：US11617163

申请日：2006-12-28

申请人： Takahiro Shirai ,  Kyohei Seki

发明人： Takahiro Shirai ,  Kyohei Seki

IPC分类号： H01J7/36 ,  H05H1/00

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G21K2201/065 ,  H05G2/003 ,  H05G2/005

摘要： An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics. Between them, an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with a laser. Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

摘要翻译： 具有腔室的EUV辐射源装置，其被分成放电空间和设置有EUV收集器光学器件的收集器反射镜空间。 在它们之间提供了具有被冷却的开口的孔部件。 旋转第一放电电极和第二放电电极。 用激光照射Sn或Li。 在第一和第二放电电极之间施加脉冲功率以在两个电极之间形成高密度和高温等离子体，从而发射波长为13.5nm的EUV辐射，由EUV收集器光学器件聚焦并被引导到辐照 曝光工具的光学系统。 存在用于泵送放电空间和收集器反射镜空间的第一泵送装置和第二泵送装置。 放电空间保持在几Pa，收集器反射镜空间保持在几百Pa。