公开(公告)号：US06405583B1

公开(公告)日：2002-06-18

申请号：US09296081

申请日：1999-04-21

申请人： Yoshiharu Shirakawabe ,  Hiroshi Takahashi ,  Nobuhiro Shimizu ,  Takehiro Yamaoka

发明人： Yoshiharu Shirakawabe ,  Hiroshi Takahashi ,  Nobuhiro Shimizu ,  Takehiro Yamaoka

IPC分类号： G01B528

CPC分类号： G01Q40/02

摘要： A correlation sample of scanning probe microscope enable to detect correctly each force performing as a standard without influence of irregular data of surface of the sample. Photo-resist film is applied on surface of a silicon substrate, and the resist mask is patterned. Hollow portions having vertical wall face are formed at the silicon substrate by carrying out anisotropic etching using the resist mask for etching mask. After that, metal is deposited from upper side of resist mask by deposition method, the metal upper than the resist mask by lift off process is removed, and a correlation sample in which the metal is buried in the hollow portions of the silicon substrate is formed. Surface of the sample can be flattened by coating DLC film on surface of the correlation sample.

摘要翻译： 扫描探针显微镜的相关样本能够正确地检测作为标准执行的每个力而不影响样品表面的不规则数据。 将光刻胶膜施加在硅衬底的表面上，并对抗蚀剂掩模进行图案化。 通过使用蚀刻掩模用抗蚀剂掩模进行各向异性蚀刻，在硅基板上形成具有垂直壁面的中空部分。 之后，通过沉积法从抗蚀剂掩模的上侧沉积金属，去除通过剥离处理而比抗蚀剂掩模上方的金属，并且形成金属被埋在硅衬底的中空部分中的相关样品 。 样品的表面可以通过在相关样品的表面上涂覆DLC膜而变平。

公开(公告)号：US06941798B2

公开(公告)日：2005-09-13

申请号：US10663302

申请日：2003-09-16

申请人： Takehiro Yamaoka ,  Kazutoshi Watanabe ,  Kazunori Ando ,  Yoshiharu Shirakawabe

发明人： Takehiro Yamaoka ,  Kazutoshi Watanabe ,  Kazunori Ando ,  Yoshiharu Shirakawabe

IPC分类号： G01Q10/02 ,  G01Q10/06 ,  G01Q60/24 ,  G01Q60/50 ,  G01Q90/00 ,  G01N13/10 ,  G01B5/28 ,  G01N13/16 ,  G12B21/24

CPC分类号： G01Q70/04 ,  G01Q10/065 ,  Y10S977/85

摘要： A scanning probe is microscope has a cantilever having a probe at a disal end thereof and an oscillator for generating a resonance signal near a resonance of the cantilever. A vibrating device receives the resonance signal as a driving signal for vibrating the cantilever. A variable gain amplifier adjusts a gain of displacement signal corresponding to displacement of the vibrating cantilever so as to satisfy the equation G=(A/A0)*G0 to control a quality factor value of the cantilever resonance to an optimal quality factor value, where G represents a gain value of the variable gain amplifer, A represents a preselected oscillation amplitude of the oscillator, A0 represents an initial oscillation amplitude of the oscillator, and G0 represents a gain value of the variable gain amplifier when the initial oscillation amplitude of the oscillator is A0.

摘要翻译： 扫描探针是显微镜，具有在其末端具有探针的悬臂和用于在悬臂共振附近产生共振信号的振荡器。 振动装置接收谐振信号作为振动悬臂的驱动信号。 可变增益放大器调整与振动悬臂的位移相对应的位移信号的增益，以满足等式G =（A / A 0 ）* G 0 < 悬臂共振的质量因子值到最优质量因子值，其中G表示可变增益放大器的增益值，A表示振荡器的预选振荡幅度，A <0>表示初始振荡 当振荡器的初始振荡幅度为A <0> 0时，振荡器的振幅和G 0 <0>表示可变增益放大器的增益值。

公开(公告)号：US06596992B2

公开(公告)日：2003-07-22

申请号：US10017123

申请日：2001-12-14

申请人： Kazunori Ando ,  Kazutoshi Watanabe ,  Yoshiteru Shikakura ,  Masaki Tsuchihashi ,  Takehiro Yamaoka

发明人： Kazunori Ando ,  Kazutoshi Watanabe ,  Yoshiteru Shikakura ,  Masaki Tsuchihashi ,  Takehiro Yamaoka

IPC分类号： G21K700

CPC分类号： G01Q60/32 ,  G01Q10/06 ,  G01Q20/02 ,  Y10S977/851

摘要： In the first operation, the cantilever is oscillated at a frequency which is at opposite sides of a frequency band having a half value of an oscillation frequency f and amplitude A on a dependent curve (Q-curve). The cantilever oscillating frequency is far from an oscillation frequency (near a resonance point) where the cantilever is slow to damp, which enables the cantilever to quickly damp in accordance with a variation of a transient oscillation frequency after the probe comes into contact with the specimen, and allows the probe to follow the uneven surface state of the specimen.

摘要翻译： 在第一操作中，悬臂以相对曲线（Q曲线）上具有振荡频率f的一半值和振幅A的频带的相反侧的频率振荡。 悬臂振荡频率远离振动频率（接近谐振点），其中悬臂缓慢减震，这使得悬臂能够在探头与试样接触后根据瞬态振荡频率的变化迅速衰减 ，并且允许探针跟随样本的不平坦表面状态。

公开(公告)号：US4874460A

公开(公告)日：1989-10-17

申请号：US272017

申请日：1988-11-16

申请人： Yoshitomo Nakagawa ,  Takehiro Yamaoka

发明人： Yoshitomo Nakagawa ,  Takehiro Yamaoka

IPC分类号： G03F1/74 ,  H01J37/305

CPC分类号： G03F1/74 ,  H01J37/3056

摘要： Apparatus for modifying a patterned film, composed of an ion source for producing an ion beam which is focused and caused to impinge upon a sample to microscopically machine a small region upon the surface of the sample; scanning electrodes and a scanning control cirucit for scanning the focused ion beam; a detector that detects the secondary charged particles emanating from the sample in response to the irradiation; and a display device for displaying the pattern formed upon the sample according to the output from the detector. The apparatus further includes a nozzle for spraying etching gas against only a certain portion of the pattern when the focused ion beam is caused to fall upon the certain portion of the pattern, the gas being activated by the ion beam and capable of etching the material of the film upon which the pattern is formed. The focused ion beam that irradiates and scans the sample is not permitted to move from one spot to a neighboring spot until a given period of time elapses. Thus, a desired portion of the patterned film is rapidly and cleanly removed while minimizing the amount of the etching gas admitted into the apparatus.

摘要翻译： 用于修改图案化膜的装置，其由用于产生离子束的离子源组成，所述离子源被聚焦并被撞击在样品上以在样品的表面上显微加工小区域; 扫描电极和用于扫描聚焦离子束的扫描控制电路; 检测器，其响应于照射而检测从样品发出的次级带电粒子; 以及显示装置，用于根据检测器的输出显示形成在样本上的图案。 该设备还包括一个喷嘴，用于当聚焦离子束落在图案的某一部分上时，仅对图案的某一部分喷涂蚀刻气体，该气体被离子束激活并且能够蚀刻 形成图案的薄膜。 照射和扫描样品的聚焦离子束不允许从一个点移动到相邻点，直到给定的时间段过去。 因此，图案化膜的期望部分被快速且干净地去除，同时使进入设备的蚀刻气体的量最小化。