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81 条记录 (耗时 0.028 秒)

    Non-treatment type planographic printing plate materials
    1.
    发明授权
    Non-treatment type planographic printing plate materials 失效
    非处理型平版印刷版材料

    公开(公告)号：US4197124A

    公开(公告)日：1980-04-08

    申请号：US875708

    申请日：1978-02-06

    申请人： Tomoaki Ikeda ,  Yuzo Mizobuchi ,  Fumiaki Shinozaki ,  Akira Nahara ,  Yoshihiro Ono ,  Yasuo Washizawa ,  Satoshi Yoshida ,  Takeshi Tomotsu

    发明人： Tomoaki Ikeda ,  Yuzo Mizobuchi ,  Fumiaki Shinozaki ,  Akira Nahara ,  Yoshihiro Ono ,  Yasuo Washizawa ,  Satoshi Yoshida ,  Takeshi Tomotsu

    IPC分类号： G03C1/705 ,  G03C1/76 ,  G03F7/02

    CPC分类号： G03C1/705 ,  Y10S430/133

    摘要： A planographic printing plate material comprising a support and a light sensitive layer provided on the support, the light-sensitive layer being composed of (A) an inorganic material; (B) at least one metal and/or metal compound [(A)/(B) are capable of reacting with each other upon application of electromagnetic radiation] and (C) an organic compound capable of affecting the reaction between the inorganic material (A) and the metal and/or metal compound (B), wherein the inorganic material (A), the metal or metal compound (B), and the organic compound (C) are in contact with each other. When the light-sensitive layer is exposed to electromagnetic radiation, a difference in the hydrophilic or oleophilic nature of the exposed areas and the unexposed areas results, whereby a planographic printing plate is obtained which can be mounted on a printing machine and printed without any other treatments.

    摘要翻译： 平版印刷版材料，其包含支撑体和设置在所述载体上的感光层，所述感光层由（A）无机材料构成; （B）至少一种金属和/或金属化合物[（A）/（B））在施加电磁辐射时能够彼此反应]和（C）能够影响无机材料 A）和金属和/或金属化合物（B），其中无机材料（A），金属或金属化合物（B）和有机化合物（C）彼此接触。 当感光层暴露于电磁辐射时，导致曝光区域和未曝光区域的亲水或亲油性质的差异，由此得到平版印刷版，其可以安装在印刷机上并且没有任何其它印刷 治疗。

    Image forming materials and image forming process
    3.
    发明授权
    Image forming materials and image forming process 失效
    成像材料及成像工艺

    公开(公告)号：US4198237A

    公开(公告)日：1980-04-15

    申请号：US26713

    申请日：1979-04-03

    申请人： Akira Nahara ,  Yoshihiro Ono ,  Tomizo Namiki ,  Shigeo Harada ,  Yuzo Mizobuchi ,  Tomoaki Ikeda

    发明人： Akira Nahara ,  Yoshihiro Ono ,  Tomizo Namiki ,  Shigeo Harada ,  Yuzo Mizobuchi ,  Tomoaki Ikeda

    IPC分类号： G03C1/705 ,  G03C1/48 ,  G03F7/02

    CPC分类号： G03C1/705

    摘要： An image forming material comprising a support having thereon a layer composed of a Ge--S composition or a Ge--S--X composition wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, In, Se, Te, Fe, I, P and O which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light wherein the Ge--S or Ge--S--X composition layer has a thickness of at least about 300A and contains therein at least one element selected from the group consisting of Ag, Cu and Pb in an amount of more than 2 atoms of Ag, Cu and/or Pb based on 100 atoms of the Ge--S composition or the Ge--S--X composition.

    摘要翻译： 一种成像材料，其包含其上具有由Ge-S组合物或Ge-SX组合物构成的层的载体，其中X表示选自Al，Si，Mg，Ti，V，Mn，Co中的至少一种元素 ，Ni，Sn，Zn，Pd，In，Se，Te，Fe，I，P和O，其经历结构变化，其能够在曝光成像时以光学，电学或化学方式被检测，其中Ge-S或Ge-SX 组成层具有至少约300A的厚度，并且其中含有至少一种选自Ag，Cu和Pb中的至少一种元素，其量为基于100原子的Ag，Cu和/或Pb多于2个原子 Ge-S组成或Ge-SX组成。

    Image forming materials and image forming process
    4.
    发明授权
    Image forming materials and image forming process 失效
    成像材料及成像工艺

    公开(公告)号：US4286045A

    公开(公告)日：1981-08-25

    申请号：US94618

    申请日：1979-11-15

    申请人： Akira Nahara ,  Yoshihiro Ono ,  Tomizo Namiki ,  Shigeo Harada ,  Yuzo Mizobuchi ,  Tomoaki Ikeda

    发明人： Akira Nahara ,  Yoshihiro Ono ,  Tomizo Namiki ,  Shigeo Harada ,  Yuzo Mizobuchi ,  Tomoaki Ikeda

    IPC分类号： G03C5/56 ,  G03C1/705 ,  G03C1/72 ,  G03C5/00 ,  G03F7/02 ,  G03C1/00

    CPC分类号： G03C1/705

    摘要： An image forming material comprising a support having thereon a layer composed of a Ge-S composition or a Ge-S-X composition wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, In, Se, Te, Fe, I, P and O which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light wherein the Ge-S or Ge-S-X composition layer has a thickness of at least about 300 A and contains therein at least one element selected from the group consisting of Ag, Cu and Pb in an amount of more than 2 atoms of Ag, Cu and/or Pb based on 100 atoms of the Ge-S composition or the Ge-S-X composition.

    摘要翻译： 一种成像材料，其包含其上具有由Ge-S组合物或Ge-SX组合物构成的层的载体，其中X表示选自Al，Si，Mg，Ti，V，Mn，Co中的至少一种元素 ，Ni，Sn，Zn，Pd，In，Se，Te，Fe，I，P和O，其经历结构变化，其能够在曝光成像时以光学，电学或化学方式被检测，其中Ge-S或Ge-SX 组成层具有至少约300的厚度，并且其中含有选自Ag，Cu和Pb中的至少一种元素，其量大于2原子的Ag，Cu和/或Pb，基于100原子的 Ge-S组合物或Ge-SX组合物。

    Dot-etching solution
    6.
    发明授权
    Dot-etching solution 失效
    点刻蚀溶液

    公开(公告)号：US4124516A

    公开(公告)日：1978-11-07

    申请号：US817475

    申请日：1977-07-20

    申请人： Fumiaki Shinozaki ,  Tomoaki Ikeda ,  Yasuo Washizawa ,  Sho Nakao

    发明人： Fumiaki Shinozaki ,  Tomoaki Ikeda ,  Yasuo Washizawa ,  Sho Nakao

    IPC分类号： G03C5/38 ,  B41C1/02 ,  C23F1/20 ,  G03F7/00 ,  C09K13/04

    CPC分类号： B41C1/025 ,  C23F1/20

    摘要： A dot-etching solution for dot-etching a halftone image of a metal composed mainly of aluminum, the dot-etching solution comprising(1) water,(2) (a) phosphorous acid or (b) phosphorous acid and phosphoric acid,(3) at least one of a bismuth compound and an antimony compound, and(4) at least one compound selected from hydrogen chloride, an alkali metal chloride, calcium chloride and magnesium chloride.

    摘要翻译： 用于对主要由铝构成的金属的半色调图像进行点蚀刻的点蚀刻溶液，所述点蚀刻溶液包含（1）水，（2）（A）磷酸或（B）磷酸和磷酸（ 3）至少一种双胺化合物和抗微生物化合物，和（4）至少一种选自氯化物，碱金属氯化物，氯化钙和氯化镁的化合物。

    Light-sensitive photopolymerizable composition
    7.
    发明授权
    Light-sensitive photopolymerizable composition 失效
    光敏光聚合组合物

    公开(公告)号：US4386153A

    公开(公告)日：1983-05-31

    申请号：US240433

    申请日：1981-03-04

    申请人： Fumiaki Shinozaki ,  Yasuo Washizawa ,  Tomoaki Ikeda ,  Sho Nakao ,  Syunichi Kondoh

    发明人： Fumiaki Shinozaki ,  Yasuo Washizawa ,  Tomoaki Ikeda ,  Sho Nakao ,  Syunichi Kondoh

    IPC分类号： C08F2/00 ,  C08F2/50 ,  G03F7/031 ,  H01L21/027 ,  G03C1/68

    CPC分类号： G03F7/031 ,  Y10S430/12 ,  Y10S430/124

    摘要： A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the following general formula (d) and 2-[4-(substituted amino)cinnamoyl]naphthalenes represented by the following general formula (e): ##STR1## wherein R and R', which may be the same or different, each represents a methyl group or an ethyl group, and R.sup.0 represents a hydrogen atom, a hydroxy group, a --CR.sup.1 R.sup.2 R.sup.3 group, where R.sup.1, R.sup.2 and R.sup.3, which may be the same or different, each represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, or an --OR.sup.4 group, where R.sup.4 represents an alkyl group having 1 to 5 carbon atoms.

    摘要翻译： 一种包含可加成聚合的烯属不饱和双键的化合物和光聚合引发剂的感光性组合物，其包含（1）选自由以下的化合物组成的组中的至少一种化合物：苯并蒽酮，取代的苯并蒽酮（其取代基包括卤素原子， 至5个碳原子和具有1至5个碳原子的烷氧基），1,2-苯并蒽醌和取代的苯并蒽醌（其取代基包括卤素原子，具有1至5个碳原子的烷基和具有1至5个碳原子的烷氧基）和 （2）选自由以下通式（a）表示的4,4'-二取代氨基 - 二苯甲酮，由以下通式（b）表示的对取代氨基 - 苯甲醛衍生物， ，由以下通式（c）表示的2-（对取代氨基 - 苯基）-1,3-二氧戊环，4,4'-双（取代氨基）-N-亚苄基苯胺r （d）和由下列通式（e）表示的2- [4-（取代氨基）肉桂酰基]萘表示：（a）图像（c）（c） （e）其中R和R'可以相同或不同，表示甲基或乙基，R 0表示氢原子，羟基，-CR 1 R 2 R 3 基团，其中可以相同或不同的R 1，R 2和R 3各自表示氢原子或具有1至3个碳原子的烷基或-OR 4基团，其中R 4表示具有1至5个碳原子的烷基 原子