公开(公告)号：US20100246934A1

公开(公告)日：2010-09-30

申请号：US12738760

申请日：2008-10-22

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Hideki Mori

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G01N21/9503 ,  H01L22/12

摘要： An inspection apparatus of a disk-shaped substrate able to precisely quantitatively inspect positions of formation of film layers formed on the surface of a disk-shaped substrate is provided, that is, an inspection apparatus of a disk-shaped substrate on which film layers are formed designed to generate captured image data expressing a captured image corresponding to a field of view based on image signals successively output from an image capturing unit capturing an image of a predetermined surface at an outer circumference part of the disk-shaped substrate and to generate film layer edge position information Y4E24 (θ) expressing longitudinal direction positions at corresponding positions (θ) along the circumferential direction of an edge line E24 of a film layer image part ISa (24) corresponding to the film layer 24 on the surface image ISa with reference to, from the captured image data, longitudinal direction positions YE15aL (θ) at the different positions (θ) along the circumferential direction of a boundary line E15a between a surface image part ISa corresponding to the predetermined surface on the captured image and its outer image part IBKL.

摘要翻译： 提供了能够精确地定量检查形成在盘状基板的表面上的膜层的形成位置的盘状基板的检查装置，即，其中膜层为 被形成为基于从在盘状基板的外周部分捕获预定表面的图像的图像捕获单元连续输出的图像信号生成表示与视场相对应的拍摄图像的拍摄图像数据，并且生成胶片 沿着与表面图像ISa上的薄膜层24相对应的薄膜层图像部分ISa（24）的边缘线E24的圆周方向的相应位置（＆amp;θ）表示纵向位置的层边缘位置信息Y4E24（＆ 参考来自拍摄图像数据的不同位置处的纵向位置YE15aL（＆amp; tas）沿着与捕获图像上的预定表面相对应的表面图像部分ISa与其外部图像部分IBKL之间的边界线E15a的圆周方向。

公开(公告)号：US08488867B2

公开(公告)日：2013-07-16

申请号：US12738760

申请日：2008-10-22

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Hideki Mori

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G01N21/9503 ,  H01L22/12

摘要： An inspection apparatus to precisely quantitatively inspect positions of formation of film layers formed on the surface of a disk-shaped substrate. It generates captured image data expressing a captured image corresponding to a field of vie based on image signals successively output from an image capturing unit capturing an image of a predetermined surface at an outer circumference part of the disk-shaped substrate and generates film layer edge position information expressing longitudinal direction positions at corresponding positions along the circumferential direction of an edge line of a film layer image pan corresponding to the film layer on the surface image with reference to, from the captured image data, longitudinal direction positions at the different positions along the circumferential direction of a boundary line between a surface image part corresponding to the predetermined surface on the captured image and its outer image part.

摘要翻译： 一种精确定量检查形成在盘状基板的表面上的膜层的形成位置的检查装置。 基于在从圆盘状基板的外周部拍摄预定面的图像的图像拍摄单元连续地输出的图像信号，生成表示对应于视野的拍摄图像的拍摄图像数据，并且生成胶片层边缘位置 参照来自拍摄图像数据的沿着沿着图像数据的不同位置的纵向位置的表面图像上对应于胶片层的胶片层图像的边缘线的圆周方向的相应位置处的纵向位置的信息， 在与捕获图像上的预定表面相对应的表面图像部分与其外部图像部分之间的边界线的圆周方向。

公开(公告)号：US08700498B2

公开(公告)日：2014-04-15

申请号：US12745384

申请日：2008-12-01

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori

IPC分类号： G06Q10/00

CPC分类号： G01N21/9501 ,  G06K9/469

摘要： A feature analysis apparatus which enables visual confirmation of features of an inspected object and which enables limitations on the degree of freedom of classification based on the features to made relatively smaller is provided. It acquires inspected object information of an inspected object (S1), analyzes the inspection information to determine values of feature parameters of each of the plurality of layers (S2 to S5), uses values of the plurality of feature parameters and their corresponding directions for each of the plurality of layers to generate a single parameter vector (S2 to S5), converts the parameter vector to a layer vector which is a 3D vector in a predetermined (S2 to S5), and couples the plurality of layer vectors obtained for the plurality of layers in the order of the layers and generates a set of coordinate values of the plurality of nodes obtained in the 3D space as feature information of the inspected object (S6).

摘要翻译： 本发明提供一种特征分析装置，其能够可视化地确认被检查物体的特征，并且能够基于特征相对较小地限制分类的自由度。 获取检查对象的被检查对象信息（S1），分析检查信息以确定多个层中的每个层的特征参数的值（S2至S5），使用多个特征参数的值及其对应的每个 以生成单个参数向量（S2至S5），将参数矢量转换为预定（S2至S5）中的3D矢量的层向量，并且将获得的多个层向量耦合到多个 并且生成在3D空间中获得的多个节点的一组坐标值作为被检查对象的特征信息（S6）。

公开(公告)号：US08508246B2

公开(公告)日：2013-08-13

申请号：US12745377

申请日：2008-11-18

申请人： Hiroshi Wakaba ,  Yoshinori Hayashi ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori ,  Shozo Kawasaki

发明人： Hiroshi Wakaba ,  Yoshinori Hayashi ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori ,  Shozo Kawasaki

IPC分类号： G01R31/01 ,  G01R31/00 ,  G01R31/308 ,  G01R31/28

CPC分类号： G01R31/2887 ,  G01N21/9501 ,  G01R31/2886 ,  G01R31/2891 ,  H01L21/6776 ,  H01L21/68728 ,  H01L22/12

摘要： A substrate surface inspection apparatus and method enabling judgment and analysis of the state of even portions of a substrate supported by supports using a captured image are provided. A support mechanism 20 is used where positions of arrangement of substrate support positions along the direction perpendicular to a scan direction by a plurality of first supports 23a to 23d are set outside the image capturing ranges of the substrate 10 by the imaging units 30a, 30b at the first relative position and inside the common image capturing range and where positions of arrangement of substrate support positions along the direction perpendicular to the scan direction by the plurality of second supports 24a to 24d are set outside the image capturing ranges of the substrate by the imaging units at the second relative position and inside the common image capturing range. The surface of the substrate 10 supported by the plurality of first supports is scanned and captured by the imaging units at the first relative position, the imaging units are moved to the second relative position, then the surface of the substrate 10 supported by the plurality of second supports is scanned and captured by the imaging units at the second relative position.

摘要翻译： 提供了一种能够使用拍摄图像判断和分析由支撑体支撑的基板的均匀部分的状态的基板表面检查装置和方法。 使用支撑机构20，其中通过多个第一支撑件23a至23d沿着垂直于扫描方向的方向的基板支撑位置的位置由成像单元30a，30b设置在基板10的图像捕获范围的外侧 第一相对位置和公共图像捕获范围内，并且通过多个第二支撑件24a至24d沿着垂直于扫描方向的方向的基板支撑位置的位置被设置在基板的图像捕获范围的外部，通过成像 单位在第二相对位置和公共图像捕获范围内。 由多个第一支撑体支撑的基板10的表面由成像单元在第一相对位置被扫描和捕获，成像单元移动到第二相对位置，然后由多个第一相对位置支撑的基板10的表面 成像单元在第二相对位置扫描和捕获第二支撑。

公开(公告)号：US08497985B2

公开(公告)日：2013-07-30

申请号：US12738768

申请日：2008-10-22

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Masao Kawamura ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Masao Kawamura ,  Hideki Mori

IPC分类号： G01N21/00 ,  G01J4/00

CPC分类号： G01N21/9503 ,  G01N21/21

摘要： A method of inspection and inspection apparatus able to use a captured image to more precisely inspect the state of film, defect parts, etc. at a surface of an object under inspection are provided.A method of inspection and inspection apparatus illuminating a surface of an object under inspection 10 by white light from an illumination unit LO while scanning the surface of the object under inspection 10 by an image capturing unit 100 to acquire a captured image and using the captured image to inspect a state of the surface of the object under inspection 10, which changes a state of polarization of light LR striking the image capturing unit 100 from an illuminated location of the object under inspection 10 and obtains a plurality of captured images based on light of different polarization states LR striking the image capturing unit 100.

摘要翻译： 提供一种能够使用拍摄图像更精确地检查被检查物体的表面处的膜，缺陷部分等的状态的检查和检查装置的方法。 一种检查和检查设备的方法，其通过由照明单元LO的白光照射被检查物体的表面，同时通过图像捕获单元100扫描被检查物体10的表面，以获取捕获的图像并使用捕获的图像 检查检查对象物10的表面状态，该状态改变从被检查对象物10的照明位置撞击到摄像单元100的光LR的偏振状态，并根据 不同的极化状态LR撞击图像拍摄单元100。

公开(公告)号：US20100310152A1

公开(公告)日：2010-12-09

申请号：US12745377

申请日：2008-11-18

申请人： Hiroshi Wakaba ,  Yoshinori Hayashi ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori ,  Shozo Kawasaki

发明人： Hiroshi Wakaba ,  Yoshinori Hayashi ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori ,  Shozo Kawasaki

IPC分类号： G06K9/00 ,  H04N7/18

CPC分类号： G01R31/2887 ,  G01N21/9501 ,  G01R31/2886 ,  G01R31/2891 ,  H01L21/6776 ,  H01L21/68728 ,  H01L22/12

摘要： A substrate surface inspection apparatus and method enabling judgment and analysis of the state of even portions of a substrate supported by supports using a captured image are provided. A support mechanism 20 is used where positions of arrangement of substrate support positions along the direction perpendicular to a scan direction by a plurality of first supports 23a to 23d are set outside the image capturing ranges of the substrate 10 by the imaging units 30a, 30b at the first relative position and inside the common image capturing range and where positions of arrangement of substrate support positions along the direction perpendicular to the scan direction by the plurality of second supports 24a to 24d are set outside the image capturing ranges of the substrate by the imaging units at the second relative position and inside the common image capturing range. The surface of the substrate 10 supported by the plurality of first supports is scanned and captured by the imaging units at the first relative position, the imaging units are moved to the second relative position, then the surface of the substrate 10 supported by the plurality of second supports is scanned and captured by the imaging units at the second relative position.

摘要翻译： 提供了一种能够使用拍摄图像判断和分析由支撑体支撑的基板的均匀部分的状态的基板表面检查装置和方法。 使用支撑机构20，其中通过多个第一支撑件23a至23d沿着垂直于扫描方向的方向的基板支撑位置的位置由成像单元30a，30b设置在基板10的图像捕获范围的外侧 第一相对位置和公共图像捕获范围内，并且通过多个第二支撑件24a至24d沿着垂直于扫描方向的方向的基板支撑位置的位置被设置在基板的图像捕获范围的外部，通过成像 单位在第二相对位置和公共图像捕获范围内。 由多个第一支撑体支撑的基板10的表面由成像单元在第一相对位置被扫描和捕获，成像单元移动到第二相对位置，然后由多个第一相对位置支撑的基板10的表面 成像单元在第二相对位置扫描和捕获第二支撑。

公开(公告)号：US20100310150A1

公开(公告)日：2010-12-09

申请号：US12745384

申请日：2008-12-01

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Koichi Miyazono ,  Yoko Ono ,  Hideki Mori

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G06K9/469

摘要： A feature analysis apparatus which enables visual confirmation of features of an inspected object and which enables limitations on the degree of freedom of classification based on the features to made relatively smaller is provided. It acquires inspected object information of an inspected object (S1), analyzes the inspection information to determine values of feature parameters of each of the plurality of layers (S2 to S5), uses values of the plurality of feature parameters and their corresponding directions for each of the plurality of layers to generate a single parameter vector (S2 to S5), converts the parameter vector to a layer vector which is a 3D vector in a predetermined (S2 to S5), and couples the plurality of layer vectors obtained for the plurality of layers in the order of the layers and generates a set of coordinate values of the plurality of nodes obtained in the 3D space as feature information of the inspected object (S6).

摘要翻译： 本发明提供一种特征分析装置，其能够可视化地确认被检查物体的特征，并且能够基于特征相对较小地限制分类自由度。 获取检查对象的被检查对象信息（S1），分析检查信息以确定多个层中的每个层的特征参数的值（S2至S5），使用多个特征参数的值及其对应的每个 以生成单个参数向量（S2至S5），将参数矢量转换为预定（S2至S5）中的3D矢量的层向量，并且将获得的多个层向量耦合到多个 并且生成在3D空间中获得的多个节点的一组坐标值作为被检查对象的特征信息（S6）。

公开(公告)号：US20100245810A1

公开(公告)日：2010-09-30

申请号：US12738768

申请日：2008-10-22

申请人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Masao Kawamura ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hiroshi Wakaba ,  Yoko Ono ,  Koichi Miyazono ,  Masao Kawamura ,  Hideki Mori

IPC分类号： G01N21/01

CPC分类号： G01N21/9503 ,  G01N21/21

摘要： A method of inspection and inspection apparatus able to use a captured image to more precisely inspect the state of film, defect parts, etc. at a surface of an object under inspection are provided.A method of inspection and inspection apparatus illuminating a surface of an object under inspection 10 by white light from an illumination unit LO while scanning the surface of the object under inspection 10 by an image capturing unit 100 to acquire a captured image and using the captured image to inspect a state of the surface of the object under inspection 10, which changes a state of polarization of light LR striking the image capturing unit 100 from an illuminated location of the object under inspection 10 and obtains a plurality of captured images based on light of different polarization states LR striking the image capturing unit 100.

摘要翻译： 提供一种能够使用拍摄图像更精确地检查被检查物体的表面处的膜，缺陷部分等的状态的检查和检查装置的方法。 一种检查和检查设备的方法，其通过由照明单元LO的白光照射被检查物体的表面，同时通过图像捕获单元100扫描被检查物体10的表面，以获取捕获的图像并使用捕获的图像 检查检查对象物10的表面状态，该状态改变从被检查对象物10的照明位置撞击到摄像单元100的光LR的偏振状态，并根据 不同的极化状态LR撞击图像拍摄单元100。

公开(公告)号：US08433102B2

公开(公告)日：2013-04-30

申请号：US12086081

申请日：2006-12-05

申请人： Yoshinori Hayashi ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Hideki Mori

IPC分类号： G06K9/00

CPC分类号： G01B11/303 ,  G01N21/9501

摘要： [Problem] To provide a surface roughness inspection system enabling suitable inspection even when the surface of the object being inspected is curved.[Means for Solution] A system having an imaging unit 20 having a line sensor 22 and scanning the surface of an object being inspected 101 in a direction perpendicular to the direction of extension of the line sensor 22 and outputting a density signal for each pixel from the line sensor 22 and a processing unit 50 processing the density signal from the line sensor 22 of the imaging unit 20, the processing unit 50 having a means for acquiring a pixel density value based on a density signal from the line sensor 22 (S2) and a density state generating means for generating a density state information Pf showing the density state in the scan direction of the object surface based on all of the pixel density values acquired for the object surface 101 being inspected (S7).

摘要翻译： [问题]提供一种表面粗糙度检查系统，即使被检查物体的表面弯曲，也能够进行适当的检查。 [解决方案]具有成像单元20的系统具有线传感器22，并且在垂直于线传感器22的延伸方向的方向上扫描被检查物体101的表面，并输出每个像素的浓度信号 线传感器22和处理单元50处理来自成像单元20的线传感器22的浓度信号，处理单元50具有用于基于来自线传感器22的密度信号获取像素密度值的装置（S2） 密度状态产生装置，用于基于对被检测物体表面101获得的所有像素密度值，生成表示物体表面的扫描方向上的浓度状态的浓度状态信息Pf（S7）。

公开(公告)号：US08023111B2

公开(公告)日：2011-09-20

申请号：US12595699

申请日：2008-04-25

申请人： Yoshinori Hayashi ,  Masao Kawamura ,  Hideki Mori

发明人： Yoshinori Hayashi ,  Masao Kawamura ,  Hideki Mori

IPC分类号： G01N21/88

CPC分类号： G01N21/9503

摘要： A semiconductor wafer inspection apparatus for inspecting an outer circumference edge part of a semiconductor wafer. The apparatus has a camera lens arranged facing an outer circumference edge part of a semiconductor wafer, an imaging surface arranged facing an outer circumference end face of a semiconductor wafer via the camera lens, a mirror forming an image of a first outer circumference bevel surface of the semiconductor wafer on the imaging surface via the camera lens, a mirror forming an image of a second outer circumference bevel surface of the semiconductor wafer on the imaging surface via the camera lens, a correction lens forming an image of an outer circumference end face of the semiconductor wafer on the imaging surface via the center part of the camera lens, and an illumination light guide lamp part illuminating the surfaces. With use of the apparatus the first outer circumference bevel surface and second outer circumference bevel surface become brighter compared with the outer circumference end face.

摘要翻译： 一种用于检查半导体晶片的外周边缘部分的半导体晶片检查装置。 该装置具有面向半导体晶片的外周缘部的相机透镜，经由照相机透镜与半导体晶片的外周端面相对配置的摄像面，形成第一外周斜面的图像的反射镜 通过照相机镜头在成像表面上的半导体晶片，通过照相机镜头在成像表面上形成半导体晶片的第二外圆周斜面的图像的镜;校正透镜，其形成外周端面的图像 通过照相机镜头的中心部分的成像表面上的半导体晶片和照亮该表面的照明光导灯部分。 通过使用该装置，与外周端面相比，第一外周斜面和第二外圆周斜面变得更亮。