摘要:
A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of a projection optical system. When executed, the medium causes a computer to execute the steps of dividing an effective light source into the plurality of areas, generating, for each of the plurality of areas, a plurality of shifted pupil functions by shifting a pupil function in accordance with a position of each of divided point sources, defining, for each of the plurality of areas, a matrix including the plurality of pupil functions, calculating, for each of the plurality of areas, eigenvalues and eigenfunctions by performing singular value decomposition of the matrix, and calculating, for each of the plurality of areas, the light intensity distribution based on a diffracted light distribution from the mask and the eigenvalues and the eigenfunctions.
摘要:
A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of a projection optical system. When executed, the medium causes a computer to execute the steps of dividing an effective light source into the plurality of areas, generating, for each of the plurality of areas, a plurality of shifted pupil functions by shifting a pupil function in accordance with a position of each of divided point sources, defining, for each of the plurality of areas, a matrix including the plurality of pupil functions, calculating, for each of the plurality of areas, eigenvalues and eigenfunctions by performing singular value decomposition of the matrix, and calculating, for each of the plurality of areas, the light intensity distribution based on a diffracted light distribution from the mask and the eigenvalues and the eigenfunctions.
摘要:
A luminance signal generating apparatus including a first CCD device, and a second CCD device disposed at a position obliquely displaced relative to a spatial position of the first CCD device, an interpolating circuit for interpolating an output from the second CCD device. A low band luminance signal generating circuit generates a low band luminance signal on the basis of an output from the interpolating circuit. A high band luminance signal generating circuit generates a high band luminance signal on the basis of output signals from the first and second CCD devices and the interpolation signal from the interpolating circuit. A luminance signal generating circuit generates a luminance signal on the basis of the low band luminance signal and the high band luminance signal from the low band luminance signal generating circuit and the high band luminance generating circuit.
摘要:
An exposure apparatus which exposes a substrate with exposure light, includes a projection optical system which projects a pattern image of an original onto the substrate; a first illumination unit which illuminates the original with the exposure light; and a second illumination unit which guides illumination light that is different from the exposure light for exposing the substrate to the projection optical system, the second illumination unit includes a modifier which modifies an illumination distribution of the illumination light entering an optical element near a pupil of the projection optical system and an optical element which is the closest to the original in the projection optical system.
摘要:
There is provided an interferometer for measuring a surface shape of an optical element using interference, including a reference wave-front generating unit for generating a reference wave front for measuring the surface shape, which is provided in a target optical path, and includes an Alvarez lens.
摘要:
A projection optical system for projecting a pattern of a first object onto a second object. The projection optical system includes a field stop provided to an optical element in the projection optical system, which is closest to the second object. The field stop is provided for shielding the outside of a pattern projected area on the second object.
摘要:
A pattern monitoring method for an exposure apparatus that includes an optical modulator having at least one element that provides incident light with plural phase differences, and a projection optical system that uses first diffracted light among lights exited from the optical modulator to project a pattern onto an object to be exposed includes the steps of detecting second diffracted light having an order different from that of the first diffracted light among the lights exited from the optical modulator, and obtaining a state of the pattern projected onto the object based on a detection result by the detecting step.
摘要:
A phase type computer hologram has a plurality of cells for applying a predetermined phase to different portions of a wavefront of light, wherein no phase skip larger than &pgr; is present in the cells. Such a phase type computer hologram can be produced by a process of determining phases for a plurality of cells, respectively, smoothening a distribution of the phases of the cells, by shifting the phase of at least one of the cells by 2&pgr;, and forming, on a substrate, the cells whose phase distribution is smoothened in the smoothening step.
摘要:
A projection optical system having a multilayered film mirror arranged to provide an approximately uniform reflectance throughout a predetermined light incidence angle range to thereby assure a desired optical performance. A projection exposure apparatus having such a projection optical system, and a device manufacturing method using such an exposure apparatus. A non-periodic film is used in a reflection multilayered film upon a mirror having a largest light incidence angle range or a mirror having a largest average of light incidence angle, and this effectively reduces a pupil transmittance distribution in the projection optical system.
摘要:
An optical unit includes a first optical element and a second optical element, wherein the first optical element has a protrusion while the second optical element has a recess. The relative alignment between the first and second optical elements is accomplished by engagement of the protrusion and the recess.