METHOD FOR DEPOSITING CUBIC BORON NITRIDE THIN FILM
    1.
    发明申请
    METHOD FOR DEPOSITING CUBIC BORON NITRIDE THIN FILM 审中-公开
    沉积CIBIC BORON NITRIDE THIN FILM的方法

    公开(公告)号:US20110223332A1

    公开(公告)日:2011-09-15

    申请号:US13047405

    申请日:2011-03-14

    IPC分类号: C23C16/00 C23C14/35

    CPC分类号: C23C14/0647 C23C14/067

    摘要: The present invention relates to a method for depositing a cBN thin film on a substrate to obtain an abrasive material by physical vapor deposition carried out under an atmosphere composed of an inert gas and hydrogen. The abrasive produced by the inventive method comprises the cBN thin film attached firmly to the substrate, which has excellent hardness and durability.

    摘要翻译: 本发明涉及一种在基板上沉积cBN薄膜的方法,通过在由惰性气体和氢气组成的气氛下进行物理气相沉积来获得研磨材料。 通过本发明方法制造的磨料包括牢固地附着到基底上的cBN薄膜,其具有优异的硬度和耐久性。

    PLASMA DEPOSITION APPARATUS AND METHOD
    2.
    发明申请
    PLASMA DEPOSITION APPARATUS AND METHOD 有权
    等离子体沉积装置和方法

    公开(公告)号:US20090127102A1

    公开(公告)日:2009-05-21

    申请号:US11953348

    申请日:2007-12-10

    IPC分类号: C23C14/32

    CPC分类号: H01J37/3497 H01J37/3435

    摘要: A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk.

    摘要翻译: 等离子体沉积装置包括阴极组件,其包括阴极盘和支撑阴极盘的水冷阴极保持器,阳极组件,其包括水冷阳极保持器,安装在阳极保持器上用作阳极的衬底和 安装和支撑基板的基板支架,以及用于在真空状态下在阴极组件和阳极组件的相对表面之间施加电位差以形成原始气体的等离子体的反应器。 阴极盘使用自重和真空吸收力中的至少一种与阴极保持器热接触,以允许阴极盘的热膨胀。