公开(公告)号：US20130128362A1

公开(公告)日：2013-05-23

申请号：US13813063

申请日：2011-07-29

申请人： Young Min Song ,  Yong Tak Lee

发明人： Young Min Song ,  Yong Tak Lee

IPC分类号： G02B1/11 ,  H01L21/302 ,  H01L33/44

CPC分类号： G02B1/11 ,  B82Y20/00 ,  G02B1/118 ,  H01L21/302 ,  H01L33/44

摘要： A micro/nano combined structure, a manufacturing method of a micro/nano combined structure, and a manufacturing method of an optical device having a micro/nano combined structure integrated therewith, the method comprising: forming a micro structure on a substrate; depositing a metal thin film on the substrate on which the micro structure is formed; heat treating and transforming the metal thin film into metal particles; and using the metal particles as a mask to form a non-reflective nanostructure having a frequency below that of light wavelengths and a sharp wedge-shaped end, on the top surface of the substrate on which the micro structure is formed, and etching the front surface of the substrate on which the micro structure is formed. The manufacturing process is simple, light reflectivity that occurs wherein a difference in refractive indices of air and semiconductor material can be minimized, and is easily applied to the optical device field.

摘要翻译： 微/纳组合结构，微/纳组合结构的制造方法和与其结合的微/纳组合结构的光学器件的制造方法，所述方法包括：在衬底上形成微结构; 在其上形成有微结构的基板上沉积金属薄膜; 将金属薄膜热处理和转化为金属颗粒; 并且在其上形成微结构的基板的顶表面上使用金属颗粒作为掩模以形成具有低于光波长和尖锐楔形端的频率的非反射纳米结构，并且蚀刻前面 其上形成有微结构的基板的表面。 制造工艺简单，发生光反射率，其中空气和半导体材料的折射率差可以最小化，并且容易应用于光学器件领域。

公开(公告)号：US09123832B2

公开(公告)日：2015-09-01

申请号：US13702172

申请日：2010-11-30

申请人： Chan Il Yeo ,  Yong Tak Lee ,  Young Min Song

发明人： Chan Il Yeo ,  Yong Tak Lee ,  Young Min Song

IPC分类号： H01L21/00 ,  H01L33/00 ,  B81C1/00 ,  H01L33/22

CPC分类号： H01L33/005 ,  B81C1/00031 ,  H01L33/22

摘要： A method of fabricating nanostructure for antireflection and a method of fabricating a photo device integrated with the nanostructure for antireflection are provided. The fabrication of the nanostructure for antireflection includes coating a solution containing a combination of metal ions with organic or inorganic ions on a substrate, sintering the coated solution using an annealing process to grow nanoscale metal particles, and chemically etching the substrate using the metal particles as mask or accelerator to form a subwavelength nanostructure on the surface of the substrate, thereby manufacturing the nanostructure for antireflection without an apparatus requiring a vacuum state using a simple method for a short amount of time to minimize reflection of light at an interface between a semiconductor material and the air, and producing a photo device having good luminous efficiency and performance at low cost in large quantities by applying it to the photo device.

摘要翻译： 提供一种制造用于抗反射的纳米结构的方法，以及制造与纳米结构集成的光反射装置的方法。 用于抗反射的纳米结构的制造包括将包含金属离子与有机或无机离子的组合的溶液涂布在基板上，使用退火工艺烧结涂覆的溶液以生长纳米级金属颗粒，以及使用金属颗粒化学蚀刻基板作为 掩模或加速剂以在衬底的表面上形成亚波长纳米结构，由此制造用于抗反射的纳米结构，而无需使用简单方法在短时间内需要真空状态的装置，以使半导体材料之间的界面处的光的反射最小化 和空气，并且通过将其应用于照相装置，以大量的方式生产具有良好的发光效率和性能的照相装置。

公开(公告)号：US20130078750A1

公开(公告)日：2013-03-28

申请号：US13702172

申请日：2010-11-30

申请人： Chan Il Yeo ,  Yong Tak Lee ,  Young Min Song

发明人： Chan Il Yeo ,  Yong Tak Lee ,  Young Min Song

IPC分类号： H01L33/00

CPC分类号： H01L33/005 ,  B81C1/00031 ,  H01L33/22

摘要： A method of fabricating nanostructure for antireflection and a method of fabricating a photo device integrated with the nanostructure for antireflection are provided. The fabrication of the nanostructure for antireflection includes coating a solution containing a combination of metal ions with organic or inorganic ions on a substrate, sintering the coated solution using an annealing process to grow nanoscale metal particles, and chemically etching the substrate using the metal particles as mask or accelerator to form a subwavelength nanostructure on the surface of the substrate, thereby manufacturing the nanostructure for antireflection without an apparatus requiring a vacuum state using a simple method for a short amount of time to minimize reflection of light at an interface between a semiconductor material and the air, and producing a photo device having good luminous efficiency and performance at low cost in large quantities by applying it to the photo device.

摘要翻译： 提供一种制造用于抗反射的纳米结构的方法，以及制造与纳米结构集成的光反射装置的方法。 用于抗反射的纳米结构的制造包括将包含金属离子与有机或无机离子的组合的溶液涂布在基板上，使用退火工艺烧结涂覆的溶液以生长纳米级金属颗粒，以及使用金属颗粒化学蚀刻基板作为 掩模或加速剂以在衬底的表面上形成亚波长纳米结构，由此制造用于抗反射的纳米结构，而无需使用简单方法在短时间内需要真空状态的装置，以使半导体材料之间的界面处的光的反射最小化 和空气，并且通过将其应用于照相装置，以大量的方式生产具有良好的发光效率和性能的照相装置。

公开(公告)号：US08647903B2

公开(公告)日：2014-02-11

申请号：US12999148

申请日：2009-12-22

申请人： Yong Tak Lee ,  Young Min Song

发明人： Yong Tak Lee ,  Young Min Song

IPC分类号： H01L21/00

CPC分类号： G02B5/1857 ,  G03F7/0005

摘要： A method of fabricating an antireflective grating pattern and a method of fabricating an optical device integrated with an antireflective grating pattern are provided. The method of fabricating the antireflective grating pattern includes forming a photoresist (PR) pattern on a substrate using a hologram lithography process, forming a PR lens pattern having a predetermined radius of curvature by reflowing the PR pattern, and etching the entire surface of the substrate including the PR lens pattern to form a wedge-type or parabola-type antireflective subwavelength grating (SWG) pattern having a pointed tip on a top surface of the substrate. In this method, a fabrication process is simplified, the reflection of light caused by a difference in refractive index between the air and a semiconductor material can be minimized, and the antireflective grating pattern can be easily applied to optical devices.

摘要翻译： 提供了制造抗反射光栅图案的方法和制造与抗反射光栅图案集成的光学器件的方法。 制造抗反射光栅图案的方法包括使用全息光刻工艺在基板上形成光致抗蚀剂（PR）图案，通过回流PR图案形成具有预定曲率半径的PR​​透镜图案，并蚀刻基板的整个表面 包括PR透镜图案以形成在基板的顶表面上具有尖尖的楔形或抛物线型抗反射亚波长光栅（SWG）图案。 在该方法中，简化了制造工艺，可以将由空气和半导体材料之间的折射率差引起的光的反射最小化，并且可以将抗反射光栅图案容易地应用于光学器件。

公开(公告)号：US20130087194A1

公开(公告)日：2013-04-11

申请号：US13703702

申请日：2011-07-29

申请人： Sung Jun Jang ,  Yong Tak Lee ,  Young Min Song

发明人： Sung Jun Jang ,  Yong Tak Lee ,  Young Min Song

IPC分类号： G02B1/11 ,  H01L31/028 ,  H01L31/18 ,  H01L31/032 ,  H01L31/0272 ,  H01L31/0296 ,  H01L31/0216 ,  H01L31/0368

CPC分类号： G02B1/11 ,  G02B1/115 ,  H01L31/0216 ,  H01L31/02168 ,  H01L31/0272 ,  H01L31/0284 ,  H01L31/0296 ,  H01L31/0322 ,  H01L31/03685 ,  H01L31/075 ,  H01L31/18 ,  Y02E10/548

摘要： The present invention relates to a silicon multilayer anti-reflective film with a gradually varying refractive index and a manufacturing method therefor, and a solar cell having the same and a manufacturing method therefor, wherein: the refractive index of a silicon thin film is adjusted by depositing silicon on a semiconductor or glass substrate with a slight tilt; and an anti-reflective film with a gradually varying refractive index is implemented using a silicon multi-layer film in which multi-layer film are stacked with different tilt angles. In addition, the silicon multilayer anti-reflective film according to the present invention is applied to a silicon solar cell, thereby suppressing reflection in the inside of the solar cell and providing an excellent heat radiation characteristic using a high heat transfer coefficient.

摘要翻译： 本发明涉及一种具有逐渐变化的折射率的硅多层抗反射膜及其制造方法及其制造方法及其制造方法，其特征在于：将硅薄膜的折射率调整为 在半导体或玻璃基板上以轻微的倾斜沉积硅; 并且使用其中多层膜以不同的倾斜角度层叠的硅多层膜来实现具有逐渐变化的折射率的抗反射膜。 此外，将本发明的硅多层抗反射膜应用于硅太阳能电池，由此抑制太阳能电池内部的反射，并且使用高的传热系数提供优异的散热特性。

公开(公告)号：US20110092007A1

公开(公告)日：2011-04-21

申请号：US12999148

申请日：2009-12-22

申请人： Yong Tak Lee ,  Young Min Song

发明人： Yong Tak Lee ,  Young Min Song

IPC分类号： H01L33/44 ,  G03F7/00

CPC分类号： G02B5/1857 ,  G03F7/0005

摘要： A method of fabricating an antireflective grating pattern and a method of fabricating an optical device integrated with an antireflective grating pattern are provided. The method of fabricating the antireflective grating pattern includes forming a photoresist (PR) pattern on a substrate using a hologram lithography process, forming a PR lens pattern having a predetermined radius of curvature by reflowing the PR pattern, and etching the entire surface of the substrate including the PR lens pattern to form a wedge-type or parabola-type antireflective subwavelength grating (SWG) pattern having a pointed tip on a top surface of the substrate. In this method, a fabrication process is simplified, the reflection of light caused by a difference in refractive index between the air and a semiconductor material can be minimized, and the antireflective grating pattern can be easily applied to optical devices.

摘要翻译： 提供了制造抗反射光栅图案的方法和制造与抗反射光栅图案集成的光学器件的方法。 制造抗反射光栅图案的方法包括使用全息光刻工艺在基板上形成光致抗蚀剂（PR）图案，通过回流PR图案形成具有预定曲率半径的PR​​透镜图案，并蚀刻基板的整个表面 包括PR透镜图案以形成在基板的顶表面上具有尖尖的楔形或抛物线型抗反射亚波长光栅（SWG）图案。 在该方法中，简化了制造工艺，可以将由空气和半导体材料之间的折射率差引起的光的反射最小化，并且可以将抗反射光栅图案容易地应用于光学器件。