摘要:
There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.
摘要:
There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.
摘要:
An apparatus and method of doping ions into a substrate are disclosed and include a process chamber having an inner space in which an ion implantation process is performed, a support unit positioned in the process chamber, supporting a substrate and being electrically connected to a first power source for generating a high frequency pulse, a conductive unit separated from the support unit in such a manner that plasma associated with the ion implantation process is generated between the support unit and the conductive unit, wherein the conductive unit comprises a first etch prevention member preventing the conductive unit from being etched by a source gas used to generate the plasma, and a power port electrically connected to a second power source and generating radio frequency (RF) power applied to the conductive unit.
摘要:
A system and method for displaying font in a wireless telephone. The system and method employ the operations of converting base font data into converted font data, wherein the converted font data has a data bits equal in number to data bits of a background screen into which the converted font data will be transcribed; generating a mask for the converted font data; storing the converted font data and the mask in a memory of the wireless telephone; retrieving the mask stored in the memory. The system and method further employ the operations of executing an AND operation to logically AND the retrieved mask and the background screen to generate; a background screen base; retrieving the converted font data stored in the memory; executing an AND operation to logically AND the retrieved font data and a color data, thereby coloring the converted font data which are white data; and executing an OR operation to logically OR the background screen base and the colored converted font data in order to display a character on the background screen.