Movable inclination-angle measuring apparatus for ion beam, and method of use
    1.
    发明申请
    Movable inclination-angle measuring apparatus for ion beam, and method of use 失效
    用于离子束的可移动倾角测量装置及其使用方法

    公开(公告)号:US20050247889A1

    公开(公告)日:2005-11-10

    申请号:US11115848

    申请日:2005-04-26

    申请人: Young-Ha Yoon

    发明人: Young-Ha Yoon

    IPC分类号: H01J37/30 G01J1/00 G01N23/00

    摘要: There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.

    摘要翻译: 提供了可以测量点离子束或带状离子束的倾斜角度的可移动离子束倾角测量装置。 该装置从离子注入装置的离子供给单元沿X轴方向设置。 该装置包括具有用于接收离子束的离子束接收装置的离子电流测量单元,并且具有用于测量由接收的离子束感应的离子电流的离子电流测量部。 该装置还包括角度调节单元,其适于调节离子束接收装置绕Y轴和/或Z轴的接收角度,以及适于将离子束接收装置移动到Z轴的位置调整单元 方向。 通过倾斜角度计算单元,使用根据离子束的接收角度的调整来测量的离子电流的变化来计算倾斜角度。

    Ion implanter with etch prevention member(s)
    2.
    发明授权
    Ion implanter with etch prevention member(s) 有权
    具有防蚀蚀部件的离子注入机

    公开(公告)号:US07560712B2

    公开(公告)日:2009-07-14

    申请号:US11845187

    申请日:2007-08-27

    IPC分类号: H01J37/317 H01J37/305

    摘要: An apparatus and method of doping ions into a substrate are disclosed and include a process chamber having an inner space in which an ion implantation process is performed, a support unit positioned in the process chamber, supporting a substrate and being electrically connected to a first power source for generating a high frequency pulse, a conductive unit separated from the support unit in such a manner that plasma associated with the ion implantation process is generated between the support unit and the conductive unit, wherein the conductive unit comprises a first etch prevention member preventing the conductive unit from being etched by a source gas used to generate the plasma, and a power port electrically connected to a second power source and generating radio frequency (RF) power applied to the conductive unit.

    摘要翻译: 公开了将离子掺杂到衬底中的装置和方法,并且包括具有进行离子注入工艺的内部空间的处理室,位于处理室中的支撑单元,支撑衬底并与第一电力电连接 源,用于产生高频脉冲,导电单元与支撑单元分离,使得在支撑单元和导电单元之间产生与离子注入工艺相关联的等离子体,其中导电单元包括防止 导电单元被用于产生等离子体的源气体进行蚀刻,以及电连接到第二电源并产生施加到导电单元的射频(RF)功率的电源端口。

    System and method for displaying font in a wireless telephone
    3.
    发明授权
    System and method for displaying font in a wireless telephone 有权
    用于在无线电话中显示字体的系统和方法

    公开(公告)号:US06940510B2

    公开(公告)日:2005-09-06

    申请号:US10606807

    申请日:2003-06-27

    IPC分类号: H04B1/40 G09G5/24 H04M1/725

    摘要: A system and method for displaying font in a wireless telephone. The system and method employ the operations of converting base font data into converted font data, wherein the converted font data has a data bits equal in number to data bits of a background screen into which the converted font data will be transcribed; generating a mask for the converted font data; storing the converted font data and the mask in a memory of the wireless telephone; retrieving the mask stored in the memory. The system and method further employ the operations of executing an AND operation to logically AND the retrieved mask and the background screen to generate; a background screen base; retrieving the converted font data stored in the memory; executing an AND operation to logically AND the retrieved font data and a color data, thereby coloring the converted font data which are white data; and executing an OR operation to logically OR the background screen base and the colored converted font data in order to display a character on the background screen.

    摘要翻译: 一种用于在无线电话中显示字体的系统和方法。 该系统和方法采用将基本字体数据转换成转换后的字体数据的操作,其中转换后的字体数据具有数字位数等于背景屏幕的数据位,转换后的字体数据将被转录到数据位; 生成用于转换的字体数据的掩码; 将转换的字体数据和掩码存储在无线电话的存储器中; 检索存储在存储器中的掩码。 该系统和方法进一步采用执行AND运算的操作来逻辑地与所检索的掩码和背景屏幕进行生成; 背景屏幕底座; 检索存储在存储器中的转换后的字体数据; 执行AND运算以逻辑地对所检索的字体数据和颜色数据进行AND操作,由此对作为白色数据的转换后的字体数据进行着色; 并且执行OR操作来逻辑地或者背景屏幕底座和彩色转换的字体数据,以便在背景屏幕上显示字符。

    Movable inclination-angle measuring apparatus for ion beam, and method of use
    4.
    发明授权
    Movable inclination-angle measuring apparatus for ion beam, and method of use 失效
    用于离子束的可移动倾角测量装置及其使用方法

    公开(公告)号:US07385207B2

    公开(公告)日:2008-06-10

    申请号:US11115848

    申请日:2005-04-26

    申请人: Young-Ha Yoon

    发明人: Young-Ha Yoon

    IPC分类号: H01J37/317

    摘要: There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.

    摘要翻译: 提供了可以测量点离子束或带状离子束的倾斜角度的可移动离子束倾角测量装置。 该装置从离子注入装置的离子供给单元沿X轴方向设置。 该装置包括具有用于接收离子束的离子束接收装置的离子电流测量单元,并且具有用于测量由接收的离子束感应的离子电流的离子电流测量部。 该装置还包括角度调节单元,其适于调节离子束接收装置绕Y轴和/或Z轴的接收角度,以及适于将离子束接收装置移动到Z轴的位置调整单元 方向。 通过倾斜角度计算单元,使用根据离子束的接收角度的调整来测量的离子电流的变化来计算倾斜角度。

    ION IMPLANTER WITH ETCH PREVENTION MEMBER(S)
    5.
    发明申请
    ION IMPLANTER WITH ETCH PREVENTION MEMBER(S) 有权
    离子植入物与防腐剂成员(S)

    公开(公告)号:US20080054194A1

    公开(公告)日:2008-03-06

    申请号:US11845187

    申请日:2007-08-27

    IPC分类号: H01J37/08

    摘要: An apparatus and method of doping ions into a substrate are disclosed and include a process chamber having an inner space in which an ion implantation process is performed, a support unit positioned in the process chamber, supporting a substrate and being electrically connected to a first power source for generating a high frequency pulse, a conductive unit separated from the support unit in such a manner that plasma associated with the ion implantation process is generated between the support unit and the conductive unit, wherein the conductive unit comprises a first etch prevention member preventing the conductive unit from being etched by a source gas used to generate the plasma, and a power port electrically connected to a second power source and generating radio frequency (RF) power applied to the conductive unit.

    摘要翻译: 公开了将离子掺杂到衬底中的装置和方法,并且包括具有进行离子注入工艺的内部空间的处理室,位于处理室中的支撑单元,支撑衬底并与第一电力电连接 源,用于产生高频脉冲,导电单元与支撑单元分离,使得在支撑单元和导电单元之间产生与离子注入工艺相关联的等离子体,其中导电单元包括防止 导电单元被用于产生等离子体的源气体进行蚀刻,以及电连接到第二电源并产生施加到导电单元的射频(RF)功率的电源端口。