摘要:
A method for fabricating a large-area nanoscale pattern includes: forming multilayer main thin films isolated by passivation layers; patterning a first main thin film to form a first main pattern; forming a first spacer pattern with respect to the first main pattern; and forming a second main pattern by transferring the first spacer pattern onto a second main thin film. By using multilayer main thin films isolated by different passivation films, spacer lithography capable of reducing a pattern pitch can be repetitively performed, and the pattern pitch is repetitively reduced without shape distortion after formation of micrometer-scale patterns, thereby forming nanometer-scale fine patterns uniformly over a wide area.
摘要:
Provided is a nanowire manufacturing method, comprising forming a plurality of grid patterns on a substrate, forming a nanowire on the grid patterns, and separating the grid pattern and the nanowire. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.
摘要:
Provided is a method of manufacturing a wire grid polarizer in which a stable color coordinate can be implemented. According to the present invention, in a process where a second grid pattern of metal pattern is formed over a first grid pattern made of resin material, metal layer is deposited in a concave portion formed between adjacent first grid patterns to form void portion and a width and a height of the second grid pattern are adjusted depending on adjustment of a width of the voids, and thereby improving a process efficiency.
摘要:
Provided is a method of manufacturing a wire grid polarizer in which a stable color coordinate can be implemented. According to the present invention, in a process where a second grid pattern of metal pattern is formed over a first grid pattern made of resin material, metal layer is deposited in a concave portion formed between adjacent first grid patterns to form void portion and a width and a height of the second grid pattern are adjusted depending on adjustment of a width of the voids, and thereby improving a process efficiency.
摘要:
Provided is a nanowire manufacturing method, comprising forming a plurality of grid patterns on a substrate, forming a nanowire on the grid patterns, and separating the grid pattern and the nanowire. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.
摘要:
Provided is a wire grid polarizer including: a first grid patterns on a substrate; a second grid pattern on the first grid patterns; and a passivation layer filling between the first grid patterns and the second grid patterns.
摘要:
Provided is a wire grid polarizer and a backlight unit using the wire grid polarizer. The wire grid polarizer comprises a first grid layer thrilled on a substrate and provided with at least one of a first grid pattern, and a second grid layer formed on the first grid pattern and provided with at least one of a second grid pattern made of metal material wherein the first grid layer is made of high molecular substance having a lower refraction index than that of the substrate.According to the present invention, by forming a first grid pattern on a substrate using a high molecular substance layer and by forming a metal grid pattern on the first grid pattern, transmission rates of respective wavelengths depending on light angles of incident light are controlled and thereby minimizing color variations depending on view angle.
摘要:
Provided are a wire grid polarizer and a backlight unit using the wire grid polarizer. The wire grid polarizer comprises a first grid layer formed on a substrate and provided with at least one of a first grid pattern, and a second grid layer formed on the first grid pattern and provided with at least one of a second grid pattern made of metal material wherein the first grid layer is made of high molecular substance having a lower refraction index than that of the substrate. By forming a first grid pattern on a substrate using a high molecular substance layer and by forming a metal grid pattern on the first grid pattern, transmission rates of respective wavelengths depending on light angles of incident light are controlled and thereby minimize color variations depending on view angle.
摘要:
The present invention relates to a wire grid polarizer capable of securing a high brightness and reducing the number of processes, a liquid crystal device including the wire grid polarizer, and a method of manufacturing the wire grid polarizer. According to the present invention, the wire grid polarizer, including first grids arranged in parallel at certain intervals over a substrate and second grids formed on the first grids, can be formed using only an imprint process, a deposition process, and a wet etch process. Accordingly, the number of processes and the process costs and time can be reduced, and high reliability can be guaranteed.
摘要:
The present invention relates to a wire grid polarizer capable of securing a high brightness and reducing the number of processes, a liquid crystal device including the wire grid polarizer, and a method of manufacturing the wire grid polarizer. According to the present invention, the wire grid polarizer, including first grids arranged in parallel at certain intervals over a substrate and second grids formed on the first grids, can be formed using only an imprint process, a deposition process, and a wet etch process. Accordingly, the number of processes and the process costs and time can be reduced, and high reliability can be guaranteed.