公开(公告)号：US20100188766A1

公开(公告)日：2010-07-29

申请号：US11997888

申请日：2006-08-04

申请人： Yukinari Harimoto ,  Nobuo Kushibiki ,  Maki Itoh ,  Elias Dimitris Katsoulis

发明人： Yukinari Harimoto ,  Nobuo Kushibiki ,  Maki Itoh ,  Elias Dimitris Katsoulis

IPC分类号： G02B1/00 ,  C07F7/21 ,  C03B19/00 ,  C03C3/04 ,  B05D5/06

CPC分类号： C08G77/12 ,  C03B19/12 ,  C03C3/06 ,  C03C17/02 ,  C03C2203/20 ,  C03C2217/213 ,  C03C2218/11

摘要： Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes of specific siloxane unit formulas etc., a process for their production using hydrolysis/condensation, a process for the production of silica type glass moldings with an optical transmittance of 90% to 100% in the vacuum-UV region to UV region and an optical transmittance of 98% to 100% in the visible region to near infrared region by curing said cyclic dihydrogensiloxanes or said hydrogenpolysiloxanes in a mold, said silica type glass moldings, optical elements made up of the silica type glass, a process for the production of optical elements having such a silica type glass film layer by coating an optical element with the hydrogenpolysiloxanes and curing them, and optical elements having such a silica type glass film layer.

摘要翻译： 环状二氢聚硅氧烷，特定硅氧烷单元配方的氢聚硅氧烷等，其使用水解/缩合的制造方法，在真空UV区域中的透光率为90〜100％的二氧化硅型玻璃成型体的制造方法 区域，并且通过在模具中固化所述环状二氢硅氧烷或所述氢聚硅氧烷，在可见区域到近红外区域的光透射率为98％至100％，所述二氧化硅型玻璃模制品，由二氧化硅型玻璃制成的光学元件， 通过用氢聚硅氧烷涂覆光学元件并固化它们来生产具有这种二氧化硅型玻璃膜层的光学元件，以及具有这种二氧化硅型玻璃膜层的光学元件。

公开(公告)号：US20090293942A1

公开(公告)日：2009-12-03

申请号：US12090694

申请日：2006-10-23

申请人： Yukinari Harimoto ,  Maki Itoh ,  Elias Dimitris Katsoulis

发明人： Yukinari Harimoto ,  Maki Itoh ,  Elias Dimitris Katsoulis

IPC分类号： H01L31/00 ,  B05D3/00 ,  B05D3/04 ,  C08F2/46 ,  B32B17/06 ,  C08G77/14 ,  H01L29/00

CPC分类号： H01L21/3124 ,  C23C18/1212 ,  C23C18/122 ,  C23C18/1241 ,  C23C18/1275 ,  C23C18/1279 ,  C23C18/14 ,  C23C2222/20 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02351 ,  H01L21/31608

摘要： A method of manufacturing an inorganic substrate coated with a thin silica type glass layer of 2 H to 9 H pencil hardness, said method comprising the steps of: coating an inorganic substrate with a cyclic dihydrogenpolysiloxane and/or a hydrogenpolysiloxane represented by a specific unit formula, and curing it; an inorganic substrate coated with a thin silica type glass layer; a coating agent for an inorganic substrate that is composed of a cyclic dihydrogenpolysiloxane and/or a hydrogenpolysiloxane represented by a specific unit formula; and a semiconductor device having an inorganic substrate coated with a thin silica type glass layer.

摘要翻译： 一种制备涂覆有2 H至9 H铅笔硬度的薄二氧化硅型玻璃层的无机基材的方法，所述方法包括以下步骤：用环状二氢聚硅氧烷和/或由特定单元式表示的氢聚硅氧烷涂覆无机基材 ，并固化; 涂覆有薄二氧化硅型玻璃层的无机基材; 由环状二氢聚硅氧烷和/或由特定单元式表示的氢聚硅氧烷构成的无机基材用涂料; 以及具有涂覆有薄的二氧化硅型玻璃层的无机基材的半导体器件。