公开(公告)号：US6016174A

公开(公告)日：2000-01-18

申请号：US48093

申请日：1998-03-26

申请人： Yukio Endo ,  Nobuhiro Nakamura ,  Ikuo Ogo

发明人： Yukio Endo ,  Nobuhiro Nakamura ,  Ikuo Ogo

IPC分类号： G02F1/136 ,  G02F1/1368 ,  H01L21/336 ,  H01L29/786

CPC分类号： G02F1/1368

摘要： A method for manufacturing electo-optic elements includes steps of: (a-1) forming gate electrodes of the gate line and the TFT by patterning the first metal thin film by the first photolithography process after forming the first metal thin film on the first insulating substrate, (a-2) patterning by dry etching the semiconductor active film and the ohmic contact film by the second photolithography process in the larger and continuous form than the portion in which the source line and the TFT are formed after forming the first insulating film, semiconductor active film, and ohmic contact film, (a-3) patterning the second metal thin film by the third photolithography process after forming the second metal thin film to form the source electrode and the drain electrode of the source line as well as the TFT and in addition, etch-removing by dry etching the ohmic contact film protruding from the source line, source electrode, and drain electrode, (a-4) patterning the second insulating film and the first insulating film in the fourth photolithography process after forming the second insulating film, and forming a pixel contact hole that penetrates at least to the drain electrode surface, the first contact hole that penetrates to the first metal film surface, and the second contact hole that penetrates the second metal film surface, and (a-5) patterning the conductive thin film and forming the pixel electrode by the fifth photolithography process after forming the conductive thin film.

摘要翻译： 一种用于制造电光元件的方法包括以下步骤：（a-1）通过在第一绝缘层上形成第一金属薄膜之后通过第一光刻工艺对第一金属薄膜进行构图来形成栅极线的栅电极和TFT 通过在形成第一绝缘膜之后以比形成源极线和TFT的部分更大和连续的形式通过第二光刻工艺通过干法蚀刻半导体活性膜和欧姆接触膜来形成（a-2）图案化 ，半导体活性膜和欧姆接触膜，（a-3）在形成第二金属薄膜之后通过第三光刻工艺对第二金属薄膜进行图案化以形成源极线的源电极和漏电极以及 TFT，此外，通过干蚀刻从源极线，源电极和漏电极突出的欧姆接触膜进行蚀刻去除，（a-4）将第二绝缘膜图案化 d是在形成第二绝缘膜之后的第四光刻工艺中的第一绝缘膜，以及形成至少穿透到漏电极表面的第一接触孔，第一接触孔穿过第一金属膜表面，第二接触 穿过第二金属膜表面的孔，以及（a-5）在形成导电薄膜之后通过第五光刻工艺构图导电薄膜并形成像素电极。

公开(公告)号：US09256145B2

公开(公告)日：2016-02-09

申请号：US13384852

申请日：2010-09-03

申请人： Atsushi Fujii ,  Haruyuki Tsuji ,  Hideaki Matsuoka ,  Kazuhisa Shida ,  Nobuhiro Nakamura

发明人： Atsushi Fujii ,  Haruyuki Tsuji ,  Hideaki Matsuoka ,  Kazuhisa Shida ,  Nobuhiro Nakamura

IPC分类号： G03G5/04 ,  G03G5/08 ,  G03G5/14

CPC分类号： G03G5/08 ,  G03G5/104 ,  G03G5/142 ,  G03G5/144

摘要： An electrophotographic photosensitive member that can not easily cause charging lines even where it is an electrophotographic photosensitive member employing as a conductive layer a layer containing metal oxide particles is disclosed. Also disclosed are a process cartridge and an electrophotographic apparatus which have such an electrophotographic photosensitive member. The electrophotographic photosensitive member has a conductive layer which contains titanium oxide particles coated with tin oxide doped with phosphorus or tungsten.

摘要翻译： 公开了即使在作为导电层使用含有金属氧化物颗粒的层的电子照相感光构件的情况下也不容易引起充电线的电子照相感光构件。 还公开了具有这种电子照相感光构件的处理盒和电子照相设备。 电子照相感光构件具有包含掺杂有磷或钨的氧化锡的氧化钛颗粒的导电层。

公开(公告)号：US09046797B2

公开(公告)日：2015-06-02

申请号：US13983994

申请日：2012-03-01

申请人： Atsushi Fujii ,  Hideaki Matsuoka ,  Haruyuki Tsuji ,  Nobuhiro Nakamura ,  Kazuhisa Shida

发明人： Atsushi Fujii ,  Hideaki Matsuoka ,  Haruyuki Tsuji ,  Nobuhiro Nakamura ,  Kazuhisa Shida

IPC分类号： G03G5/00 ,  G03G7/00 ,  G03G5/10 ,  G03G5/14 ,  G03G5/05

CPC分类号： G03G7/0053 ,  G03G5/0507 ,  G03G5/0525 ,  G03G5/10 ,  G03G5/104 ,  G03G5/142 ,  G03G5/144

摘要： To provide a process for producing an electrophotographic photosensitive member that can not easily cause any fog due to an increase in dark attenuation, a conductive layer is formed with use of a coating liquid for conductive layer prepared with use of a solvent, a binder material and metal oxide particles. The metal oxide particles (P) and binder material (B) in the coating liquid for conductive layer are in a mass ratio (P/B) of from 1.5/1.0 to 3.5/1.0. The metal oxide particle is a titanium oxide particle coated with tin oxide doped with phosphorus or tungsten. Where powder resistivity of the metal oxide particle is represented by x (Ω·cm) and powder resistivity of the titanium oxide particle as a core particle constituting the metal oxide particle is represented by y (Ω·cm), the y and the x satisfy the following relations (i) and (ii): 5.0×107≦y≦5.0×109  (i) 1.0×102≦y/x≦1.0×106  (ii).

摘要翻译： 为了提供一种用于制造由于暗衰减增加而不容易引起灰雾的电子照相感光构件的制造方法，使用通过使用溶剂，粘合剂材料和粘合剂材料制备的导电层用涂布液形成导电层， 金属氧化物颗粒。 用于导电层的涂布液中的金属氧化物颗粒（P）和粘合剂材料（B）的质量比（P / B）为1.5 / 1.0至3.5 / 1.0。 金属氧化物颗粒是涂覆有掺杂有磷或钨的氧化锡的氧化钛颗粒。 当金属氧化物颗粒的粉末电阻率由x（＆OHgr·cm）表示，作为构成金属氧化物颗粒的核心颗粒的氧化钛颗粒的粉末电阻率由y（＆Omega; cm）表示时，y和 x满足以下关系式（i）和（ii）：5.0×107＆nlE; y＆nlE; 5.0×109（i）1.0×102＆nlE; y / x＆nlE; 1.0×106（ii）。

公开(公告)号：US08729593B2

公开(公告)日：2014-05-20

申请号：US13137159

申请日：2011-07-25

申请人： Nobuhiro Nakamura ,  Nao Ishibashi

发明人： Nobuhiro Nakamura ,  Nao Ishibashi

IPC分类号： H01L33/00 ,  H01L51/52

CPC分类号： H01L51/52 ,  C03C8/08 ,  C03C17/34 ,  C03C2217/425 ,  C03C2217/77 ,  G02B5/02 ,  H01L51/0096 ,  H01L51/5268 ,  Y02E10/549

摘要： Provided is an electronic device having a long life and a large effective area. Furthermore, provided is an optical device capable of controlling specular visibility. And provided is a substrate for the optical device, which includes a scattering layer having excellent scattering properties and having a desired refractive index while retaining surface smoothness. Further, there is provided a substrate for the electronic device, which includes a substrate having first and second main surfaces facing each other and an electrode pattern formed on the first main surface of the substrate, in which the first main surface of the first and second main surfaces is a surface which forms waviness made up of curved faces, the waviness of the surface has a wavelength Rλa of greater than 50 μm and a ratio Ra/Rλa of waviness roughness Ra of the surface which forms waviness to the wavelength Rλa of the waviness is from 1.0×10−4 to 3.0×10−2.

摘要翻译： 本发明提供一种寿命长，效率高的电子装置。 此外，提供了能够控制镜面可视性的光学装置。 并且提供了一种用于光学器件的衬底，其包括具有优异散射特性并具有期望折射率同时保持表面平滑度的散射层。 此外，提供了一种电子器件用基板，其包括具有彼此面对的第一和第二主表面的基板和形成在基板的第一主表面上的电极图案，其中第一和第二主表面 主表面是形成由弯曲面构成的波纹的表面，表面的波纹的波长Rλa大于50μm，波纹的波纹粗糙度Ra与波纹的波长Rλa成比例的Ra /Rλa 波纹为1.0×10-4〜3.0×10-2。

公开(公告)号：US20130323632A1

公开(公告)日：2013-12-05

申请号：US13984264

申请日：2012-03-01

申请人： Atsushi Fujii ,  Hideaki Matsuoka ,  Haruyuki Tsuji ,  Kazuhisa Shida ,  Nobuhiro Nakamura

发明人： Atsushi Fujii ,  Hideaki Matsuoka ,  Haruyuki Tsuji ,  Kazuhisa Shida ,  Nobuhiro Nakamura

IPC分类号： G03G15/00 ,  G03G21/18

CPC分类号： G03G5/087 ,  G03G5/0507 ,  G03G5/0525 ,  G03G5/104 ,  G03G5/142 ,  G03G5/144 ,  G03G21/1814

摘要： Provided are an electrophotographic photosensitive member in which leakage doesn't easily occur, a process cartridge and an electrophotographic apparatus each including the electrophotographic photosensitive member, and a method of manufacturing the electrophotographic photosensitive member. The electrophotographic photosensitive member includes a conductive layer including titanium oxide particle coated with tin oxide doped with a hetero element. When an absolute value of a maximum current amount flowing through the conductive layer in a case of performing a test of applying −1.0 kV including DC voltage to the conductive layer is defined as Ia, and an absolute value of a current amount flowing through the conductive layer in a case where a decrease ratio of a current amount per minute reaches 1% or less for the first time is defined as Ib, the relations of Ia≦6000 and 10≦Ib are satisfied. A volume resistivity of the conductive layer before the test is 1.0×108 Ω·cm to 5.0×1012 Ω·cm.

摘要翻译： 提供了不容易发生泄漏的电子照相感光构件，各自包括电子照相感光构件的处理盒和电子照相设备以及制造电子照相感光构件的方法。 电子照相感光构件包括导电层，该导电层包括用掺杂有异质元素的氧化锡涂覆的氧化钛颗粒。 在对导电层进行包含直流电压-1.0kV的试验的情况下，流过导电层的最大电流量的绝对值定义为Ia，流过导电性的电流量的绝对值 在每分钟的电流量的降低比率首次达到1％以下的情况下，层被定义为Ib，满足Ia @ 6000和10 @ Ib的关系。 试验前的导电层的体积电阻率为1.0×108Ω·cm〜5.0×1012Ω·cm。

公开(公告)号：US08455170B2

公开(公告)日：2013-06-04

申请号：US13409439

申请日：2012-03-01

申请人： Nobuhiro Nakamura ,  Hideaki Matsuoka ,  Atsushi Fujii ,  Haruyuki Tsuji ,  Kazuhisa Shida

发明人： Nobuhiro Nakamura ,  Hideaki Matsuoka ,  Atsushi Fujii ,  Haruyuki Tsuji ,  Kazuhisa Shida

IPC分类号： G03G5/04

CPC分类号： G03G5/104 ,  G03G5/144

摘要： An electrophotographic photosensitive member is provided in which black spots on an output image are hardly caused by local charge injection from a support to a photosensitive layer. For this purpose, a conductive layer is formed using a coating liquid for a conductive layer prepared using a solvent, a binder material and a metal oxide particle that satisfies the following relation (i): 45≦A×ρ×D≦65 (i) wherein A denotes the surface area of the metal oxide particle per unit mass [m2/g], D denotes the number average particle diameter of the metal oxide particle [μm], and ρ denotes the density of the metal oxide particle [g/cm3]. The metal oxide particle is a titanium oxide particle coated with tin oxide doped with phosphorus.

摘要翻译： 提供一种电子照相感光构件，其中输出图像上的黑点几乎不会由从支持体到感光层的局部电荷注入引起。 为此，使用使用满足以下关系式（i）的溶剂，粘合剂材料和金属氧化物粒子制备的导电层用涂布液形成导电层：45 @ A×rho×D @ 65（i ）其中A表示每单位质量的金属氧化物颗粒的表面积[m2 / g]，D表示金属氧化物颗粒的数均粒径[mum]，rho表示金属氧化物颗粒的密度[g / cm3]。 金属氧化物颗粒是涂覆有掺杂有磷的氧化锡的氧化钛颗粒。

公开(公告)号：US20130114269A1

公开(公告)日：2013-05-09

申请号：US13810545

申请日：2011-07-15

申请人： Benoit Domercq ,  Philippe Roquiny ,  Daniel Decroupet ,  Nobuhiro Nakamura ,  Naoya Wada ,  Nao Ishibashi

发明人： Benoit Domercq ,  Philippe Roquiny ,  Daniel Decroupet ,  Nobuhiro Nakamura ,  Naoya Wada ,  Nao Ishibashi

IPC分类号： F21V5/00 ,  G02B5/02

CPC分类号： F21V5/002 ,  G02B5/0242 ,  G02B5/0247 ,  H01L51/5215 ,  H01L51/5268

摘要： A translucent conductive substrate (1) for Organic Light Emitting Device comprising, a transparent support (10), a scattering layer (11) formed over the transparent support (10) and comprising a glass which contains a base material (110) having a first refractive index for at least one wavelength of light to be transmitted and a plurality of scattering materials (111) dispersed in the base material (110) and having a second refractive index different from that of the base material and a transparent electrode (12) formed over the scattering layer (11), said electrode (12) comprising at least one metal conduction layer (122) and at least one coating (120) having properties for improving the light transmission through said electrode, said coating (120) comprises at least one layer for improving light transmission (1201) and is located between the metal conduction layer (122) and the scattering layer (11), on which said electrode (12) is deposited.

摘要翻译： 一种用于有机发光器件的半透明导电衬底（1），包括透明支撑体（10），形成在所述透明支撑体（10）上方的散射层（11），并且包括玻璃，所述玻璃包含具有第一 用于待透射的光的至少一个波长的折射率和分散在基材（110）中并且具有与基底材料不同的第二折射率的多个散射材料（111）和形成的透明电极（12） 在所述散射层（11）上方，所述电极（12）包括至少一个金属导电层（122）和至少一个具有改善通过所述电极的光透射性能的涂层（120），所述涂层（120）至少包括 一层用于改善光透射（1201）并位于金属传导层（122）和散射层（11）之间，其上沉积有所述电极（12）。

公开(公告)号：US08427045B2

公开(公告)日：2013-04-23

申请号：US13195146

申请日：2011-08-01

申请人： Nobuhiro Nakamura ,  Kazutaka Hayashi ,  Kenji Imakita ,  Hiroyuki Ohkawa ,  Hidefumi Odaka ,  Nao Ishibashi

发明人： Nobuhiro Nakamura ,  Kazutaka Hayashi ,  Kenji Imakita ,  Hiroyuki Ohkawa ,  Hidefumi Odaka ,  Nao Ishibashi

IPC分类号： H01L51/50

CPC分类号： H01L51/5268 ,  H01L2924/16152 ,  H05B33/02 ,  H05B33/10 ,  H05B33/22

摘要： The present invention provides an organic LED element in which the extraction efficiency is improved up to 80% of emitted light. Further, the invention relates to an electrode-attached translucent substrate having a translucent substrate, a scattering layer formed over the glass substrate and containing a base material having a first refractive index for at least one wavelength of wavelengths of emitted light of an organic LED element and a plurality of scattering materials positioned in the base material and having a second refractive index different from that of the base material, and a translucent electrode formed over the scattering layer and having a third refractive index equal to or lower than the first refractive index, in which distribution of the scattering materials in the scattering layer decreases from the inside of the scattering layer toward the translucent electrode.

摘要翻译： 本发明提供了一种有机LED元件，其中提取效率提高到发射光的80％。 此外，本发明涉及一种具有透光性基板的电极附加透光性基板，在玻璃基板上形成的散射层，并且含有对于有机LED元件的发光的波长的至少一个波长具有第一折射率的基材 以及位于所述基材中且具有与所述基材不同的第二折射率的多个散射材料，以及形成在所述散射层上并且具有等于或低于所述第一折射率的第三折射率的透光性电极， 其中散射层中的散射材料的分布从散射层的内部朝向透光性电极减小。

公开(公告)号：US20120194065A1

公开(公告)日：2012-08-02

申请号：US13447032

申请日：2012-04-13

申请人： Yumiko AOKI ,  Naoya Wada ,  Nobuhiro Nakamura ,  Yasuko Osaki

发明人： Yumiko AOKI ,  Naoya Wada ,  Nobuhiro Nakamura ,  Yasuko Osaki

IPC分类号： H05B33/22 ,  F21V5/00

CPC分类号： H01L51/5275 ,  H01L51/5268 ,  H01L2251/5369

摘要： The present invention relates to an organic LED element sequentially including: a transparent substrate; a scattering layer; a first electrode; an organic layer; and a second electrode, in which the scattering layer includes a first glass material and a second glass material dispersed in the first glass material and having a different refractive index from the first glass material.

摘要翻译： 本发明涉及有机LED元件，其顺序地包括：透明基板; 散射层; 第一电极; 有机层; 以及第二电极，其中所述散射层包括分散在所述第一玻璃材料中并且具有与所述第一玻璃材料不同的折射率的第一玻璃材料和第二玻璃材料。

公开(公告)号：US20120074447A1

公开(公告)日：2012-03-29

申请号：US13270761

申请日：2011-10-11

申请人： Syuji Matsumoto ,  Tomoyuki Kobayashi ,  Naoki Sugimoto ,  Satoshi Fujimine ,  Nobuhiro Nakamura

发明人： Syuji Matsumoto ,  Tomoyuki Kobayashi ,  Naoki Sugimoto ,  Satoshi Fujimine ,  Nobuhiro Nakamura

IPC分类号： H01L33/52

CPC分类号： H01L33/00 ,  C03C3/122 ,  C03C3/19 ,  H01L33/54 ,  H01L33/56 ,  H01L2924/0002 ,  H01L2924/00

摘要： A light emitting diode element having a light emitting diode; and a glass covering sealing the light emitting diode is provided. The glass of the covering consists essentially of from 30 to 70 mol % of SnO, from 15 to 50 mol % of P2O5, from 0.1 to 20 mol % of ZnO, from 0 to 10 mol % of SiO2+GeO2, from 0 to 30% of Li2O+Na2O+K2O, and from 0 to 20% of MgO+CaO+SrO+BaO. In an embodiment, a refractive index of the glass of the covering is at least 1.6 at a wavelength of 400 nm.

摘要翻译： 一种具有发光二极管的发光二极管元件; 并提供密封发光二极管的玻璃盖。 该覆盖层的玻璃基本上由SnO 30-70mol％，P2O5 15-50mol％，氧化铝0.1-20mol％，SiO 2 + GeO 0至10mol％，0至30 ％的Li 2 O + Na 2 O + K 2 O，0〜20％的MgO + CaO + SrO + BaO。 在一个实施例中，覆盖玻璃的折射率在波长400nm处至少为1.6。