SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD OF THE SUBSTRATE PROCESSING APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND APPARATUS STATE SHIFTING METHOD
    1.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD OF THE SUBSTRATE PROCESSING APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND APPARATUS STATE SHIFTING METHOD 有权
    基板加工装置,基板加工装置的控制方法,半导体装置的制造方法和装置状态转换方法

    公开(公告)号:US20110082581A1

    公开(公告)日:2011-04-07

    申请号:US12897111

    申请日:2010-10-04

    IPC分类号: G06F19/00

    CPC分类号: H01L21/67276

    摘要: To perform a maintenance work safely by a maintenance engineer, even if the maintenance work is performed with power of a substrate processing apparatus turned-on. A substrate processing apparatus, comprising: a controller that inhibits a shift from an idling state to a standby state, when a generation of a prescribed event is detected; the controller further comprising: a shift indicating part that controls an apparatus state so as to be shifted from the idling state possible to receive an indication of execution of the recipe, being an apparatus state possible to step into the substrate processing apparatus, to the standby state possible to execute a recipe, being an apparatus state impossible to step into the substrate processing apparatus; and an event detection part that detects a generation of the prescribed event for inhibiting a shift from the idling state to the standby state and notifies the shift indicating part of the prescribed event.

    摘要翻译: 为了维护工程人员进行维护工作,即使维护工作是在打开基板处理装置的电源的情况下执行的。 一种基板处理装置,包括:当检测到规定事件的产生时,禁止从怠速状态向待机状态的转移的控制器; 所述控制器还包括:移动指示部,其控制装置状态以从所述怠速状态转移,以接收所述配方的执行指示,作为可能进入所述基板处理装置的装置状态到所述待机 状态可以执行配方,作为不可能进入基板处理装置的装置状态; 以及事件检测部,其检测用于禁止从空转状态向待机状态的转换的规定事件的生成,并通知规定事件的换档指示部。

    SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    基板加工装置及制造半导体装置的方法

    公开(公告)号:US20100144145A1

    公开(公告)日:2010-06-10

    申请号:US12631152

    申请日:2009-12-04

    IPC分类号: H01L21/203 B05C11/00

    摘要: When a step is delayed, an operator can be rapidly informed of the delay. A substrate processing apparatus comprises a process system configured to process a substrate, a control unit configured to control the process system for performing a plurality of steps, and a manipulation unit configured to monitor progresses of the steps. While the control unit waits for completion of a predetermined one of the steps after the control unit controls the process system to start the predetermined step, if a time elapsing from the start of the predetermined step exceeds an allowable time previously allocated to each of the steps, the control unit transmits an alarm message to the manipulation unit so as to report that the allowable time is exceeded.

    摘要翻译: 当一个步骤被延迟时,可以迅速地通知操作者延迟。 基板处理装置包括被配置为处理基板的处理系统,被配置为控制用于执行多个步骤的处理系统的控制单元和被配置为监视步骤的进行的操作单元。 当控制单元在控制单元控制处理系统开始预定步骤之后等待完成预定的一个步骤时,如果从预定步骤的开始经过的时间超过先前分配给每个步骤的允许时间 控制单元向操作单元发送报警信息,以报告超过允许时间。