摘要:
Formation of transistors, such as, e.g., PMOS transistors, with diffusion regions having different depths for equalization of performance among transistors of an integrated circuit is described. Shallow-trench isolation structures are formed in a substrate formed at least in part of silicon for providing the transistors with at least substantially equivalent channel widths and lengths. A series of masks and etches is performed to form first recesses and second recesses defined in the silicon having different depths and respectively associated with first and second transistors. The second recesses are deeper than the first recesses. A silicon germanium film is formed in the first recesses and the second recesses. The silicon germanium film in the second recesses is thicker than the silicon germanium film in the first recesses, in order to increase performance of the second transistor so it is closer to the performance of the first transistor.
摘要:
An integrated circuit (“IC”) fabricated on a semiconductor substrate has an active gate structure formed over a channel region in the semiconductor substrate. A dummy gate structure is formed on a dielectric isolation structure. The dummy gate structure and the active gate structure have the same width. A sidewall spacer on the dummy gate structure overlies a semiconductor portion between a strain-inducing insert and the dielectric isolation structure.
摘要:
Device features, such as gate lengths and channel widths, are selectively altered by first identifying those devices within a semiconductor die that exhibit physical attributes, e.g., leakage current and threshold voltage magnitude, that are different than previously verified by a design/simulation tool used to design the devices. The identified, non-conforming devices are then further identified by the amount of deviation from the original design goal that is exhibited by each non-conforming device. The non-conforming devices are then mathematically categorized into bins, where each bin is tagged with a magnitude of deviation from a design goal. The mask layers defining the features of the non-conforming devices are then selectively modified by an amount that is commensurate with the tagged deviation. The selectively modified mask layers are then used to generate a new semiconductor die that exhibits improved performance.
摘要:
Various approaches for improving an integrated circuit layout. In one approach, a tree-type hierarchical layout representation of the circuit design is traversed. At each block visited during the traversing, a process determines whether there exists an improvement opportunity for each cell associated with the block. In response to determining that an improvement opportunity exists for a cell of a first block of the plurality of blocks, the process determines whether a modification to the cell satisfies one or more rules for every other block of the block type of the first block in the hierarchical representation. If the rules are satisfied, the modification is stored. Otherwise, the modification is discarded.
摘要:
A method and system are provided for processing natural language user queries for commanding a user interface to perform functions. Individual user queries are classified in accordance with the types of functions and a plurality of user queries may be related to define a particular command. To assist with classification, a query type for each user query is determined where the query type is one of a functional query requesting a particular new command to perform a particular type of function, an entity query relating to an entity associated with the particular new command having the particular type of function and a clarification query responding to a clarification question posed to clarify a prior user query having the particular type of function. Functional queries may be processed using a plurality of natural language processing techniques and scores from each technique combined to determine which type of function is commanded.
摘要:
In one embodiment of the present invention, a field effect transistor device is provided. The field effect transistor device comprises an active area, including a first semiconductor material of a first conductivity type. A channel region is included within the active area. A gate region overlays the channel region, and the first source/drain region and the second source/drain region are embedded in the active area and spaced from each other by the channel region. The first source/drain region and the second source/drain region each include a second semiconductor material of a second conductivity type opposite of the first conductivity type. A well-tap region is embedded in the active area and spaced from the first source/drain region by the channel region and the second source/drain region. The well-tap region includes the second semiconductor material of the first conductivity type. The first source/drain region and the second source/drain region and the well-tap region are epitaxial deposits.
摘要:
A method and system are provided for processing natural language user queries for commanding a user interface to perform functions. Individual user queries are classified in accordance with the types of functions and a plurality of user queries may be related to define a particular command. To assist with classification, a query type for each user query is determined where the query type is one of a functional query requesting a particular new command to perform a particular type of function, an entity query relating to an entity associated with the particular new command having the particular type of function and a clarification query responding to a clarification question posed to clarify a prior user query having the particular type of function. Functional queries may be processed using a plurality of natural language processing techniques and scores from each technique combined to determine which type of function is commanded.