Semiconductor laser and a manufacturing method for the same
    2.
    发明授权
    Semiconductor laser and a manufacturing method for the same 失效
    半导体激光器及其制造方法

    公开(公告)号:US06822989B1

    公开(公告)日:2004-11-23

    申请号:US09515285

    申请日:2000-02-29

    IPC分类号: H01S500

    摘要: A semiconductor laser, including: an n-type cladding layer that has n-type conductivity; an active layer formed on top of the n-type cladding layer; a p-type cladding base layer that is formed on top of the active layer and has p-type conductivity; a current-blocking layer that is formed on specified parts of an upper surface of the p-type cladding base layer and substantially has n-type conductivity; and a p-type buried cladding layer that has p-type conductivity and is formed so as to cover the current-blocking layer and contact remaining parts of the upper surface of the p-type cladding base layer. The current-blocking layer has at least two regions having different concentrations (hereafter “N1” and “N2” where N1

    摘要翻译: 一种半导体激光器,包括:具有n型导电性的n型包层; 形成在n型包覆层顶部的有源层; p型覆层基层,形成在有源层的顶部并具有p型导电性; 形成在p型包覆基层的上表面的特定部分上并且基本上具有n型导电性的电流阻挡层; 以及具有p型导电性并形成为覆盖电流阻挡层并与p型包覆基底层的上表面的剩余部分接触的p型埋层包层。 电流阻挡层具有至少两个具有不同浓度的区域(以下称为“N1”和“N2”,其中N1