公开(公告)号：US20080044059A1

公开(公告)日：2008-02-21

申请号：US11768118

申请日：2007-06-25

申请人： Zvi KOTLER ,  Eliezer Lipman ,  Golan Hanina ,  Boris Greenberg ,  Michael Zenou

发明人： Zvi KOTLER ,  Eliezer Lipman ,  Golan Hanina ,  Boris Greenberg ,  Michael Zenou

IPC分类号： G05B19/18 ,  G06K9/00

CPC分类号： G05B19/182 ,  G05B2219/45026 ,  G05B2219/49338 ,  G05B2219/49353 ,  H05K1/0269 ,  H05K3/0008 ,  H05K3/0035 ,  H05K2201/09918 ,  H05K2201/2054 ,  H05K2203/108

摘要： A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the illumination generating returning radiation from the site. The method further includes configuring the optical system to receive the returning radiation via the given element, and to form an image of the site therefrom, calculating an actual position of a location at the site from the image and outputting a signal indicative of the actual position of the location, generating a beam of micromachining radiation having a micromachining wavelength different from the illumination wavelength, positioning the beam to form an aligned beam with respect to the location in response to the signal, and conveying the aligned beam to the location via at least the given element of the optical system so as to perform a micromachining operation at the location.

摘要翻译： 一种用于微加工材料的方法，包括配置光学系统以通过所述光学系统的给定元件向位置提供照明波长的照明，所述照明产生从所述现场返回的辐射。 该方法还包括配置光学系统以经由给定元件接收返回的辐射，并且从该图像形成站点的图像，从图像计算位置的位置的实际位置并输出指示实际位置的信号 产生具有不同于照明波长的微加工波长的微加工辐射束，定位该波束以响应于该信号而相对于该位置形成对准的波束，并且经由至少至少将该对准的波束传送到该位置 光学系统的给定元件，以便在该位置执行微加工操作。

公开(公告)号：US07945087B2

公开(公告)日：2011-05-17

申请号：US11768118

申请日：2007-06-25

申请人： Zvi Kotler ,  Eliezer Lipman ,  Golan Hanina ,  Boris Greenberg ,  Michael Zenou

发明人： Zvi Kotler ,  Eliezer Lipman ,  Golan Hanina ,  Boris Greenberg ,  Michael Zenou

IPC分类号： G06K9/00

CPC分类号： G05B19/182 ,  G05B2219/45026 ,  G05B2219/49338 ,  G05B2219/49353 ,  H05K1/0269 ,  H05K3/0008 ,  H05K3/0035 ,  H05K2201/09918 ,  H05K2201/2054 ,  H05K2203/108

摘要： A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the illumination generating returning radiation from the site. The method further includes configuring the optical system to receive the returning radiation via the given element, and to form an image of the site therefrom, calculating an actual position of a location at the site from the image and outputting a signal indicative of the actual position of the location, generating a beam of micromachining radiation having a micromachining wavelength different from the illumination wavelength, positioning the beam to form an aligned beam with respect to the location in response to the signal, and conveying the aligned beam to the location via at least the given element of the optical system so as to perform a micromachining operation at the location.

摘要翻译： 一种用于微加工材料的方法，包括配置光学系统以通过所述光学系统的给定元件向位置提供照明波长的照明，所述照明产生从所述现场返回的辐射。 该方法还包括配置光学系统以经由给定元件接收返回的辐射，并且从该图像形成站点的图像，从图像计算位置的位置的实际位置并输出指示实际位置的信号 产生具有不同于照明波长的微加工波长的微加工辐射束，定位该波束以响应于该信号而相对于该位置形成对准的波束，并且经由至少至少将该对准的波束传送到该位置 光学系统的给定元件，以便在该位置执行微加工操作。