Alignment of printed circuit board targets
    1.
    发明授权
    Alignment of printed circuit board targets 有权
    印刷电路板目标的对齐

    公开(公告)号:US07945087B2

    公开(公告)日:2011-05-17

    申请号:US11768118

    申请日:2007-06-25

    IPC分类号: G06K9/00

    摘要: A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the illumination generating returning radiation from the site. The method further includes configuring the optical system to receive the returning radiation via the given element, and to form an image of the site therefrom, calculating an actual position of a location at the site from the image and outputting a signal indicative of the actual position of the location, generating a beam of micromachining radiation having a micromachining wavelength different from the illumination wavelength, positioning the beam to form an aligned beam with respect to the location in response to the signal, and conveying the aligned beam to the location via at least the given element of the optical system so as to perform a micromachining operation at the location.

    摘要翻译: 一种用于微加工材料的方法,包括配置光学系统以通过所述光学系统的给定元件向位置提供照明波长的照明,所述照明产生从所述现场返回的辐射。 该方法还包括配置光学系统以经由给定元件接收返回的辐射,并且从该图像形成站点的图像,从图像计算位置的位置的实际位置并输出指示实际位置的信号 产生具有不同于照明波长的微加工波长的微加工辐射束,定位该波束以响应于该信号而相对于该位置形成对准的波束,并且经由至少至少将该对准的波束传送到该位置 光学系统的给定元件,以便在该位置执行微加工操作。

    ALIGNMENT OF PRINTED CIRCUIT BOARD TARGETS
    2.
    发明申请
    ALIGNMENT OF PRINTED CIRCUIT BOARD TARGETS 有权
    印刷电路板目标的对齐

    公开(公告)号:US20080044059A1

    公开(公告)日:2008-02-21

    申请号:US11768118

    申请日:2007-06-25

    IPC分类号: G05B19/18 G06K9/00

    摘要: A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the illumination generating returning radiation from the site. The method further includes configuring the optical system to receive the returning radiation via the given element, and to form an image of the site therefrom, calculating an actual position of a location at the site from the image and outputting a signal indicative of the actual position of the location, generating a beam of micromachining radiation having a micromachining wavelength different from the illumination wavelength, positioning the beam to form an aligned beam with respect to the location in response to the signal, and conveying the aligned beam to the location via at least the given element of the optical system so as to perform a micromachining operation at the location.

    摘要翻译: 一种用于微加工材料的方法,包括配置光学系统以通过所述光学系统的给定元件向位置提供照明波长的照明,所述照明产生从所述现场返回的辐射。 该方法还包括配置光学系统以经由给定元件接收返回的辐射,并且从该图像形成站点的图像,从图像计算位置的位置的实际位置并输出指示实际位置的信号 产生具有不同于照明波长的微加工波长的微加工辐射束,定位该波束以响应于该信号而相对于该位置形成对准的波束,并且经由至少至少将该对准的波束传送到该位置 光学系统的给定元件,以便在该位置执行微加工操作。

    Multiple mirror calibration system
    3.
    发明授权
    Multiple mirror calibration system 有权
    多镜校准系统

    公开(公告)号:US08390795B2

    公开(公告)日:2013-03-05

    申请号:US12812149

    申请日:2009-01-11

    IPC分类号: G01C3/00

    CPC分类号: B23K26/04 B23K26/0676

    摘要: An optical system including a plurality of selectably directable mirrors (38) each arranged to direct a laser beam (41) to a selectable location within a field, a plurality of mirror orientation sensors (45) operative to sense the orientation of the plurality of selectably directable mirrors and to provide mirror orientation outputs and an automatic calibration subsystem (47) for automatically calibrating the plurality of selectably directable mirrors, the automatic calibration subsystem including a target (40) being operative to provide an optically visible indication of impingement of a laser beam thereon; the target being rewritable and having optically visible fiducial markings (54, 56), a target positioner (42) for selectably positioning the target, an optical sensor (44) operative to view the target following impingement of the laser beam thereon and to provide laser beam impingement outputs and a correlator (36) operative to provide a calibration output.

    摘要翻译: 一种光学系统,包括多个可选择地可定向的反射镜(38),每个反射镜被布置成将激光束(41)引导到场内的可选位置;多个镜面取向传感器(45),用于感测多个可选择地定向 自动校准子系统,其包括可操作以提供激光束的光学可见指示的指示体,所述自动校准子系统用于自动校准所述多个可选择性可定向的反射镜, 上; 目标是可重写且具有光学可见的基准标记(54,56),用于可选择地定位目标的目标定位器(42);光学传感器(44),用于在其上激光束撞击之后观察目标,并提供激光 光束冲击输出和相关器(36),用于提供校准输出。

    MULTIPLE MIRROR CALIBRATION SYSTEM
    4.
    发明申请
    MULTIPLE MIRROR CALIBRATION SYSTEM 有权
    多镜像校准系统

    公开(公告)号:US20100328643A1

    公开(公告)日:2010-12-30

    申请号:US12812149

    申请日:2009-01-11

    IPC分类号: G01C3/08

    CPC分类号: B23K26/04 B23K26/0676

    摘要: An optical system including a plurality of selectably directable mirrors (38) each arranged to direct a laser beam (41) to a selectable location within a field, a plurality of mirror orientation sensors (45) operative to sense the orientation of the plurality of selectably directable mirrors and to provide mirror orientation outputs and an automatic calibration subsystem (47) for automatically calibrating the plurality of selectably directable mirrors, the automatic calibration subsystem including a target (40) being operative to provide an optically visible indication of impingement of a laser beam thereon; the target being rewritable and having optically visible fiducial markings (54, 56), a target positioner (42) for selectably positioning the target, an optical sensor (44) operative to view the target following impingement of the laser beam thereon and to provide laser beam impingement outputs and a correlator (36) operative to provide a calibration output.

    摘要翻译: 一种光学系统,包括多个可选择地可定向的反射镜(38),每个反射镜被布置成将激光束(41)引导到场内的可选位置;多个镜面取向传感器(45),用于感测多个可选择地定向 自动校准子系统,其包括可操作以提供激光束的光学可见指示的指示体,所述自动校准子系统用于自动校准所述多个可选择性可定向的反射镜, 上; 目标是可重写且具有光学可见的基准标记(54,56),用于可选择地定位目标的目标定位器(42);光学传感器(44),用于在其上激光束撞击之后观察目标,并提供激光 光束冲击输出和相关器(36),用于提供校准输出。