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    Linear moving capacitive sensor twin column electronic height gauge
    1.
    发明申请
    Linear moving capacitive sensor twin column electronic height gauge 审中-公开

    公开(公告)号：US20060137204A1

    公开(公告)日：2006-06-29

    申请号：US11303504

    申请日：2005-12-17

    申请人： Zhong Yang

    发明人： Zhong Yang

    IPC分类号： G01B3/22

    CPC分类号： G01B7/082

    摘要： The present invention is an electronic height gauge utilizing new technology and includes a first column (Column 1) and a second column (Column 2), a display unit with a cover, a measuring scriber, a fixed capacitance sensor and a linear moving capacitance sensor. The fixed capacitance sensor is located on a flat surface on Column 1, flat surface having a length equivalent to the length of Column 1. The linear moving capacitance sensor is located inside the display unit cover positioned to face the fixed capacitance sensor. The fixed capacitive sensor and linear moving capacitive sensors are facing toward each other only, and do not make direct physical contact with the fixed capacitor sensor when the height gauge is operating in upward and downward movements. The fixed and moving capacitive sensors are instead making only electrical contact with each other when the height gauge is making upward and downward movements. This linear direct data non-contact sensor transfer system results in high accuracy of measurements, which also ensures the repeatability of accurate measurements. Also, since the fixed capacitance sensor and the linear moving capacitance sensor have no physical contact with each other, there is no wear and tear damage on either component part, thereby leading to a longer life of use with stability in accurate measurements and repeatability. Because the measuring system is comparatively simple, and easy to assemble and service and maintain compared to the existing rotary capacitive sensor electronic height gauges that exist on the market, the overall cost of production and maintenance is minimized. On the second column (Column 2), a simple rack and gear system is added. These gears of column 2 are connected to a hand wheel located on the rear of the display unit. The handwheel is used for making upward and downward vertical movements. This rack and gear system of column 2 of the present invention is only used to aid the same in making upward and downward movements, and does not affect the measuring accuracy of the height gauge, as it did in the height gauges that have existed on the market.

    Linear measuring machine
    2.
    发明授权
    Linear measuring machine 有权
    线性测量机

    公开(公告)号：US06446351B1

    公开(公告)日：2002-09-10

    申请号：US09547102

    申请日：2000-04-11

    申请人： Yuwu Zhang ,  Masaoki Yamagata ,  Hiroyuki Tokito ,  Yoichi Nomura ,  Bunji Aoyama

    发明人： Yuwu Zhang ,  Masaoki Yamagata ,  Hiroyuki Tokito ,  Yoichi Nomura ,  Bunji Aoyama

    IPC分类号： G01B500

    CPC分类号： G01B7/102 ,  G01B5/061 ,  G01B7/004 ,  G01B7/082

    摘要： A linear measuring machine is provided, the linear measuring machine having a base (11), a column (12) disposed on the base, a slider (14) elevatable along the column and an elevation driving mechanism (44) including a motor for lifting and lowering the slider. The linear measuring machine further includes a touch-and-back mechanism for driving the elevation driving mechanism in a direction for a probe (13) to move away from a measurement surface of the workpiece after fetching a detection value of a displacement sensor (45) when the probe touches the measurement surface of the workpiece and for stopping the elevation driving mechanism.

    摘要翻译： 提供了一种线性测量机，该线性测量机具有基座（11），设置在基座上的立柱（12），可沿着立柱升降的滑块（14）和升降驱动机构（44） 并降低滑块。 线性测量机还包括一个用于在提取位移传感器（45）的检测值之后沿探针（13）的方向驱动仰角驱动机构移动远离工件的测量表面的触摸和后退机构， 当探针接触工件的测量表面并停止升高驱动机构时。

    Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
    3.
    发明授权
    Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus 失效
    电容高度计应用于电子束光刻设备的标线位置检测系统

    公开(公告)号：US4686531A

    公开(公告)日：1987-08-11

    申请号：US717426

    申请日：1985-03-29

    申请人： John R. Shambroom ,  Alan P. Sliski

    发明人： John R. Shambroom ,  Alan P. Sliski

    IPC分类号： G01B7/14 ,  G03F9/00 ,  G08C19/10 ,  H01J37/304

    CPC分类号： G03F9/7053 ,  G01B7/082 ,  G01B7/14 ,  H01J37/304

    摘要： A capacitance height gage for positioning the reticle of an electron beam lithography apparatus. The gage includes a hybrid circuit substrate carrying four measuring and two reference capacitor circuits. Each has a driven plate, the four measuring plates disposed opposite the object surface to be measured, and the two reference plates disposed on the top of the substrate. Two ground plates are disposed a predetermine distance from the reference driven plates. The object surface comprises the ground plate for the four measuring driven plates. The reference plates calibrate the measuring plates.

    摘要翻译： 一种用于定位电子束光刻设备的掩模版的电容高度计。 量具包括一个承载四个测量和两个参考电容电路的混合电路基板。 每个具有从动板，四个测量板与待测对象表面相对设置，并且两个参考板设置在基板的顶部。 两个接地板与基准从动板预定距离。 物体表面包括用于四个测量驱动板的接地板。 参考板校准测量板。

    Methods of extracting fin heights and overlap capacitance and structures for performing the same
    5.
    发明授权
    Methods of extracting fin heights and overlap capacitance and structures for performing the same 有权
    提取翅片高度和重叠电容的方法和执行相同的结构

    公开(公告)号：US08629435B2

    公开(公告)日：2014-01-14

    申请号：US13411307

    申请日：2012-03-02

    申请人： Ming-Horn Tsai ,  Hsiao-Han Liu

    发明人： Ming-Horn Tsai ,  Hsiao-Han Liu

    IPC分类号： H01L23/58

    CPC分类号： G01R27/26 ,  G01B7/082 ,  G01B2210/56 ,  H01L22/34

    摘要： A first test structure includes a first isolation region, a first gate electrode over the first isolation region, a first and a second semiconductor fin, and a first contact plug over the first and the second semiconductor fins. A second test structure includes a second isolation region, a second gate electrode over the second isolation region, a third semiconductor fin and a dielectric fin, and a second contact plug over the third semiconductor fin. The first, the second, and the third semiconductor fins and the dielectric fin have substantially a same fin height. A method includes measuring a first capacitance between the first gate electrode and the first contact plug, measuring a second capacitance between the second gate electrode and the second contact plug, and calculating the same fin height from a capacitance difference between the second capacitance and the first capacitance.

    摘要翻译： 第一测试结构包括第一隔离区域，第一隔离区域上的第一栅极电极，第一和第二半导体鳍片以及第一和第二半导体鳍片上的第一接触插塞。 第二测试结构包括第二隔离区域，第二隔离区域上的第二栅极电极，第三半导体鳍片和介电鳍片，以及在第三半导体鳍片上的第二接触插塞。 第一，第二和第三半导体散热片和介电翅片具有大致相同的翅片高度。 一种方法包括测量第一栅电极和第一接触插塞之间的第一电容，测量第二栅电极和第二接触插塞之间的第二电容，并从第二电容和第一接触插塞之间的电容差计算相同的鳍高度 电容。

    Systems and Methods of Measuring Gap Height
    6.
    发明申请
    Systems and Methods of Measuring Gap Height 审中-公开
    间隙高度测量系统和方法

    公开(公告)号：US20130018611A1

    公开(公告)日：2013-01-17

    申请号：US13545716

    申请日：2012-07-10

    申请人： Ryan A. Sturmer

    发明人： Ryan A. Sturmer

    IPC分类号： G06F19/00

    CPC分类号： G01B7/06 ,  B01L3/502707 ,  B01L3/502792 ,  B01L2200/143 ,  B01L2200/148 ,  B01L2300/0645 ,  B01L2300/0816 ,  G01B7/082

    摘要： A method of determining a gap height in a droplet actuator including measuring an impedance between a droplet operations electrode of a first substrate in a droplet actuator and ground electrode of a second substrate in the droplet actuator, storing a lookup table that associates impedances to heights of gaps between the first substrate and the second substrate, querying the lookup table for the impedance measured between the droplet operations electrode of the first substrate and the ground electrode of the second substrate; and retrieving a height of a gap associated with the impedance.

    摘要翻译： 一种确定液滴致动器中的间隙高度的方法，包括测量液滴致动器中的第一基板的液滴操作电极与液滴致动器中的第二基板的接地电极之间的阻抗，存储将阻抗与高度相关联的查找表 第一基板和第二基板之间的间隙，查询查找表，测量在第一基板的液滴操作电极和第二基板的接地电极之间测得的阻抗; 并且检索与阻抗相关联的间隙的高度。

    Position measuring device and method for determining positions of a measurement object
    9.
    发明申请
    Position measuring device and method for determining positions of a measurement object 审中-公开

    公开(公告)号：US20170261304A1

    公开(公告)日：2017-09-14

    申请号：US15608016

    申请日：2017-05-30

    申请人： Carl Zeiss SMT GmbH

    发明人： Peter VOGT ,  Florian BART

    IPC分类号： G01B7/00 ,  G01B7/06 ,  G01B7/14 ,  G01B7/02

    CPC分类号： G01B7/003 ,  G01B7/023 ,  G01B7/082 ,  G01B7/14

    摘要： In a position measuring device (5) and a method for ascertaining positions of an object (3) to be measured, at least one capacitive position measuring sensor (7) provides a position measurement signal (PM) relating to the object (3) to be measured and at least one capacitive reference measurement sensor (14) provides a reference measurement signal (RM). The measuring sensors (7, 14) are connected to a computing unit (8) which is embodied to calculate a position signal (P) to ascertain the positions from the position measurement signal (PM) and the reference measurement signal (RM). As a result of interfering influences being contained substantially equally in the position measurement signal (PM) and the reference measurement signal (RM) as an interference signal (S), it is possible to determine and eliminate the interference signal (S) during the calculation.