Abrasive article with universal hole pattern
    1.
    发明申请
    Abrasive article with universal hole pattern 有权
    具有通用孔图案的磨料制品

    公开(公告)号:US20030032383A1

    公开(公告)日:2003-02-13

    申请号:US09928157

    申请日:2001-08-10

    IPC分类号: B24B055/02

    CPC分类号: B24B55/102 B24D7/02

    摘要: A universal abrasive article adapted to mount on a mounting surface of a sanding machine having a plurality of dust extraction holes that define an open area. The abrasive article includes a plurality of discrete apertures that are sized and positioned so as to expose a majority of the open area of the dust extraction holes independent of the angular orientation of the abrasive article when the abrasive article is in registration with the mounting surface. The discrete apertures may include elongated, arcuate slots that may be symmetrically positioned about a center point of the abrasive article. In one embodiment, the discrete apertures may include seven arcuate slots. These embodiments also include sufficient abrasive material to provide adequate sanding cut rate and structural integrity during use and removal.

    摘要翻译: 一种通用研磨制品,其适于安装在具有限定开放区域的多个除尘孔的砂光机的安装表面上。 磨料制品包括多个离散的孔,其大小和定位以便当研磨制品与安装表面对准时,与磨料制品的角度定向无关,露出大部分除尘孔的敞开区域。 分立的孔可以包括细长的弧形槽,其可以围绕磨料制品的中心点对称地定位。 在一个实施例中,分立孔可以包括七个弧形槽。 这些实施例还包括足够的研磨材料,以在使用和移除期间提供足够的砂磨切割速率和结构完整性。

    Coherent jet nozzles for grinding application
    2.
    发明申请
    Coherent jet nozzles for grinding application 有权
    用于研磨应用的相干喷嘴

    公开(公告)号:US20040072513A1

    公开(公告)日:2004-04-15

    申请号:US10669817

    申请日:2003-09-24

    发明人: John A. Webster

    摘要: A nozzle assembly and method is configured to apply coherent jets of coolant in a tangential direction to the grinding wheel in a grinding process, at a desired temperature, pressure and flowrate, to minimize thermal damage in the part being ground. Embodiments of the present invention may be useful when grinding thermally sensitive materials such as gas turbine creep resistant alloys and hardened steels. Flowrate and pressure guidelines are provided to facilitate optimization of the embodiments.

    摘要翻译: 喷嘴组件和方法被配置为在研磨过程中以期望的温度,压力和流量在切向方向上施加冷却剂的相干射流,以最小化待磨碎部件中的热损伤。 当研磨热敏材料如燃气轮机耐蠕变合金和硬化钢时,本发明的实施例可能是有用的。 提供流量和压力指南以便于优化实施例。

    Grinding method and grinding machine
    3.
    发明申请
    Grinding method and grinding machine 失效
    研磨方法和研磨机

    公开(公告)号:US20030236059A1

    公开(公告)日:2003-12-25

    申请号:US10383740

    申请日:2003-03-10

    发明人: Hiroshi Morita

    IPC分类号: B24B001/00 B24B055/02

    CPC分类号: B24B55/045

    摘要: In the grinding process, grinding fluid is supplied toward the grinding point where a workpiece is ground with a grinding wheel. At the same time, a fluid jet is ejected across the air flow above the grinding point in the rotational direction of the grinding wheel. As a result, the air layers on both lateral sides of the grinding wheel are turned not to head for the grinding point above the same, whereby the grinding fluid is reliably led to the grinding point without being obstructed by the air layers following both lateral sides of the grinding wheel.

    摘要翻译: 在研磨过程中,将研磨液供给研磨点,在研磨点处,用砂轮研磨工件。 同时,在研磨点上方的空气流沿喷砂轮的旋转方向喷射流体射流。 结果,砂轮的两侧的空气层不转动头部用于其上方的研磨点,由此磨削流体可靠地被引导到研磨点,而不会受到两侧的空气层的阻碍 的砂轮。

    Grinding method and grinding machine
    4.
    发明申请
    Grinding method and grinding machine 有权
    研磨方法和研磨机

    公开(公告)号:US20040029510A1

    公开(公告)日:2004-02-12

    申请号:US10633665

    申请日:2003-08-05

    IPC分类号: B24B055/02

    CPC分类号: B24B55/12 B24B55/045

    摘要: In a grinding machine grinding a workpiece W by a grinding wheel G to supply coolant to one of a grinding point P or the workpiece W by way of a relative movement between the grinding wheel W rotatably supported on a wheel slide 11 and the workpiece W supported by a work support device 17, air layer 36 flowing on a circumferential surface Gc of said grinding wheel G by blowing hydraulic jet 35 transversally from one side to the other side of the grinding wheel G along the circumferential surface Gc at an upper stream position of a rotational direction of the grinding wheel G from the grinding point P. Mist of coolant blown by the hydraulic jet 35 through a recovering port 37, 43, 53 mounted on a wheel guard 20 covering a part of the grinding wheel G.

    摘要翻译: 在研磨机中,通过研磨轮G研磨工件W,以通过可旋转地支撑在车轮滑块11上的砂轮W与被支撑的工件W之间的相对移动来将冷却剂供给到研磨点P或工件W中的一个 通过工件支撑装置17,空气层36在所述砂轮G的圆周表面Gc上流动,沿着圆周表面Gc沿着圆周表面Gc横向地沿着砂轮G的一侧横向地吹扫液压射流35 砂轮G从磨削点P的旋转方向。液压喷射器35通过安装在覆盖砂轮G的一部分的轮护罩20上的回收口37,43,53吹送的冷却剂雾。

    Adhesive-backed sandpaper disc for attachment to circular saw blade to provide dynamic balancing and vibration damping and method
    5.
    发明申请
    Adhesive-backed sandpaper disc for attachment to circular saw blade to provide dynamic balancing and vibration damping and method 审中-公开
    粘贴背面的砂纸盘,用于连接圆锯片,以提供动态平衡和振动阻尼和方法

    公开(公告)号:US20020081957A1

    公开(公告)日:2002-06-27

    申请号:US10025592

    申请日:2001-12-26

    IPC分类号: B24B055/02

    摘要: An adhesive-backed sandpaper disc is affixed to the side wall of a standard off-the-shelf circular saw blade having two opposed flat planar faces devoid of any recesses and surrounded by a periphery of cutting teeth. The disc is made in a generally circular shape with an abrasive affixed on one surface and a layer of adhesive provided on an opposite surface covered with a release paper to prevent contamination before use. The sandpaper disc includes a plurality of slots extending toward or to the periphery of the disc which combine with the surface of the saw blade to create recesses that permit channeling of saw dust created during cutting and sanding operations. In an alternative embodiment, the slots can spiral in an arcuate path from adjacent the center of the disc to the periphery to enhance the ability of the slots to channel saw dust radially outwardly from the disc. A plurality of holes form cylindrical recesses in conjunction with the face of the saw blade to which the disc is affixed. These recesses permit dissipation of heat from the saw blade and also provide locations where saw dust can be retained so that it does not interfere with cutting and sanding operations. The disc not only sands the sides created during cutting operations but also dampens vibrations, balances the saw blade, and reduces noise. A method of using the disc is also disclosed.

    摘要翻译: 粘合剂背面的砂纸盘固定到标准现成的圆锯片的侧壁上,该圆形锯片具有两个相对的平坦的平面,没有任何凹槽并被切割齿的周边包围。 盘被制成大致圆形形状,附着在一个表面上的磨料和一层粘合剂,其设置在用隔离纸覆盖的相对表面上,以防止在使用前被污染。 砂纸盘包括朝向或朝向盘的周边延伸的多个槽,其与锯片的表面组合以产生允许在切割和砂磨操作期间产生的锯屑的通道的凹槽。 在替代实施例中,槽可以从邻近盘的中心到周边的弧形路径螺旋形,以增强槽从盘径向向外引导锯屑的能力。 多个孔与盘片固定在其上的锯片的表面一起形成圆柱形凹槽。 这些凹槽允许从锯片散热并且还提供可以保持锯屑的位置,使得其不干扰切割和打磨操作。 光盘不仅会在切割过程中产生的边缘磨砂,而且还会抑制振动,平衡锯片,并降低噪音。 还公开了使用该盘的方法。

    Polishing method and apparatus
    6.
    发明申请
    Polishing method and apparatus 失效
    抛光方法和设备

    公开(公告)号:US20040087258A1

    公开(公告)日:2004-05-06

    申请号:US10694047

    申请日:2003-10-28

    CPC分类号: B24B37/345

    摘要: A polishing apparatus is used for chemical mechanical polishing a copper (Cu) layer formed on a substrate such as a semiconductor wafer and then cleaning the polished substrate. The polishing apparatus has a polishing section having a turntable with a polishing surface and a top ring for holding a substrate and pressing the substrate against the polishing surface to polish a surface having a semiconductor device thereon, and a cleaning section for cleaning the substrate which has been polished. The cleaning section has an electrolyzed water supply device for supplying electrolyzed water to the substrate to clean the polished surface of the substrate while supplying electrolyzed water to the substrate.

    摘要翻译: 抛光装置用于化学机械抛光形成在诸如半导体晶片的基板上的铜(Cu)层,然后清洁抛光的基板。 抛光装置具有研磨部,该研磨部具有带有抛光面的转盘和用于保持基板的顶环,并将基板按压在研磨面上,以对其上具有半导体器件的表面进行抛光;以及清洗部, 被抛光 清洗部具有电解供水装置,用于向基板供给电解水,以清洗基板的抛光表面,同时向基板供应电解水。

    Eyeglass lens processing apparatus
    7.
    发明申请
    Eyeglass lens processing apparatus 失效
    眼镜镜片加工设备

    公开(公告)号:US20020106973A1

    公开(公告)日:2002-08-08

    申请号:US10026780

    申请日:2001-12-27

    申请人: NIDEK CO., LTD.

    发明人: Toshiaki Mizuno

    IPC分类号: B24B049/00 B24B055/02

    CPC分类号: B24B55/02 B24B9/14 B24B49/00

    摘要: An eyeglass lens processing apparatus for processing a periphery of an eyeglass lens, includes: a processing chamber in which a lens processing tool is disposed, the processing chamber having a drainage port; a water supply unit which supplies water for lens processing to an interior of the processing chamber; a drainpipe connected to the drainage port; a sensor which detects an amount of the water within the processing chamber or the drainpipe; and a controller which controls the water supply unit based on a result of detection by the sensor.

    摘要翻译: 一种用于处理眼镜镜片周边的眼镜镜片处理装置,包括:处理室,其中设置透镜加工工具,所述处理室具有排出口; 供水单元,其向处理室的内部供应用于透镜处理的水; 连接到排水口的排水管; 传感器,其检测处理室或排水管内的水量; 以及基于传感器的检测结果来控制供水单元的控制器。

    Method and apparatus for releasably attaching a polishing pad to a chemical-mechanical planarization machine

    公开(公告)号:US20020045407A1

    公开(公告)日:2002-04-18

    申请号:US09928173

    申请日:2001-08-09

    摘要: A method and apparatus for releasably attaching a planarizing medium, such as a polishing pad, to the platen of a chemical-mechanical planarization machine. In one embodiment, the apparatus can include several apertures in the upper surface of the platen that are coupled to a vacuum source. When a vacuum is drawn through the apertures in the platen, the polishing pad is drawn tightly against the platen and may therefore be less likely to wrinkle when a semiconductor substrate is engaged with the polishing pad during planarization. When the vacuum is released, the polishing pad can be easily separated from the platen. The apparatus can further include a liquid trap to separate liquid from the fluid drawn by the vacuum source through the apertures, and can also include a releasable stop to prevent the polishing pad from separating from the platen should the vacuum source be deactivated while the platen is in motion. In another embodiment, a signal can be applied to the platen to draw the polishing pad toward the platen via electrostatic or electromagnetic forces. In still another embodiment, the polishing pad can be attached to a pad support and conditioned on a separate jig.

    Grinding wheel
    9.
    发明申请
    Grinding wheel 有权
    砂轮

    公开(公告)号:US20030032382A1

    公开(公告)日:2003-02-13

    申请号:US09972872

    申请日:2001-10-10

    IPC分类号: B24B055/02

    CPC分类号: B24B7/228 B24D7/10

    摘要: A grinding wheel comprises an annular base and a grinding stone means mounted on the under surface of the base. A coolant pool which is open inward in a radial direction is formed in the inner surface of the base.

    摘要翻译: 砂轮包括安装在基座的下表面上的环形基座和磨石装置。 在基座的内表面形成有沿径向向内开口的冷却剂池。

    Machining device and methods
    10.
    发明申请
    Machining device and methods 审中-公开
    加工装置及方法

    公开(公告)号:US20020173247A1

    公开(公告)日:2002-11-21

    申请号:US10038290

    申请日:2001-10-19

    发明人: Gregory A. Hyatt

    CPC分类号: B24D5/10 B24B55/02

    摘要: A machining device includes a tool with a rotational axis and porous material with an outer peripheral surface disposed about the rotational axis and adapted to machine a surface of a workpiece. The machining device further includes a fluid delivery device oriented relative to the tool to disperse fluid to contact the tool primarily at a location inboard from the outer peripheral surface of the tool such that dispersed fluid is capable of flowing through the porous material. The machining device provides a controlled radial discharge of fluid at a workpiece surface in use. Methods of machining a workpiece are also provided.

    摘要翻译: 加工装置包括具有旋转轴线的工具和具有围绕旋转轴线设置并适于加工工件表面的外周表面的多孔材料。 加工装置还包括相对于工具定向的流体输送装置,以分散流体以主要在工具的外周表面的内侧的位置接触工具,使得分散的流体能够流过多孔材料。 加工装置在使用中提供在工件表面处的流体的受控的径向排放。 还提供了加工工件的方法。