公开(公告)号：US06214248B1

公开(公告)日：2001-04-10

申请号：US09190070

申请日：1998-11-12

申请人： Janel Koca Browning ,  Melvin Robert Jackson

发明人： Janel Koca Browning ,  Melvin Robert Jackson

IPC分类号： B31D300

CPC分类号： B23P15/04 ,  B23P2700/13 ,  F01D5/147 ,  F01D5/18 ,  F01D5/187 ,  F02K9/64 ,  Y10T29/49341

摘要： A method of forming an internal channel within an article, such as a cooling channel in an air-cooled blade, vane, shroud, combustor or duct of a gas turbine engine. The method generally entails forming a substrate to have a groove recessed in its surface. A solid member is then placed in the groove, with the solid member being sized and configured to only partially fill the groove so that a void remains in the groove. The void is then filled with a particulate material so that the groove is completely filled. A layer is then deposited on the surface of the substrate and over the solid member and the particulate material in the groove, after which at least the solid member is removed from the groove to form the channel in the substrate beneath the layer.

摘要翻译： 一种在诸如燃气涡轮发动机的风冷叶片，叶片，护罩，燃烧器或管道中的冷却通道的物品内形成内部通道的方法。 该方法通常需要形成基底以在其表面上凹陷的凹槽。 然后将实心构件放置在凹槽中，其中实心构件的尺寸和构造仅仅部分地填充凹槽，使得凹槽保留在凹槽中。 然后用颗粒材料填充空隙，使得槽完全填充。 然后将一层沉积在基材的表面上，并且在固体构件和凹槽中的颗粒材料之上沉积，之后至少将固体构件从凹槽移除以在该层下方的基底中形成通道。

公开(公告)号：US06444135B1

公开(公告)日：2002-09-03

申请号：US09688722

申请日：2000-10-16

申请人： Murali Hanabe ,  Risaku Toda

发明人： Murali Hanabe ,  Risaku Toda

IPC分类号： B31D300

CPC分类号： B81C1/00198 ,  B81B2201/0235 ,  B81B2201/025

摘要： A method and system for making a gas permeable shell in a micro electromechanical systems (MEMS) device is disclosed. The MEMS device is created with an internal sacrificial layer. The device is then coated with a slurry composition which, after drying, is later exposed to a solvent. As a result, the sacrificial layer is removed to produce interconnected voids.

摘要翻译： 公开了一种用于在微机电系统（MEMS）装置中制造气体可渗透外壳的方法和系统。 MEMS器件由内部牺牲层制成。 然后用浆料组合物涂覆该装置，其在干燥之后稍后暴露于溶剂中。 结果，牺牲层被去除以产生互连的空隙。

公开(公告)号：US06319419B1

公开(公告)日：2001-11-20

申请号：US09439139

申请日：1999-11-12

申请人： Tateo Ohhashi ,  Atsushi Fukushima ,  Hideyuki Takahashi

发明人： Tateo Ohhashi ,  Atsushi Fukushima ,  Hideyuki Takahashi

IPC分类号： B31D300

CPC分类号： C23C16/4404 ,  C23C14/564

摘要： A technique to prevent peeling of deposits formed on the surface of the inner walls of the thin-film formation apparatus and the members inside the apparatus and to suppress particle production without contamination of the inside of the apparatus. A member for a thin-film formation apparatus having inner walls and a method for manufacturing the member is provided. A plurality of unevenness is provided on at least a portion of the surface of the member and the inner walls on which unnecessary thin films are deposited. The surfaces are subjected to masking, and then, etching processing to form the plurality of unevenness. After the etching processing the masking is removed.

摘要翻译： 防止形成在薄膜形成装置的内壁的表面上的沉积物的剥离和装置内部的构件的技术，并且抑制颗粒生成而不会污染装置的内部。 提供具有内壁的薄膜形成装置的构件和用于制造构件的方法。 在构件的表面的至少一部分和其上沉积不需要的薄膜的内壁上设置多个不均匀性。 对表面进行掩蔽，然后进行蚀刻处理以形成多个不平坦部。 在蚀刻处理之后，去除掩模。

公开(公告)号：US06171512B2

公开(公告)日：2001-01-09

申请号：US08472270

申请日：1995-06-07

申请人： Kiyofumi Sakaguchi ,  Takao Yonehara ,  Nobuhiko Sato

发明人： Kiyofumi Sakaguchi ,  Takao Yonehara ,  Nobuhiko Sato

IPC分类号： B31D300

CPC分类号： H01L21/76256 ,  H01L21/0203 ,  H01L21/02381 ,  H01L21/0242 ,  H01L21/02422 ,  H01L21/0245 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/76251

摘要： A method for preparing a semiconductor member comprises: forming a substrate having a non-porous silicon monocrystalline layer and a porous silicon layer; bonding another substrate having a surface made of an insulating material to the surface of the monocrystalline layer; and etching to remove the porous silicon layer by immersing in an etching solution.

公开(公告)号：US06461528B1

公开(公告)日：2002-10-08

申请号：US09699114

申请日：2000-10-27

申请人： Axel Scherer ,  Theodore Doll ,  Thomas Hoffman

发明人： Axel Scherer ,  Theodore Doll ,  Thomas Hoffman

IPC分类号： B31D300

CPC分类号： B01L3/5082 ,  B01J2219/00317 ,  B01J2219/00783 ,  B01J2219/00844 ,  B01J2219/00907 ,  B01L2200/12 ,  B82Y15/00 ,  C40B60/14 ,  G01Q80/00

摘要： Lateral pores in a thin metal film as well as fabricating branching and expanding ore arrays can be fabricated by a method of growing long pores laterally underneath a ask by use of stress compliant masks or varying the anodization voltage. Applications range from use with scanning electron microscope (SEM-compatible single molecule probe stations), to nanowire fixtures and to the use with a “pixelating, nonscanning” near field optical microscope (NOM). Pores are defined by conventional anodization vertically into the underlying membrane of preporous material through any overlying masking layers. The general solution is to utilize mechanically stable masks that withstand the stress during anodization and counteract the pore formation stress to lead to good pore ordering and directed growth. Multilayer masks are well suited for this. With a composition of materials having different elastic properties, tensile stress can be matched to counteract compressive stress caused by porous material growth. The boundary stress problem between preporous and porous material is solved by using a planarizing mask material that provides locally increased masking layer thickness at the critical boundary between nonporous and porous material in the film.

摘要翻译： 薄金属膜中的侧向孔以及制造分支和扩展的矿石阵列可以通过使用应力柔顺掩模或改变阳极氧化电压在问题下横向生长长孔的方法来制造。 应用范围从使用扫描电子显微镜（SEM兼容单分子探针站）到纳米线夹具以及使用“像素化，非选择”近场光学显微镜（NOM）。 通过常规的阳极氧化，通过任何叠加的掩蔽层将孔定义为预浸材料的下面的膜。 一般的解决方案是利用在阳极氧化过程中承受应力的机械稳定的掩模，并抵消孔隙形成应力以导致良好的孔排序和定向生长。 多层面罩非常适合这一点。 通过具有不同弹性特性的材料组成，拉伸应力可以匹配以抵消由多孔材料生长引起的压缩应力。 通过使用在膜中无孔和多孔材料的临界边界处提供局部增加的掩蔽层厚度的平面化掩模材料来解决预型和多孔材料之间的边界应力问题。

公开(公告)号：US06350389B1

公开(公告)日：2002-02-26

申请号：US09276907

申请日：1999-03-26

申请人： Akira Fujishima ,  Hideki Masuda

发明人： Akira Fujishima ,  Hideki Masuda

IPC分类号： B31D300

CPC分类号： C30B33/00 ,  C30B29/04

摘要： A method for producing a porous diamond according to the present invention comprises steps of forming an anodized alumina layer, which functions as a mask, on a diamond substrate; and performing a plasma etching treatment to form pores on the diamond substrate, which pores have the same arrangement as those of the anodized alumina mask.

摘要翻译： 根据本发明的多孔金刚石的制造方法包括在金刚石基材上形成用作掩模的阳极化氧化铝层的步骤; 并且进行等离子体蚀刻处理以在金刚石基底上形成孔，该孔具有与阳极化氧化铝掩模相同的布置。

公开(公告)号：US06183836B2

公开(公告)日：2001-02-06

申请号：US08983097

申请日：1998-05-06

申请人： Jochen Pflug

发明人： Jochen Pflug

IPC分类号： B31D300

CPC分类号： E04C2/365 ,  E04C2/3405 ,  E04C2002/3455 ,  E04C2002/3461 ,  E04C2002/3472 ,  Y10T428/24149 ,  Y10T428/24165

摘要： A folded honeycomb, in particular a sandwich core layer, with walls (22) which are arranged in a rectangular or hexagonal configuration and which are perpendicular to the cover layers, for lightweight structures which are formed from a flat body of metal, plastic material, cloth, fiber composite material or paper by the production of cuts and by folding to constitute rectangular corrugations. The folded honeycomb has relatively large connecting surfaces (13, 16) for connection to the cover layers.

摘要翻译： 折叠的蜂窝体，特别是夹心芯层，具有矩形或六边形构造并垂直于覆盖层的壁（22），用于由平坦的金属体，塑料材料形成的轻质结构， 布，纤维复合材料或纸通过生产切口和折叠构成矩形波纹。 折叠的蜂窝体具有用于连接到覆盖层的相对较大的连接表面（13,16）。