Focused ion beam apparatus for forming thin-film magnetic recording heads
    2.
    发明授权
    Focused ion beam apparatus for forming thin-film magnetic recording heads 有权
    用于形成薄膜磁记录头的聚焦离子束装置

    公开(公告)号:US06354438B1

    公开(公告)日:2002-03-12

    申请号:US09370753

    申请日:1999-08-09

    IPC分类号: C23C1454

    摘要: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling. In this manner, the focused particle beam system mills the second structural element to produce a desired pole-tip configuration. By producing a desired pole-tip configuration, these methods and apparatus produce an improved recording head capable of higher storage density than prior art techniques.

    摘要翻译: 本发明涉及用于生产改进的薄膜记录头的多层光刻制造装置。 它还涉及一种用于在不照射敏感结构的情况下研磨记录头极尖组件的聚焦粒子束系统。 读头,记录头。 本发明通过研磨第二结构元件而不照射第一结构元件来精确地形成极尖组件。 本发明通过将可以成像和/或损坏的第一标记元件放置在与第一结构元件相同的多层光刻制造器件的相同层中来避免照射第一结构元件。 标记元件与第一结构元件具有固定的空间关系。 因此,通过对第一标记元件和第二结构元件进行成像,并且知道第一结构元件和第一标记元件之间的间隔,聚焦的粒子束系统可以确定第一和第二结构元件的相对位置。 因此,聚焦的粒子束系统可以在不照射敏感的第一结构元件的情况下确定第二结构元件的哪些部分需要研磨。 以这种方式,聚焦的粒子束系统研磨第二结构元件以产生期望的极尖构造。 通过产生期望的极尖构造,这些方法和装置产生能够比现有技术更高的存储密度的改进的记录头。

    Device and method for coating substrates in a vacuum utilizing an absorber electrode
    3.
    发明授权
    Device and method for coating substrates in a vacuum utilizing an absorber electrode 有权
    使用吸收电极在真空中涂布基板的装置和方法

    公开(公告)号:US06533908B1

    公开(公告)日:2003-03-18

    申请号:US09763636

    申请日:2001-03-12

    IPC分类号: C23C1454

    CPC分类号: H01J37/32055 H01J2237/022

    摘要: The invention relates to a device and method for coating substrates in a vacuum, wherein a plasma is to be generated from a target and ionized particles of the plasma are to be deposited on the substrate in the form of a layer, as has long been used in a very wide range of known PVD processes. The intention of the invention is to prevent droplets and particles from settling in the applied layer, which droplets and particles have an adverse effect on the properties of the layer, or at least to reduce the number of these droplets and particles. To solve this problem, an absorber electrode which is at an electrically positive potential is used, which electrode is a few mm away from the root of the plasma, and is arranged in front of or next to the plasma in such a way and is shaped in such a way that an electric field is formed around the absorber electrode. The electric field vector is to be oriented at least approximately orthogonally to the direction of movement of the ionized particles of the plasma.

    摘要翻译: 本发明涉及一种用于在真空中涂覆基板的装置和方法,其中将从靶产生等离子体,等离子体的离子化的颗粒将以层的形式沉积在基板上,如早已使用 在非常广泛的已知PVD工艺中。 本发明的目的是防止液滴和颗粒沉积在施加的层中,这些液滴和颗粒对该层的性质具有不利影响,或至少减少这些液滴和颗粒的数量。 为了解决这个问题,使用处于正电位的吸收体电极,该电极距离等离子体的根部几毫米,并且以这样的方式布置在等离子体的前面或旁边,并且成形 以这样的方式在吸收体电极周围形成电场。 电场矢量至少大致与等离子体的电离粒子的运动方向垂直。

    Multiple source deposition process

    公开(公告)号:US06610352B2

    公开(公告)日:2003-08-26

    申请号:US09747315

    申请日:2000-12-22

    IPC分类号: C23C1454

    摘要: A method for the deposition of a thin film of a pre-determined composition e.g. a phosphor, onto a substrate, in which the composition is a ternary, quaternary or higher composition, especially a composition selected from the group consisting of thioaluminates, thiogallates and thioindates of at least one element from Groups IIA and IIB of the Periodic Table. In the embodiment, the method comprises placing a pellet of at least one sulfide on a first source and placing a pellet of at least one sulfide on a second source, with one pellet containing dopant. Vapor deposition onto the substrate is effected with separate electron beams. The rate of vaporizing of the sulfides is monitored with separate shielded coating rate monitors. The temperature of the sources is controlled to obtain the composition on the substrate. The method is particularly used for deposition of ternary or quaternary phosphors on substantially opaque substrates in electroluminescent devices.

    Protective coating for a magneto-optical disc

    公开(公告)号:US06576095B2

    公开(公告)日:2003-06-10

    申请号:US09977102

    申请日:2001-10-12

    申请人: Ga-Lane Chen

    发明人: Ga-Lane Chen

    IPC分类号: C23C1454

    摘要: A magneto-optical disc includes protective overcoats that significantly improve the durability of the disc. In particular, the protective overcoat involves a carbon layer over the magnetic, optical data storage layer. The magnetic, optical data storage layer includes a magnetic metal or alloy with a Curie temperature accessible by optical heating. In preferred embodiments, the carbon coating has a small absorption coefficient for selected optical frequencies.

    Industrial vapor conveyance and deposition
    6.
    发明授权
    Industrial vapor conveyance and deposition 失效
    工业蒸汽输送和沉积

    公开(公告)号:US06248399B1

    公开(公告)日:2001-06-19

    申请号:US08776381

    申请日:1997-03-03

    申请人: Franz Hehmann

    发明人: Franz Hehmann

    IPC分类号: C23C1454

    摘要: The invention pertains to porous diaphragm-controlled physical and chemical vapor conveyance and separation using condenser and diaphragm technology with a transdiaphragm selectivity Sk=1 or practically 1 and with a flow rate driven by the pump speed at the input of the pump station in the vacuum chamber of vapor separation level and the resulting, i.e., forced convection. The expanded diaphragm technique for suction-flow global vapor conveyance and separation is also used for flows driven locally by the vapor pressure. Novel diaphragm functions and novel process configurations and operational levels are described, the motive force for the massive conveyance between vapor source and separation and resulting productivity being set and limited by a gas/vapor produced by an external pump system, wherein the total gas-suction flow can locally assume very high flow speeds, m especially before separation, and thus permit new manipulations for product design and product quality. In the case of non-separation pulse transfer, including the use of an inert carrier gas component, and external cyclone and/or an external vapor separator and/or gas scrubbers can optionally be used in addition to the external pump system following passage through the vapor separation chamber. When a carrier gas is used, the gas is recycled into the gas supply system and reused.

    摘要翻译: 本发明涉及使用冷凝器和隔膜技术的多孔隔膜控制的物理和化学气相输送和分离,其具有隔膜选择性Sk = 1或实际上为1,并且在真空中泵站输入处的泵速度驱动的流量 蒸汽分离水平和所产生的,即强制对流。 用于抽吸流全局蒸气输送和分离的扩展隔膜技术也用于通过蒸汽压力局部驱动的流动。 描述了新颖的隔膜功能和新颖的工艺结构和操作水平,蒸气源与分离之间的大规模输送的动力以及所产生的生产率由外部泵系统产生的气体/蒸气设定和限制,其中总吸气 流动可以局部地采取非常高的流速,特别是在分离之前,因此允许对产品设计和产品质量进行新的操作。 在非分离脉冲转移的情况下,包括使用惰性载气组分,以及外部旋风分离器和/或外部蒸汽分离器和/或气体洗涤器除了通过外部泵系统之外还可以任选地被使用 蒸气分离室。 当使用载气时,气体被再循环到气体供应系统中并重新使用。