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公开(公告)号:US07476855B2
公开(公告)日:2009-01-13
申请号:US11523144
申请日:2006-09-19
申请人: Yongzhang Huang
发明人: Yongzhang Huang
IPC分类号: H01J37/137 , H01J37/30 , H01J49/20 , H01J49/30 , H01J37/304
CPC分类号: H01J49/30 , H01J37/026 , H01J37/05 , H01J37/21 , H01J37/304 , H01J37/3171 , H01J2237/024 , H01J2237/055 , H01J2237/057 , H01J2237/1502 , H01J2237/152 , H01J2237/2485 , H01J2237/3045 , H01J2237/30455 , H01J2237/31701
摘要: An ion implantation apparatus, system, and method for controlling an ion beam, wherein a mass analyzer generally positioned between an ion source and an end station is configured to selectively control a path of a desired ion beam. The mass analyzer comprises one or more of an entrance pole mechanism positionable proximate to an entrance of the mass analyzer and an exit pole mechanism positionable proximate to an exit of the mass analyzer, wherein the position of the entrance pole mechanism and exit pole mechanism generally determines the path and focal point of the desired ion beam. A controller is configured to selectively position one or more of the entrance pole mechanism and exit pole mechanism, therein generally controlling the path of the desired ion beam at the exit of the mass analyzer, wherein the control may be based on one or more detected characteristics of the desired ion beam.
摘要翻译: 用于控制离子束的离子注入装置,系统和方法,其中通常定位在离子源和终端站之间的质量分析器被配置为选择性地控制期望的离子束的路径。 质量分析器包括一个或多个可靠近质量分析器的入口定位的入口极机构和靠近质量分析器的出口定位的出口极机构,其中入口极机构和出口极机构的位置通常确定 所需离子束的路径和焦点。 控制器被配置为选择性地定位入口极机构和出口极机构中的一个或多个,其中通常控制质量分析器出口处的期望离子束的路径,其中控制可以基于一个或多个检测到的特性 的所需离子束。