Emission device with a cadmium lamp
    1.
    发明授权
    Emission device with a cadmium lamp 失效
    带镉灯的排放装置

    公开(公告)号:US5589735A

    公开(公告)日:1996-12-31

    申请号:US506829

    申请日:1995-07-25

    CPC classification number: G03F7/70016 H01J61/30 H01J61/74

    Abstract: An emission device which operates a cadmium lamp with a light intensity sufficient for used in industrial applications is achieved by an emission device having a cadmium lamp with a fluorescent tube within which a cathode and an anode are space a small distance apart and a buffer gas for easier initiation of luminous operation and metallic cadmium in an amount per unit volume of the fluorescent tube of 1.times.10.sup.-4 g/cm.sup.3 to 3.times.10.sup.-3 g/cm.sup.3 are encapsulated, and a power source device for supplying an electrical input between the cathode and the anode in an electrical input range from 0.5 kW to 5.0 kW with the condition:6.03+2.79 W.ltoreq.r.ltoreq.40being satisfied, where the electrical input of the power source device into the cadmium lamp in steady-state luminous operation is W (kW) and the maximum inside radius of the fluorescent tube is r (mm).

    Abstract translation: 操作具有足以用于工业应用的光强度的镉灯的发射装置通过具有镉灯的发射装置来实现,所述镉灯具有荧光管,阴极和阳极间隔开小间隔,并且缓冲气体用于 封装了1×10 -4 g / cm 3〜3×10 -3 g / cm 3的荧光灯的单位体积的发光操作的更容易的起始和金属镉,以及用于在阴极和阴极之间提供电输入的电源装置 在0.5kW至5.0kW的电输入范围内的阳极,条件为:6.03 + 2.79W

    Metallic ion source
    2.
    发明授权

    公开(公告)号:US10418220B2

    公开(公告)日:2019-09-17

    申请号:US16313051

    申请日:2017-11-30

    Abstract: Metallic ion source for resolving the issue of not being able to produce high-density ions efficiently with small-scale ion sources in situations where an electron beam injecting scheme is employed as the evaporation source to evaporate a solid, and for producing high-density ions highly efficiently. Designed to be compact and lightweight, the metallic ion source also facilitates selection of the ion extraction direction. The ion source, structured exploiting the characteristic physical property that whether ionization takes place is dependent on the energy of the electron beam, is furnished with a dual evaporation-plasma chamber that inside the same chamber enables a high-speed electron beam, whose ionization efficiency is low, and low-speed electrons generated by electric discharge, whose ionization efficiency is high, to participate independently and simultaneously in, respectively, evaporation of precursor and ionization action.

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