公开(公告)号：US5997659A

公开(公告)日：1999-12-07

申请号：US916194

申请日：1997-08-21

申请人： Michael Lisiansky ,  Valentina Korchnoy

发明人： Michael Lisiansky ,  Valentina Korchnoy

IPC分类号： H01L21/302 ,  H01L21/309

CPC分类号： H01L21/302

摘要： The invention provides a method for treating devices based on semiconductor and dielectric materials for improving their electrical, photoelectric, optical, luminescent and noise characteristics, for decreasing internal residual stresses in heterostructures and for increasing the device lifetime and the stability of its parameters. The method comprises subjecting the device to acoustic vibrations in the frequency range of 0.01 to 100 MHz, at an amplitude of relative acoustic strain in the range of 0.2.multidot.10.sup.-5 to 8.multidot.10.sup.-5, for a period of at least 0.25 hour.

摘要翻译： 本发明提供了一种用于处理基于半导体和电介质材料的器件的方法，用于改善其电，光电，光学，发光和噪声特性，以减少异质结构中的内部残余应力，并增加器件寿命及其参数的稳定性。 该方法包括使器件在0.01至100MHz的频率范围内以0.2×10 -5至8×10 -5范围内的相对声学应变幅度进行至少0.25小时的声振动。

公开(公告)号：US5951724A

公开(公告)日：1999-09-14

申请号：US030803

申请日：1998-02-26

申请人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda ,  Kazuhiko Kato

发明人： Kenzo Hanawa ,  Naoyoshi Mochizuki ,  Naruo Ueda ,  Kazuhiko Kato

IPC分类号： B24B37/00 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y99/00 ,  C01B33/113 ,  C01B33/18 ,  C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/3105 ,  C01R17/00 ,  H01L21/309

CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1454

摘要： A fine particulate polishing agent comprises fine particles of a solid solution composed of single-crystal ceric oxide and silicon dioxide and fine particles of silicon dioxide. A slurry polishing agent comprising the fine particulate polishing agent can be prepared by a method which comprises the steps of mixing, with stirring, single-crystal ceric oxide fine particles, silica sol and a liquid; drying the mixture; subjecting the dried particulate material to a thermal treatment at a high temperature and then cooling the solid solution powder formed by the thermal treatment and composed of single crystal ceric oxide and silicon dioxide; again mixing the powder with silica sol and a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry.

摘要翻译： 细颗粒抛光剂包括由单晶氧化铈和二氧化硅组成的固溶体的微粒和二氧化硅的微粒。 包含微粒抛光剂的浆料抛光剂可以通过包括以下步骤的方法制备：在搅拌下混合单晶氧化铈细颗粒，二氧化硅溶胶和液体; 干燥混合物; 使干燥的颗粒材料在高温下进行热处理，然后冷却由热处理形成的固溶粉末，并由单晶氧化铈和二氧化硅组成; 再次将粉末与硅溶胶和液体混合; 然后使用湿磨粉碎机对混合物进行解聚，得到浆料。