Multi-tier deep trench capacitor and methods of forming the same

    公开(公告)号:US12040353B2

    公开(公告)日:2024-07-16

    申请号:US17458961

    申请日:2021-08-27

    摘要: A first-tier capacitor assembly is formed, which includes a first alternating layer stack embedded within a first substrate and including at least two first metallic electrode layers interlaced with at least one first node dielectric layer, and first metallic bonding pads located on a first front surface. A second-tier capacitor assembly is formed, which includes a second alternating layer stack embedded within a second substrate and including at least two second metallic electrode layers interlaced with at least one second node dielectric layers, and second metallic bonding pads located on a second backside surface. The second metallic bonding pads are bonded to the first metallic bonding pads such that each of the at least two first metallic electrode layers contacts a respective one of the at least two second metallic electrode layers. A capacitor with increased capacitance is provided.

    High-voltage feed-through capacitor

    公开(公告)号:US11862405B2

    公开(公告)日:2024-01-02

    申请号:US18082007

    申请日:2022-12-15

    申请人: TDK CORPORATION

    摘要: An element body is formed with a through hole to be open at a first main surface and a second main surface opposing each other. A through-conductor includes a first portion located inside the through hole and a second portion protruding from the second main surface. A case surrounds the element body and is electrically insulating. A cover surrounds the second portion and is electrically insulating. A first resin is contained in the case and coats the element body. A second resin is contained in the cover and is located in a space between an inner surface of the element body and the first portion. The second resin has an electrical resistivity less than an electrical resistivity of the first resin.

    DEFORMATION-RESISTANT DEEP TRENCH CAPACITOR STRUCTURE AND METHODS OF FORMING THE SAME

    公开(公告)号:US20230063050A1

    公开(公告)日:2023-03-02

    申请号:US17458984

    申请日:2021-08-27

    发明人: Fu-Chiang KUO

    IPC分类号: H01L49/02 H01G4/35 H01G4/30

    摘要: A semiconductor structure includes a substrate containing first-type deep trenches and second-type deep trenches. The first-type deep trenches and the second-type deep trenches have lengthwise sidewalls that laterally extend along different directions. The semiconductor structure includes a capacitor structure, which includes a layer stack containing at least three metallic electrode layers interlaced with at least two node dielectric layers. Each layer within the layer stack includes a horizontally-extending portion that overlies a top surface of the substrate and vertically-extending portions that protrude downward into a respective one of the first-type deep trenches and second-type deep trenches. The different orientations of the lengthwise directions of the deep trenches reduces deformation of the semiconductor structure. Stress-relief structures may be formed in corner regions of the capacitor structure to provide structural reinforcement.

    ECA oxide-resistant connection to a hermetic seal ferrule for an active implantable medical device

    公开(公告)号:US11541233B2

    公开(公告)日:2023-01-03

    申请号:US17181416

    申请日:2021-02-22

    申请人: Greatbatch Ltd.

    摘要: A hermetically sealed feedthrough assembly for an active implantable medical device having an oxide-resistant electrical attachment for connection to an EMI filter, an EMI filter circuit board, an AIMD circuit board, or AIMD electronics. The oxide-resistant electrical attachment, including an oxide-resistant sputter layer 165 is disposed on the device side surface of the hermetic seal ferrule over which an ECA stripe is provided. The ECA stripe may comprise one of a thermal-setting electrically conductive adhesive, an electrically conductive polymer, an electrically conductive epoxy, an electrically conductive silicone, an electrically conductive polyimide, or a thermal-setting electrically conductive polyimide, such as those manufactured by Ablestick Corporation. The oxide-free electrical attachment between the ECA stripe and the filter or AIMD circuits may comprise one of gold, platinum, palladium, silver, iridium, rhenium, rhodium, tantalum, tungsten, niobium, zirconium, vanadium, and combinations or alloys thereof.

    Implantable Medical Device Without a Wire-Wound Coil Configured to Receive Wireless Power from an External Charger

    公开(公告)号:US20220323771A1

    公开(公告)日:2022-10-13

    申请号:US17596018

    申请日:2020-06-08

    IPC分类号: A61N1/372 H01G4/35

    摘要: Implantable medical devices (IMDs) are disclosed which are capable of wirelessly receiving power from a magnetic field to power the IMD or charge its battery, but which do not use a wire-wound coil for magnetic field reception. The IMD can include a case housing control circuitry for the IMD, in which at least a portion of the case is conductive, with a case current formed in the conductive case portion in response to the magnetic field. The IMD includes power reception circuitry inside the case, and includes various examples of first and second electrical connections used to divert at least some of the case current as a power current to the power reception circuitry, thus allowing the power reception circuitry to use the power current to provide power to the IMD or to charge its battery.