公开(公告)号：US11978620B2

公开(公告)日：2024-05-07

申请号：US17880455

申请日：2022-08-03

申请人： KLA Corporation

发明人： Ilya Bezel ,  Leonid Borisovich Zvedenuk ,  Andrey Evgenievich Stepanov ,  Amir Torkaman

IPC分类号： H01J61/28 ,  H01J61/02 ,  H01J61/52 ,  H01J65/04

CPC分类号： H01J65/042 ,  H01J61/025 ,  H01J61/28 ,  H01J61/52

摘要： A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

公开(公告)号：US11890391B2

公开(公告)日：2024-02-06

申请号：US17193839

申请日：2021-03-05

申请人： LUMENLABS LLC

发明人： Kevin C. Baxter ,  Wei Cao ,  Min Shi ,  Russel D. Schroader ,  Scott R. Gant ,  Xu Ming

IPC分类号： A61L2/24 ,  G01C3/00 ,  A61L2/10 ,  G01J1/42 ,  A61L2/26 ,  H01J61/02 ,  H01J61/12 ,  H01J61/40 ,  H01J61/52 ,  H05B41/38

CPC分类号： A61L2/24 ,  A61L2/10 ,  A61L2/26 ,  G01C3/00 ,  G01J1/42 ,  H01J61/025 ,  H01J61/12 ,  H01J61/40 ,  H01J61/52 ,  H05B41/38 ,  A61L2202/11 ,  A61L2202/14 ,  A61L2202/25

摘要： An excimer bulb assembly including an excimer bulb emitting a beam of UV light at a wavelength of 222 nm. The excimer bulb may include a filter that blocks any unwanted wavelengths of UV light. The assembly includes a focusing lens positioned a distance from the excimer bulb such that the emitted beam of UV light strikes the focusing lens at an angle. The distance between the excimer bulb and the focusing lens may be varied such that the angle changes when the distance is varied. A plurality of excimer bulbs emitting a beam of UV light at a wavelength of 222 nm in a pattern may be including in a fixture. The fixture may include a housing with the plurality of excimer bulbs are secured in the housing. At least one of the plurality of excimer bulbs may be adapted to independently swivel with respect to the housing so as to change the pattern of the emitted beam of UV light. Each of the plurality of excimer bulbs may be adapted to independently tilt with respect to the housing.

公开(公告)号：US20230335389A1

公开(公告)日：2023-10-19

申请号：US18132162

申请日：2023-04-07

申请人： KLA Corporation

发明人： John Szilagyi ,  Ilya Bezel

IPC分类号： H01J65/04 ,  H01J61/02 ,  H01J61/28 ,  H01J61/52 ,  H01J61/16

CPC分类号： H01J65/042 ,  H01J61/025 ,  H01J61/28 ,  H01J61/52 ,  H01J61/16

摘要： A laser-sustained broadband light source includes a gas containment structure and multiple jet nozzles. The jet nozzles are configured to direct multiple liquid jets of plasma-forming material in directions to collide with one another within the gas containment structure. The laser-sustained broadband light source further includes a laser pump source configured to generate an optical pump to sustain a plasma in a region of the gas containment structure at a collision point of the plurality of liquid jets and a light collector element configured to collect broadband light emitted from the plasma.

公开(公告)号：US20230263924A1

公开(公告)日：2023-08-24

申请号：US18132148

申请日：2023-04-07

申请人： LUMENLABS LLC

发明人： Kevin C. Baxter ,  Min Shi

IPC分类号： A61L2/24 ,  G01C3/00 ,  A61L2/10 ,  G01J1/42 ,  A61L2/26 ,  H01J61/02 ,  H01J61/12 ,  H01J61/40 ,  H01J61/52 ,  H05B41/38

CPC分类号： A61L2/24 ,  G01C3/00 ,  A61L2/10 ,  G01J1/42 ,  A61L2/26 ,  H01J61/025 ,  H01J61/12 ,  H01J61/40 ,  H01J61/52 ,  H05B41/38 ,  A61L2202/14 ,  A61L2202/11 ,  A61L2202/25

摘要： An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

公开(公告)号：US11721539B2

公开(公告)日：2023-08-08

申请号：US17533593

申请日：2021-11-23

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology Co., Ltd.

发明人： Michael X. Yang ,  Rolf Bremensdorfer ,  Dave Camm ,  Joseph Cibere ,  Dieter Hezler ,  Shawming Ma ,  Yun Yang

IPC分类号： H01J61/073 ,  H01J61/86 ,  H05H1/48 ,  H01J61/52 ,  H01J61/28

CPC分类号： H01J61/86 ,  H01J61/0732 ,  H01J61/28 ,  H01J61/526 ,  H05H1/48

摘要： Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

公开(公告)号：US20230217087A1

公开(公告)日：2023-07-06

申请号：US17566776

申请日：2021-12-31

申请人： Logistics and Supply Chain MultiTech R&D Centre Limited

发明人： Kin Sun CHAN ,  Yan Nei LAW ,  Zi Qiao LAM

IPC分类号： H04N5/33 ,  H01J61/52 ,  G06V10/25 ,  G06V10/771

CPC分类号： H04N5/332 ,  G06V10/25 ,  G06V10/771 ,  H01J61/523 ,  G06T2207/10048 ,  G06T2207/30124 ,  G06T2207/30204

摘要： A system and method of extracting or inspecting a feature of an object using thermal imaging, and a method of inspecting an object of a garment product. The system includes a source of thermal influence arranged to heat or cool an object; an imager arranged to capture a plurality of images of the object when the object is subjected to the thermal influence; and an image processor arrange to processing the plurality of images and to distinguish a feature of interest from the other portions of the object presented on the plurality of images.

公开(公告)号：US20230139861A1

公开(公告)日：2023-05-04

申请号：US18089990

申请日：2022-12-28

申请人： Heraeus Noblelight GmbH

发明人： Johannes KRAFT ,  Silke SCHLOEMP ,  Jan WINDERLICH

IPC分类号： A61L2/10 ,  H01J61/52 ,  H01J61/72

摘要： A UV lamp module for the ultraviolet irradiation of a substrate includes a lamp arrangement, a waterproof housing, and first and second airflow zones. The lamp arrangement includes multiple low-pressure mercury lamps each having a longitudinal axis. The waterproof housing surrounds the lamp arrangement and has a bottom side, a top side and at least two side walls connecting the bottom side and the top side to each other, and a beam exit opening on the bottom side which is closed by a beam exit window. The first airflow zone is formed in the housing and has an air supply duct with at least one air-guide for the supply of cooling air to the lamp arrangement. The second airflow zone is separated from the first airflow zone, and is formed in the housing and has an exhaust air duct for the discharge of heated cooling air. When viewed in a cross-section through the housing perpendicular to the longitudinal axes of the low-pressure mercury lamps and in a viewing direction from the bottom side to the top side, the beam exit window, the lamp arrangement and the airflow zones are arranged one after the other.

公开(公告)号：US20230044306A1

公开(公告)日：2023-02-09

申请号：US17972370

申请日：2022-10-24

申请人： LUMENLABS LLC

发明人： Kevin C Baxter ,  Wei Cao ,  Min Shi

IPC分类号： A61L2/24 ,  G01C3/00 ,  A61L2/10 ,  G01J1/42 ,  A61L2/26 ,  H01J61/02 ,  H01J61/12 ,  H01J61/40 ,  H01J61/52 ,  H05B41/38

摘要： A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

公开(公告)号：US20230041901A1

公开(公告)日：2023-02-09

申请号：US17964796

申请日：2022-10-12

申请人： Lumenlabs LLC

发明人： Kevin C. Baxter ,  Scott R. Gant

IPC分类号： A61L2/24 ,  G01C3/00 ,  A61L2/10 ,  G01J1/42 ,  A61L2/26 ,  H01J61/02 ,  H01J61/12 ,  H01J61/40 ,  H01J61/52 ,  H05B41/38

摘要： A UV C light source including a UV C bulb adapted to emit and project UV C light at a wavelength and an interchangeable UV C light modifier through which at least a portion of the UV C light emitted from said UV C bulb is projected. The UV C light modifier may be reflective, such as a reflector, perforated, holographic material, or mechanical modifier such as a barn door. The UV C light modifier might produce a narrow pattern, circular pattern, flat pattern, or asymmetrical pattern or other desired geometric pattern, or upper air pattern. The UV C light modifier is easily removed and interchanged or may be selectable such as by receiving a base UV C fixture including the UV C light source of the present invention and selecting a desired light modifier.

公开(公告)号：US11482406B2

公开(公告)日：2022-10-25

申请号：US17456273

申请日：2021-11-23

申请人： Ushio Denki Kabushiki Kaisha

发明人： Takashi Yuki

IPC分类号： H01J61/073 ,  H01J61/52 ,  H01J61/35

摘要： At least one of the electrodes of a discharge lamp, including at an interior of a main body of the electrode: a heat-transmitting substance of the melting point lower than that of a material which makes up the main body; and a regulating body that is made up of a material of the melting point higher than that of the heat-transmitting substance, that includes a blade which extends in the axial direction and in a radial direction perpendicular to the axial direction, and that regulates convection of the heat-transmitting substance. Surface roughness Rz of at least one of a region which is on an inner wall face of the main body and with which the regulating body makes contact and a region which is on a surface of the regulating body and with which the inner wall face makes contact is not greater than 1.52 μm.