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    ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    1.
    发明申请
    ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    对准系统和极端超紫外光发生系统

    公开(公告)号：WO2013054163A1

    公开(公告)日：2013-04-18

    申请号：PCT/IB2012/001713

    申请日：2012-09-05

    Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

    Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

    IPC: H05G2/00 ,  H01S3/223 ,  H01S3/23

    CPC classification number: H01S3/101 ,  H01S3/005 ,  H01S3/0078 ,  H01S3/2391 ,  H05G2/008

    Abstract: An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.

    Abstract translation: 用于激光装置的对准系统包括：输出导向激光束的导向激光装置，调整引导激光束的行进方向的调节机构和来自激光装置的激光束;光束组合器，控制激光束的行进方向; 所述引导激光束彼此基本一致，从所述光束组合器提供的检测所述激光和引导激光束的第一光学检测单元，基于第一光学检测单元检测结果控制所述调节机构的第一控制器， 控制光束路径组合器的下游，控制激光束和引导激光束的行进方向，第二光学检测单元，在检测引导激光束的光束转向单元的下游;以及第二控制器，其基于第二光学检测器控制光束转向单元 单位检测结果。

    LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    2.
    发明申请
    LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    激光装置和极光超紫外光发生系统

    公开(公告)号：WO2013144690A1

    公开(公告)日：2013-10-03

    申请号：PCT/IB2013/000029

    申请日：2013-01-09

    Applicant: GIGAPHOTON INC.

    Inventor： SUGANUMA, Takashi ,  KAMEDA, Hidenobu ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

    IPC: H05G2/00 ,  H01S3/23

    CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10023 ,  H01S3/1003 ,  H01S3/104 ,  H01S3/13 ,  H01S3/1301 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2391 ,  H05G2/008

    Abstract: A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.

    Abstract translation: 激光装置可以包括主振荡器，设置在来自主振荡器的激光束的光束路径中的光学单元，光束调节单元，其设置在激光束的光束路径中的光学单元的上游，并被配置为至少调节 激光束的光束路径和波前的一个;第一检测单元，设置在激光束的光束路径中的光束调整单元和光学单元之间，并且被配置为检测激光束;第二检测单元， 激光束的光束路径中的光学单元，被配置为检测激光束;以及控制器，被配置为基于来自第一和第二检测单元的输出来控制光束调整单元。

    DEVICE FOR CONTROLLING LASER BEAM AND APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT
    4.
    发明申请
    DEVICE FOR CONTROLLING LASER BEAM AND APPARATUS FOR GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
    用于控制激光束的装置和用于产生极端超紫外线灯的装置

    公开(公告)号：WO2013104947A1

    公开(公告)日：2013-07-18

    申请号：PCT/IB2012/002781

    申请日：2012-12-21

    Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

    Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  B23K26/06 ,  G02B19/009 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2316

    Abstract: A device is provided for controlling a laser beam. The device may include a first wavefront adjuster (81) provided in a beam path of a laser beam outputted from a laser apparatus (3), a beam delivery unit (50) provided in a beam path of the laser beam from the first wavefront adjuster, a second wavefront adjuster (82) provided in a beam path of the laser beam from the beam delivery unit, a beam monitor (57) provided in a beam path of the laser beam from the second wavefront adjuster, and a controller (58) configured to control the first and second wavefront adjusters based on a detection result of the beam monitor. An extreme ultraviolet light apparatus including the device is also provided.

    Abstract translation: 提供了一种用于控制激光束的装置。 设备可以包括设置在从激光装置（3）输出的激光束的光束路径中的第一波前调整器（81），设置在来自第一波前调整器的激光束的光束路径中的光束传送单元 ，设置在来自光束传送单元的激光束的光束路径中的第二波前调整器（82），设置在来自第二波前调整器的激光束的光束路径中的光束监视器（57），以及控制器（58） 被配置为基于所述波束监视器的检测结果来控制所述第一和第二波前调整器。 还提供了包括该装置的极紫外光装置。

    OPTICAL DEVICE, LASER APPARATUS INCLUDING THE OPTICAL DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS
    5.
    发明申请
    OPTICAL DEVICE, LASER APPARATUS INCLUDING THE OPTICAL DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS 审中-公开
    光学装置，包括光学装置的激光装置，以及包括激光装置的极端超紫外光发生系统

    公开(公告)号：WO2012073087A1

    公开(公告)日：2012-06-07

    申请号：PCT/IB2011/002795

    申请日：2011-11-23

    Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

    Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

    IPC: G03F7/20 ,  H01S3/13 ,  H05G2/00

    CPC classification number: G03F7/708 ,  G03F7/70008 ,  G03F7/7085 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2253 ,  H01S3/2316 ,  H05G2/008

    Abstract: An optical device ( 100 ) may include a mirror ( 30 ) for respectively reflecting and transmitting parts of a first laser beam ( L2 ) as first reflected and first transmitted beams, and for respectively transmitting and reflecting parts of a second laser beam ( L3 ) as second transmitted and second reflected beams; an optical system disposed so that the first and second laser beams are such that beam paths of the first transmitted and second reflected beams are parallel or substantially coincide, or such that beam paths of the first reflected and second transmitted beams are parallel or substantially coincide; first and second measuring units (D31; D32 ) configured to respectively measure a beam parameter of the first transmitted or first reflected beams, and of the second reflected or second transmitted beams; and first and second adjusting units ( 11; 21 ) configured to adjust the first and second laser beams based on measurement results by the measuring units.

    Abstract translation: 光学装置（100）可以包括用于分别反射和透射作为第一反射和第一透射光束的第一激光束（L2）的部分的反射镜（30），并且用于分别透射和反射第二激光束（L3）的部分， 作为第二透射和第二反射光束; 光学系统设置成使得第一和第二激光束使得第一透射和第二反射光束的光束路径平行或基本重合，或使得第一反射和第二透射光束的光束路径平行或基本重合; 第一和第二测量单元（D31; D32），其被配置为分别测量第一透射或第一反射光束以及第二反射或第二透射光束的光束参数; 以及第一和第二调整单元（11; 21），其被配置为基于测量单元的测量结果来调节第一和第二激光束。

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
    7.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开
    极光紫外线发光装置

    公开(公告)号：WO2012133720A1

    公开(公告)日：2012-10-04

    申请号：PCT/JP2012/058495

    申请日：2012-03-23

    Applicant: Gigaphoton Inc. ,  WATANABE, Yukio ,  IGARASHI, Miwa ,  MORIYA, Masato ,  NAKARAI, Hiroaki

    Inventor： WATANABE, Yukio ,  IGARASHI, Miwa ,  MORIYA, Masato ,  NAKARAI, Hiroaki

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003

    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

    Abstract translation: 用于产生极紫外光的装置可以包括：具有开口的腔室，激光束通过该开口引入腔室; 安装所述室的参考构件; 目标供应单元，用于将由激光束照射的目标材料供应到室内的预定区域; 激光束聚焦光学系统，用于将激光束聚焦在室内的预定区域中，以将靶材料转化为等离子体; 以及用于收集从等离子体发射的极紫外光的收集器反射镜。

    CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS
    9.
    发明申请
    CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS 审中-公开
    室外装置和极端超紫外线（EUV）发光装置，包括室外装置

    公开(公告)号：WO2012104669A1

    公开(公告)日：2012-08-09

    申请号：PCT/IB2011/003027

    申请日：2011-12-13

    Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

    Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

    IPC: G03F7/20

    CPC classification number: G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

    Abstract: A chamber apparatus (1) used with a laser apparatus (3) may include a chamber (2), a beam expanding optical system (50), and a focusing optical system (22). The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

    Abstract translation: 与激光装置（3）一起使用的室装置（1）可以包括室（2），扩束光学系统（50）和聚焦光学系统（22）。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。

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