公开(公告)号：WO2021204740A1

公开(公告)日：2021-10-14

申请号：PCT/EP2021/058832

申请日：2021-04-06

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xuedong ,  ZHOU, Weimin ,  CHEN, Xiaoxue ,  JI, Xiaoyu ,  LI, Heng ,  HOQUE, Shahedul ,  LI, Zongyao ,  LIU, Shuhao ,  REN, Weiming

IPC: H01J37/244 ,  H01J37/145

Abstract: Systems and methods of imaging a sample using a charged- particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens (307) comprising a magnetic lens (307M) and an electrostatic lens (307ES), the magnetic lens comprising a cavity, and an electron detector (312) located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.

公开(公告)号：WO2021198211A1

公开(公告)日：2021-10-07

申请号：PCT/EP2021/058216

申请日：2021-03-30

Applicant: ASML NETHERLANDS B.V.

Inventor： PISARENCO, Maxim ,  MIDDLEBROOKS, Scott, Anderson ,  HUISMAN, Thomas, Jarik

IPC: G03F7/20 ,  G01N21/956 ,  G06T7/00 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148 ,  G06T5/002 ,  G06T5/008

Abstract: An inspection tool comprising: an imaging system configured to image a portion of a semiconductor substrate; and an image analysis system configured to: obtain an image of a structure on the semiconductor substrate from the imaging system; encode the image of the structure into a latent space thereby forming a first encoding; subtract an artefact vector, representative of an artefact in the image, from the encoding thereby forming a second encoding; and 10 decode the second encoding to obtain a decoded image.

公开(公告)号：WO2021180493A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/054953

申请日：2021-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN WEPEREN, Ilse ,  NIENHUYS, Han-Kwang ,  COENEN, Teis, Johan

IPC: G03F7/20

Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.

公开(公告)号：WO2021175797A1

公开(公告)日：2021-09-10

申请号：PCT/EP2021/055081

申请日：2021-03-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： LYONS, Joseph, Harry ,  HENDRIKS, Jimi ,  ZHOU, Ping ,  HUANG, Zhuangxiong ,  JILISEN, Reinier, Theodorus, Martinus

IPC: G03F7/20

Abstract: Embodiments herein describe methods, devices, and systems for rupture detection and end-of- life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

公开(公告)号：WO2021165135A1

公开(公告)日：2021-08-26

申请号：PCT/EP2021/053325

申请日：2021-02-11

Applicant: ASML NETHERLANDS B.V.

Inventor： WIELAND, Marco, Jan-Jaco

IPC: H01J37/28

Abstract: A charged-particle assessment tool comprising a plurality of beam columns. Each beam column comprises: a charged-particle beam source (201) configured to emit charged particles; a plurality of condenser lenses (231) configured to form charged particles (211, 212, 213) emitted from the charged-particle beam source into a plurality of charged-particle beams; the condenser lenses being configured to focus the plurality of charged particle beams to a respective intermediate focus (233); a plurality of objective lenses (234) arranged downstream of the intermediate foci, each objective lens being configured to project one of the plurality of charged- particle beams onto a sample; and aberration correctors (235) configured to reduce one of mor aberrations in the plurality of charged particle beams. The beam columns are arranged adjacent one-another so as to project the charged particle beams onto adjacent regions of the sample.

公开(公告)号：WO2021160523A1

公开(公告)日：2021-08-19

申请号：PCT/EP2021/052726

申请日：2021-02-05

Applicant: ASML NETHERLANDS B.V.

Inventor： KOOIMAN, Marleen

IPC: G03F7/20

Abstract: An image analysis method for identifying features in an image of a part of an array of features formed by a multi-step process, the method comprising: analyzing variations in features visible in the image; and associating features of the image with steps of the multi-step process based at least in part on results of the analyzing.

公开(公告)号：WO2021160423A1

公开(公告)日：2021-08-19

申请号：PCT/EP2021/051758

申请日：2021-01-26

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： WIENER, Roberto B. ,  KOCHERSPERGER, Peter, Conrad ,  KOGAN, Boris ,  CUIJPERS, Martinus, Agnes, Willem ,  WADE, Robert, Jeffrey ,  EVANS, Shaun

IPC: G03F7/20 ,  H01L21/683

Abstract: Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

公开(公告)号：WO2021160380A1

公开(公告)日：2021-08-19

申请号：PCT/EP2021/051002

申请日：2021-01-19

Applicant: ASML NETHERLANDS B.V.

Inventor： HUBAUX, Arnaud ,  WARNAAR, Patrick ,  MIDDLEBROOKS, Scott, Anderson ,  COLLIGNON, Tijmen, Pieter ,  LI, Chung-Hsun ,  TSIROGIANNIS, Georgios ,  SHAKERI, Sayyed, Mojtaba

IPC: G03F7/20

Abstract: A method of determining matching performance between tools used in semiconductor manufacture and associated tools is described. The method comprises obtaining a plurality of data sets related to a plurality of tools and a representation of said data sets in a reduced space having a reduced dimensionality. A matching metric and/or matching correction is determined based on matching said reduced data sets in the reduced space.

公开(公告)号：WO2021160365A1

公开(公告)日：2021-08-19

申请号：PCT/EP2021/050615

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  DILLEN, Hermanus, Adrianus ,  FENG, Fan ,  VAN ITTERSUM, Ronald ,  VAN MIERLO, Willem, Louis ,  THUIJS, Koen

IPC: G03F7/20

Abstract: Disclosed is a method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method comprises obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on said probability and at least a second control objective having a second probability of being achievable compared to the first control objective.

公开(公告)号：WO2021156387A1

公开(公告)日：2021-08-12

申请号：PCT/EP2021/052705

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： FU, Chenxi ,  DI, Long ,  KUINDERSMA, Lucas ,  TSENG, Kuo-Feng ,  HEMPENIUS, Peter, Paul ,  LIU, Yu ,  LUO, Ying

IPC: H01J41/12 ,  F16L23/032

Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.