公开(公告)号：WO2020064212A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/071874

申请日：2019-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： REHMAN, Samee, Ur

IPC: G03F7/20 ,  G06N3/04 ,  G06N3/08

Abstract: A method of determining a characteristic, such as optical response, of a physical system having a material structure, such as a thin-film multilayer stack or other optical system, has the steps: providing (1430) a neural network (1440) with its network architecture configured based on a model (1420) of scattering of radiation by the material structure along the radiation's path; training (1450) and using (1460) the neural network to determine the characteristic of the physical system. The network architecture may be configured based on the model by configuring parameters including number of units per hidden layer, number of hidden layers, layer interconnection and dropout.

公开(公告)号：WO2020064196A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/071544

申请日：2019-08-12

Applicant: ASML NETHERLANDS B.V.

Inventor： STOFFELS, Freerk, Adriaan ,  HARTGERS, Albertus

IPC: G03F7/20

Abstract: A method for determining at least a part of an angular intensity distribution of radiation at an object plane of an optical system, which may be referred to as an object level pupil shape, is disclosed. The method comprises directing the radiation onto a diffraction grating in the object plane so as to create at least one non-zeroth order diffraction beam which is at least partially received by the optical system; forming an image of a pupil plane of the optical system in a sensor plane and determining a spatial intensity distribution of radiation in the sensor plane; and determining at least a part of the angular intensity distribution of radiation at the object plane from the determined spatial intensity distribution of radiation in the sensor plane. The method is advantageous since it allows reconstruction of the angular intensity distribution of radiation at an object plane of an optical system, from a measurement at image plane level, even in situations where there is an obscuration of the pupil plane within the optical system.

公开(公告)号：WO2020064195A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/071536

申请日：2019-08-12

Applicant: ASML NETHERLANDS B.V.

Inventor： RAFAC, Robert, Jay ,  FOMENKOV, Igor, Vladimirovich

IPC: H05G2/00

Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.

公开(公告)号：WO2020057859A1

公开(公告)日：2020-03-26

申请号：PCT/EP2019/071531

申请日：2019-08-12

Applicant: ASML NETHERLANDS B.V.

Inventor： TEDROW, Jon, David ,  BESSEMS, David ,  CHEN, Wei-Hsun

IPC: F16L25/00 ,  F16L13/04 ,  H05G2/00

Abstract: A conduit suitable for use in a high temperature, high pressure environment, the conduit having an elongate portion made of a first refractory metal and a fitting portion made of a second refractory metal attached to an axial end of the elongate portion. The attachment may be made by welding and the second refractory metal may have a greater yield strength than the first refractory metal.

公开(公告)号：WO2020038677A1

公开(公告)日：2020-02-27

申请号：PCT/EP2019/069685

申请日：2019-07-22

Applicant: ASML NETHERLANDS B.V.

Inventor： KRAMER, Gijs ,  NAGTEGAAL, Theodorus, Marcus ,  SCHREUDER, André ,  VERKAIK, Anna, Catharina

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/68 ,  G03F9/00

Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.

公开(公告)号：WO2020035203A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/067113

申请日：2019-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  KAUR, Chanpreet ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  HUANG, Yang-Shan ,  JEUNINK, Andre, Bernardus ,  DRUZHININA, Tamara ,  VORONINA, Victoria

IPC: G03F9/00

Abstract: Disclosed is an apparatus for processing at least a first substrate in a lithographic process, which first substrate comprises a mask layer and one or more marks arranged below said mask layer, the apparatus comprising a first substrate support configured to hold the first substrate, a clearing tool configured to clear at least one of the marks by clearing an area of the mask layer above said mark while the first substrate is arranged on the first substrate support, and a measurement tool configured to determine a position of at least one of the cleared marks while the first substrate is arranged on the first substrate support.

公开(公告)号：WO2020035201A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/066584

申请日：2019-06-24

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  F21V8/00

Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.

公开(公告)号：WO2020025246A1

公开(公告)日：2020-02-06

申请号：PCT/EP2019/067862

申请日：2019-07-03

Applicant: ASML NETHERLANDS B.V.

Inventor： DE JAGER, Pieter, Willem, Herman

IPC: G03F7/20

Abstract: A method includes illuminating a mirror array with light having light amplitudes forming a first greyscale pattern, the mirror array including a number of mirrors and at least two of the mirrors are illuminated with a same amplitude of the light. The method also includes imaging the light with the light amplitudes onto a substrate to create a second greyscale pattern, different than the first greyscale pattern, at the substrate.

公开(公告)号：WO2020025231A1

公开(公告)日：2020-02-06

申请号：PCT/EP2019/067533

申请日：2019-07-01

Applicant: STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius, Aloysius, Jacobus ,  WARNAAR, Patrick ,  TENNER, Vasco, Tomas ,  VAN DER SCHAAR, Maurits

IPC: G03F7/20

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：WO2020011648A1

公开(公告)日：2020-01-16

申请号：PCT/EP2019/068015

申请日：2019-07-04

Applicant: ASML NETHERLANDS B.V.

Inventor： FANG, Wei ,  GUO, Zhaohui ,  ZHU, Ruoyu ,  LI, Chuan

IPC: G06T7/00

Abstract: A pattern grouping method may include receiving an image of a first pattern, generating a first fixed-dimensional feature vector using trained model parameters applying to the received image, and assigning the first fixed-dimensional feature vector a first bucket ID. The method may further include creating a new bucket ID for the first fixed-dimensional feature vector in response to determining that the first pattern does not belong to one of a plurality of buckets corresponding to defect patterns, or mapping the first fixed-dimensional feature vector to the first bucket ID in response to determining that the first pattern belongs to one of a plurality of buckets corresponding to defect patterns.