公开(公告)号：WO2013132064A2

公开(公告)日：2013-09-12

申请号：PCT/EP2013/054723

申请日：2013-03-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SCHEFFERS, Paul IJmert ,  MEIJER, Jan Andries ,  SLOT, Erwin ,  KUIPER, Vincent Sylvester ,  VERGEER, Niels

IPC: H01J37/304

CPC classification number: G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/3045

Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system for projecting a plurality of charged particle beamlets onto the surface of the substrate; a chuck moveable with respect to the projection system; a beamlet measurement sensor for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark, the position mark measurement system comprising an alignment sensor. The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion for accommodating the surface of the beamlet measurement sensor, and a position mark portion for accommodating the position mark.

Abstract translation: 一种用于将图案转印到基板表面的多子束带电粒子光束光刻系统。 该系统包括用于将多个带电粒子子束投影到基板的表面上的投影系统; 可相对于投影系统移动的卡盘; 用于确定一个或多个带电粒子子束的一个或多个特性的子束测量传感器，所述子束测量传感器具有用于接收一个或多个带电粒子子束的表面; 以及位置标记测量系统，用于测量位置标记的位置，所述位置标记测量系统包括对准传感器。 卡盘包括用于支撑基板的基板支撑部分，用于容纳小梁测量传感器的表面的小梁测量传感器部分和用于容纳位置标记的位置标记部分。

公开(公告)号：WO2013045643A3

公开(公告)日：2013-04-04

申请号：PCT/EP2012/069234

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  LODEWIJK, Chris, Franciscus, Jessica

IPC: H05H1/30 ,  H05H1/46

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) arranged for generating plasma, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to a secondary plasma source (25), and an outlet (14) for emitting at least a portion of the atomic radicals produced by the plasma from the arrangement.

公开(公告)号：WO2013045636A9

公开(公告)日：2013-04-04

申请号：PCT/EP2012/069226

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc ,  LODEWIJK, Chris Franciscus Jessica

IPC: H05H1/30 ,  H05H1/46

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.

公开(公告)号：WO2013041569A1

公开(公告)日：2013-03-28

申请号：PCT/EP2012/068444

申请日：2012-09-19

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： SMITS, Marc

IPC: H01J37/317 ,  G03F7/20

CPC classification number: G01N23/22 ,  B82Y10/00 ,  B82Y40/00 ,  G01N33/0004 ,  G03F7/70608 ,  G03F7/70916 ,  H01J37/304 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/022 ,  H01J2237/31796

Abstract: A lithography system (10) comprising a radiation projection system (20) for projecting radiation onto a substrate, a substrate transport system (30) for loading and positioning the substrate to be processed in the path of the projected radiation, a control system (40) for controlling the substrate transport system to move the substrate, and a resist characterization system (50) arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system (50) may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.

Abstract translation: 一种光刻系统（10），包括用于将辐射投射到基板上的辐射投影系统（20），用于在投影辐射的路径中加载和定位待处理基板的基板输送系统（30），控制系统 ），用于控制衬底传输系统以移动衬底;以及抗蚀剂表征系统（50），被布置用于确定特定类型的抗蚀剂是否适于通过光刻系统内的辐射曝光。 抗蚀剂表征系统（50）可以布置成用一个或多个辐射束将抗蚀剂暴露在衬底的表面上，测量从抗蚀剂发射的分子片段的质量分布，从而预测基于沉积的分子片段的生长速率 的增长率模型和测量的质量分布，并将预期增长率与预定的阈值增长率进行比较。

公开(公告)号：WO2013001100A1

公开(公告)日：2013-01-03

申请号：PCT/EP2012/062854

申请日：2012-07-02

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  VERBURG, Cor ,  MOSSEL, Robert ,  PADHYE, Kaustubh Prabodh ,  DE KOK, Eric ,  VIS, Wim

Inventor： VERBURG, Cor ,  MOSSEL, Robert ,  PADHYE, Kaustubh Prabodh ,  DE KOK, Eric ,  VIS, Wim

IPC: G01D5/24

CPC classification number: G01D5/24 ,  G03F9/7053

Abstract: A measurement system for measuring an input electrical current (Ics) from a current source (CS) and generating a current measurement signal, comprising a current measuring circuit (70) having a first input terminal (72) connected to the current source and an output terminal (74) for providing the current measurement signal. The current measuring circuit further comprises one or more power supply terminals (75, 76) arranged to receive one or more voltages from a power supply (77a, 77b) for powering the current measuring circuit. The current measuring circuit also comprises a first voltage source (VD) coupled to the one or more power supply terminals, the first voltage source providing a disturbance voltage to the one or more power supply terminals, the disturbance voltage representing a voltage at the first input terminal.

Abstract translation: 一种用于测量来自电流源（CS）的输入电流（Ics）并产生电流测量信号的测量系统，包括具有连接到电流源的第一输入端（72）的电流测量电路（70）和输出 端子（74），用于提供电流测量信号。 电流测量电路还包括一个或多个电源端子（75,76），其布置成从电源（77a，77b）接收用于为电流测量电路供电的一个或多个电压。 电流测量电路还包括耦合到所述一个或多个电源端子的第一电压源（VD），所述第一电压源向所述一个或多个电源端子提供干扰电压，所述干扰电压表示所述第一输入端处的电压 终奌站。

公开(公告)号：WO2013001098A4

公开(公告)日：2013-01-03

申请号：PCT/EP2012/062851

申请日：2012-07-02

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  VERBURG, Cor ,  MOSSEL, Robert ,  PADHYE, Kaustubh Prabodh ,  DE KOK, Eric ,  VIS, Wim

Inventor： VERBURG, Cor ,  MOSSEL, Robert ,  PADHYE, Kaustubh Prabodh ,  DE KOK, Eric ,  VIS, Wim

IPC: G01D5/24

Abstract: A capacitive measurement system for generating a measurement signal representative of a measured position or distance to a target. The system has a first circuit comprising a thin film capacitive sensor (1a) arranged for providing a sensor capacitance in dependence on the measured position or distance; a cable (30a) comprising a sensor wire (31a) and a co-axial shield conductor (32a), the cable having a remote end and a local end, the sensor wire electrically connected to the capacitive sensor at the local end of the cable; a voltage source (24a) having an output terminal connected to the sensor wire at the remote end of the cable and arranged to energize the capacitive sensor, and energize the shield conductor with essentially the same voltage as the sensor wire; and a current measuring circuit (21a) having first and second input terminals and an output terminal, the current measuring circuit connected in series with the first input terminal connected to the output terminal of the voltage source and the second input terminal connected to the sensor wire at the remote end of the cable, the current measuring circuit arranged to measure current flowing in the sensor wire and generate the measurement signal at the output terminal.

公开(公告)号：WO2012143548A3

公开(公告)日：2012-10-26

申请号：PCT/EP2012/057366

申请日：2012-04-23

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

Inventor： VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

IPC: G03F7/20 ,  H01J37/317

Abstract: A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit. Each lithography element also comprises a cluster front-end for interface to an operator or host system, the front-end arranged for issuing control information to the at least one element control unit to control operation of the one or more lithography subsystems for exposure of one or more wafers. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.

公开(公告)号：WO2012062932A1

公开(公告)日：2012-05-18

申请号：PCT/EP2011/070077

申请日：2011-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  DINU-GÜRTLER, Laura ,  URBANUS, Willem Henk ,  WIELAND, Marco Jan-Jaco ,  STEENBRINK, Stijn Willem Herman Karel

Inventor： DINU-GÜRTLER, Laura ,  URBANUS, Willem Henk ,  WIELAND, Marco Jan-Jaco ,  STEENBRINK, Stijn Willem Herman Karel

IPC: H01J37/18 ,  H01J37/16 ,  H01J37/09 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/188

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.

Abstract translation: 一种用于将图案转印到靶的表面上的带电粒子光刻系统，包括位于主真空室中的主真空室，源室和中间室，用于产生带电粒子束的束发生器， 位于源室中的发生器，以及用于从所述梁产生多个带电粒子子束的第一孔阵列元件，位于中间室中的第一孔阵列元件。 该系统适于维持主真空室中的第一压力，中间室中的第二压力和源室中的第三压力，并且其中第一压力低于环境压力，第二压力低于 第一压力和第三压力低于第二压力。

公开(公告)号：WO2012056046A2

公开(公告)日：2012-05-03

申请号：PCT/EP2011/069156

申请日：2011-10-31

Applicant: AGRIDIENT B.V. ,  BIELEVELDT, Sander, Johannes, Antonius ,  MINKES, Richard ,  VAN DER HELM, Rosan, Madelie ,  VERHOEF, Ingrid ,  TEPAS, Ilse ,  DE MOOIJ, Gideon Leonard Thomas

Inventor： BIELEVELDT, Sander, Johannes, Antonius ,  MINKES, Richard ,  VAN DER HELM, Rosan, Madelie ,  VERHOEF, Ingrid ,  TEPAS, Ilse ,  DE MOOIJ, Gideon Leonard Thomas

IPC: B67D7/80 ,  B67D7/82 ,  B65D88/74 ,  B65B69/00

CPC classification number: B65D88/1606 ,  B65B69/0066 ,  B65D77/061 ,  B65D88/1618 ,  B65D88/1656 ,  B65D88/22 ,  B65D2590/0058

Abstract: The invention relates to a transportation unit for transport of foodstuffs that are highly viscous or solid at ambient temperatures. The transportation unit comprises a first bag, a second bag arranged to fit into the first bag, and one or more hoist bands wrapped around the bottom side of the first bag and connected thereto. The first bag has an upper side and a bottom side, and is made from a woven fabric, preferably a woven polymer. Additionally, the first bag comprises a transfer opening for removing the foodstuffs from the transportation unit. The second bag comprises an opening for inserting and/or removing the foodstuffs. The second bag is capable of transporting more than 2000 kg of foodstuffs. The one or more hoist bands form loops above the upper side of the first bag.

Abstract translation: 本发明涉及一种用于运输在环境温度下高粘度或固体的食品的运输单元。 运输单元包括第一袋，布置成装配到第一袋中的第二袋和围绕第一袋的底侧缠绕并连接到其上的一个或多个卷扬带。 第一袋具有上侧和底侧，并且由机织物制成，优选为编织聚合物。 此外，第一袋包括用于从运输单元去除食品的转移开口。 第二袋包括用于插入和/或移除食物的开口。 第二个袋子能够运送超过2000公斤的食物。 一个或多个起重带在第一袋的上侧上方形成环。

公开(公告)号：WO2011138373A1

公开(公告)日：2011-11-10

申请号：PCT/EP2011/057150

申请日：2011-05-04

Applicant: KRAAI, Dave, William, Erwin

Inventor： KRAAI, Dave, William, Erwin

IPC: B01D46/10 ,  B01D47/06 ,  B01D50/00 ,  B01D46/00 ,  B01D41/04 ,  B01D46/42

CPC classification number: B01D46/0073 ,  B01D41/04 ,  B01D46/10 ,  B01D46/42 ,  B01D47/06 ,  B01D50/002 ,  B01D50/006

Abstract: The invention relates to a method of cleaning one or more air filter elements (100) with a cleaning arrangement (1) comprising a rotatable basket (20) for holding the one or more air filters, a spraying device (30) for spraying cleaning fluid into the basket, and a driving unit (40) for driving the basket into rotational motion. The method comprises placing the one or more air filter elements in the basket, and performing at least three cleaning cycles. A cleaning cycle comprises the following steps. First the rotation of the basket is driven up to a rotational speed at which the one or more air filter elements have a speed greater than about 15 m/s, preferably greater than about 20 m/s. Then the rotation of the basket is brought back to a rotational speed at which the one or more air filter elements have a speed below about 2 m/s. In addition, the cleaning cycle comprises spraying cleaning fluid into the basket during at least a portion of the cycle.

Abstract translation: 本发明涉及一种用清洁装置（1）清洁一个或多个空气过滤器元件（100）的方法，所述清洁装置包括用于保持所述一个或多个空气过滤器的可旋转篮（20），用于喷射清洁流体的喷洒装置（30） 以及用于将篮子驱动到旋转运动中的驱动单元（40）。 该方法包括将一个或多个空气过滤器元件放置在篮子中，并执行至少三个清洁循环。 清洁循环包括以下步骤。 首先，筐的旋转被驱动到一个或多个空气过滤器元件具有大于约15m / s，优选大于约20m / s的速度的转速。 然后将筐的旋转恢复到一个或多个空气过滤器元件的转速低于约2m / s的转速。 此外，清洁循环包括在循环的至少一部分期间将清洁流体喷射到篮中。