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    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    1.
    发明申请
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 审中-公开
    大量充电粒子的装置

    公开(公告)号：WO2017015483A1

    公开(公告)日：2017-01-26

    申请号：PCT/US2016/043375

    申请日：2016-07-21

    Applicant: HERMES MICROVISION INC. ,  REN, Weiming ,  LIU, Xuedong ,  XUERANG, Hu ,  ZHONGWEI, Chen

    Inventor： REN, Weiming ,  LIU, Xuedong ,  XUERANG, Hu ,  ZHONGWEI, Chen

    IPC: G01N23/225 ,  H01J37/10 ,  H01J37/28

    CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source- conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

    Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源极转换单元通过偏转平行的一次电子束的多个子束形成一个单个电子源的多个并行图像，并且一个物镜将多个偏转的子束聚焦在样本表面上并形成多个探针点 在其上。 使用可移动聚光透镜来准直一次电子束并改变多个探针点的电流，前束形成装置削弱一次电子束的库仑效应，并且源转换单元使尺寸最小化 通过最小化和补偿物镜和聚光透镜的离轴像差来实现多个探测点。

    CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM AND COOLING ARRANGEMENT MANUFACTURING METHOD
    2.
    发明申请
    CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM AND COOLING ARRANGEMENT MANUFACTURING METHOD 审中-公开
    充电颗粒多波束光刻系统和冷却布置制造方法

    公开(公告)号：WO2013171216A1

    公开(公告)日：2013-11-21

    申请号：PCT/EP2013/059948

    申请日：2013-05-14

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： SPRENGERS, Johannes Petrus ,  OTTEN, Christiaan ,  JAGER, Remco ,  STEENBRINK, Stijn Willem Herman Karel ,  KONING, Johan Joost ,  URBANUS, Willem Henk ,  VAN VEEN, Alexander Hendrik Vincent

    IPC: H01J37/04 ,  H01J37/317

    CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/31774 ,  H01J2237/31794

    Abstract: A charged particle multi-beamlet lithography system comprising a beamlet generator for generating beamlets, a beamlet modulator for forming modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a target surface. The generator, modulator and/or projector comprise one or more plates provided with apertures for letting the beamlets pass through the plate. The apertures are grouped to form beam areas distinct from non-beam areas having no beamlet apertures. At least one of the plates with apertures is provided with a cooling arrangement (93) disposed on its surface in a non-beam area. The cooling arrangement comprising a plate-shaped body with an inlet (31) for receiving a cooling liquid, a plurality of cooling channels (94) for conveying the cooling liquid therein, and an outlet (35) for removing the cooling liquid. Between the cooling channels, the plate- shaped body has slots (34) that are aligned with the beam areas.

    Abstract translation: 一种带电粒子多子束光刻系统，包括用于产生子束的子束发生器，用于形成调制子束的子束调制器和用于将调制的子束投影到目标表面上的子束投影仪。 发生器，调制器和/或投影仪包括设置有用于使子束通过板的孔的一个或多个板。 孔被分组以形成与不具有子束孔的非光束区域不同的光束区域。 具有孔的至少一个板设置有在非横梁区域中设置在其表面上的冷却装置（93）。 冷却装置包括具有用于接收冷却液的入口（31）的板状体，用于将冷却液输送到其中的多个冷却通道（94）和用于除去冷却液的出口（35）。 在冷却通道之间，板状体具有与梁区对准的槽（34）。

    CHARGED PARTICLE DETECTION SYSTEM AND MULTI-BEAMLET INSPECTION SYSTEM
    4.
    发明申请
    CHARGED PARTICLE DETECTION SYSTEM AND MULTI-BEAMLET INSPECTION SYSTEM 审中-公开
    充电颗粒检测系统和多光束检测系统

    公开(公告)号：WO2011124352A1

    公开(公告)日：2011-10-13

    申请号：PCT/EP2011/001639

    申请日：2011-03-31

    Applicant: Carl Zeiss SMT GmbH ,  APPLIED MATERIALS ISRAEL Ltd. ,  KNIPPELMEYER, Rainer

    Inventor： KNIPPELMEYER, Rainer

    IPC: H01J37/244 ,  H01J37/09

    CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2817

    Abstract: A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

    Abstract translation: 带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。 带电粒子子束可穿过多孔板的入射到检测元件上的孔。 可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。 提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。

    CHARGED PARTICLE BEAMLET EXPOSURE SYSTEM
    6.
    发明申请
    CHARGED PARTICLE BEAMLET EXPOSURE SYSTEM 审中-公开
    充电颗粒光束曝光系统

    公开(公告)号：WO2004107050A3

    公开(公告)日：2005-04-21

    申请号：PCT/NL2004000381

    申请日：2004-05-27

    Applicant: MAPPER LITHOGRAPHY IP BV ,  KRUIT PIETER ,  WIELAND MARCO JAN-JACO

    Inventor： KRUIT PIETER ,  WIELAND MARCO JAN-JACO

    IPC: H01J37/08 ,  H01J37/30 ,  H01J37/317

    CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/045 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/1501

    Abstract: The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising: - a first aperture means comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam for forming a charged particle beamlet; - a lens system comprising at least one lens for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens; - a deflector means, substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, and - a second aperture means comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.

    Abstract translation: 本发明涉及一种用于带电粒子束曝光装置的带电粒子光学系统，所述系统包括： - 第一孔径装置，其包括至少第一基本上圆形的孔，用于部分屏蔽发射的带电粒子束以形成带电粒子束 ; - 透镜系统，包括至少一个透镜，用于聚焦所述透镜的图像焦平面内或附近的来自所述第一孔的带电粒子束; - 基本上位于所述图像焦平面中的偏转器装置，包括至少一个子束偏转器，用于在接收到控制信号时偏转通过的带电粒子子束;以及 - 第二孔装置，包括至少一个第二基本上圆形的孔 定位在第一孔的共轭平面中，并且所述第二孔与所述第一孔和所述小梁偏转器对准，用于在所述子束偏转器偏转时阻挡所述带电粒子子束，否则传递。

    CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
    8.
    发明申请
    CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER 审中-公开
    与EBEAM通用切割机的扫描近似校正

    公开(公告)号：WO2016028334A1

    公开(公告)日：2016-02-25

    申请号：PCT/US2014/071827

    申请日：2014-12-22

    Applicant: INTEL CORPORATION

    Inventor： BORODOVSKY, Yan A.

    IPC: H01L21/027

    CPC classification number: G03F7/2037 ,  H01J37/045 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/303 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31769 ,  H01L21/0277 ,  H01L21/0337 ,  H01L21/308 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/76816

    Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a column for an e-beam direct write lithography tool includes a first blanker aperture array (BAA) including a staggered array of openings having a pitch along an array direction. The array direction is orthogonal to a scan direction. Each opening has a first dimension in the array direction. The column also includes a second BAA including a staggered array of openings having the pitch along the array direction. Each opening has a second dimension in the array direction, the second dimension greater than the first dimension.

    Abstract translation: 描述适用于涉及互补电子束光刻（CEBL）的光刻设备和方法。 在一个示例中，用于电子束直写式光刻工具的列包括第一消隐器孔径阵列（BAA），其包括具有沿着阵列方向的间距的开口的交错阵列。 阵列方向与扫描方向正交。 每个开口具有在阵列方向上的第一维度。 该列还包括第二BAA，其包括具有沿阵列方向具有间距的开口的交错阵列。 每个开口具有在阵列方向上的第二维度，第二维度大于第一维度。

    PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS
    10.
    发明申请
    PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS 审中-公开
    颗粒光学系统和安排以及这种系统和安排的颗粒光学部件

    公开(公告)号：WO2012041464A1

    公开(公告)日：2012-04-05

    申请号：PCT/EP2011/004777

    申请日：2011-09-23

    Applicant: APPLIED MATERIALS ISRAEL Ltd. ,  CARL ZEISS SMT GMBH ,  ZEIDLER, Dirk ,  KEMEN, Thomas ,  ANGER, Pascal ,  CASARES, Antonio ,  RIEDESEL, Christof

    Inventor： ZEIDLER, Dirk ,  KEMEN, Thomas ,  ANGER, Pascal ,  CASARES, Antonio ,  RIEDESEL, Christof

    IPC: H01J37/09

    CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

    Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

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