ROLL-TO-ROLL ATOMIC LAYER DEPOSITION APPARATUS AND METHOD
    13.
    发明申请
    ROLL-TO-ROLL ATOMIC LAYER DEPOSITION APPARATUS AND METHOD 审中-公开
    辊对原子层沉积装置和方法

    公开(公告)号:WO2017172531A1

    公开(公告)日:2017-10-05

    申请号:PCT/US2017/024096

    申请日:2017-03-24

    Abstract: A method is provided. The method may include engaging a first edge region on a first surface of a substrate with a first support roller; engaging a second edge region on the first surface of the substrate with a second support roller; transporting the substrate over the first and the second support rollers; repeating the following sequence of steps to form a thin film on the substrate: (a) exposing the substrate to a first precursor; (b) supplying a reactive species to the substrate after exposing the substrate to the first precursor; and depositing a vapor on the thin film to form a coating on the thin film.

    Abstract translation:

    提供了一种方法。 该方法可以包括:使基板的第一表面上的第一边缘区域与第一支撑辊接合; 使基板的第一表面上的第二边缘区域与第二支撑辊接合; 在所述第一支撑辊和所述第二支撑辊上运送所述基板; 重复以下步骤顺序以在衬底上形成薄膜:(a)将衬底暴露于第一前体; (b)在将衬底暴露于第一前体之后将反应性物质供应至衬底; 并在薄膜上沉积蒸气以在薄膜上形成涂层。

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