公开(公告)号：WO2017102379A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/079594

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  DE GRAAF, Dennis ,  JANSSEN, Paul ,  PÉTER, Mária ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

CPC classification number: G03F1/24 ,  G03F1/62 ,  G03F7/70916 ,  G03F7/70983

Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine

Abstract translation: 一种用于EUV光刻的膜，所述膜具有不大于200nm的厚度并且包括叠层，所述叠层包括：至少一个硅层; 以及至少一个由硅化合物和选自由硼，磷，溴组成的组中的元素构成的硅化合物层，

公开(公告)号：WO2017067813A2

公开(公告)日：2017-04-27

申请号：PCT/EP2016/074280

申请日：2016-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： PÉTER, Mária ,  ABEGG, Erik, Achilles ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  NASALEVICH, Maxim, Aleksandrovich ,  VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  G03F1/62 ,  G03F7/70983 ,  G21K2201/067

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

Abstract translation: 公开了制造用于光刻设备的防护薄膜组件的方法。 在一种布置中，该方法包括在衬底的平坦表面上沉积至少一个石墨烯层。 衬底包括第一衬底部分和第二衬底部分。 该方法还包括去除第一衬底部分以从至少一个石墨烯层形成独立式膜。 独立膜由第二基底部分支撑。

公开(公告)号：WO2016001351A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/065080

申请日：2015-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey, Alexandrovich ,  BANINE, Vadim, Yevgenyevich ,  BENSCHOP, Jozef, Petrus, Henricus ,  BOOGAARD, Arjen ,  DHALLUIN, Florian, Didier, Albin ,  KUZNETSOV, Alexey, Sergeevich ,  PÉTER, Mária ,  SCACCABAROZZI, Luigi ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  YAKUNIN, Andrei, Mikhailovich

IPC: G03F7/20 ,  G03F1/00 ,  G03F1/62 ,  G02B5/08 ,  G02B5/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 10 17 cm -3 , and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.

Abstract translation: 公开了对EUV辐射透射的膜，其可以用作光刻设备中的防护薄膜组件或光谱过滤器。 膜包括一个或多个高掺杂区域，其中所述膜掺杂有大于1017cm-3的掺杂剂浓度，以及具有低（或不）掺杂的一个或多个区域。 膜可以具有具有低掺杂和一个或多个附加层的主衬底，其中所述高掺杂区域包含在所述附加层的一些或全部内。