公开(公告)号：WO2009043790A3

公开(公告)日：2009-06-25

申请号：PCT/EP2008062835

申请日：2008-09-25

Applicant: ZEISS CARL SMT AG ,  BEIERL HELMUT ,  FELDMANN HEIKO ,  HETZLER JOCHEN ,  TOTZECK MICHAEL

Inventor： BEIERL HELMUT ,  FELDMANN HEIKO ,  HETZLER JOCHEN ,  TOTZECK MICHAEL

IPC: G03F7/20 ,  G02B13/14

CPC classification number: G03F7/70341 ,  G02B1/02 ,  G02B21/33 ,  G03F7/70941

Abstract: An assembly 11 of a projection objective for microlithography comprises a number of optical elements and an aperture 14. The optical element of the assembly 11 before the last optical element oriented towards the image is a planar convex lens 12, whose convex surface 2b is oriented towards the object, and whose planar surface 2a is oriented towards the image. As a last optical element of the assembly 11 oriented towards the image, an optical terminal element 17 is provided which comprises a planar plate 19. Between the planar surface 2b of the lens 12 and the planar plate 19 of the optical terminal element 17, thus at the object oriented surface of the planar plate, and also on the image oriented surface of the planar plate of the terminal element 17 a respective immersion liquid 13b or 13a is provided. The planar plate is thus in contact with the immersion liquids 13a and 13b on both sides. By this configuration it is assured that contaminations within the immersion liquid 13a disposed on the image oriented side do not impair the planar convex lens 12. Replacing the terminal element 17 or the planar plate 19 of the terminal element 17, however, is easily possible, as soon as their imaging properties become insufficient through contamination or other impairments.

Abstract translation: 用于微光刻的投影物镜的组件11包括多个光学元件和孔14.在朝向图像定向的最后一个光学元件之前的组件11的光学元件是平面凸透镜12，其凸面2b朝向 物体，其平面2a朝向图像。 作为朝向图像的组件11的最后一个光学元件，提供了一个光学端子元件17，其包括平面板19.在透镜12的平面2b和光学端子元件17的平面板19之间，因此 在平面板的物体取向表面以及端子元件17的平面板的图像取向表面上设置相应的浸液13b或13a。 因此，平板与两侧的浸液13a，13b接触。 通过这种结构，确保设置在图像取向侧的浸没液体13a内的污染物不会损害平面凸透镜12.然而，更换终端元件17的端子元件17或平板19是容易的， 一旦它们的成像性质通过污染或其他损伤变得不足。

公开(公告)号：WO2009043790A2

公开(公告)日：2009-04-09

申请号：PCT/EP2008/062835

申请日：2008-09-25

Applicant: CARL ZEISS SMT AG ,  BEIERL, Helmut ,  FELDMANN, Heiko ,  HETZLER, Jochen ,  TOTZECK, Michael

Inventor： BEIERL, Helmut ,  FELDMANN, Heiko ,  HETZLER, Jochen ,  TOTZECK, Michael

IPC: G03F7/20 ,  G02B13/14

CPC classification number: G03F7/70341 ,  G02B1/02 ,  G02B21/33 ,  G03F7/70941

Abstract: An assembly 11 of a projection objective for microlithography comprises a number of optical elements and an aperture 14. The optical element of the assembly 11 before the last optical element oriented towards the image is a planar convex lens 12, whose convex surface 2b is oriented towards the object, and whose planar surface 2a is oriented towards the image. As a last optical element of the assembly 11 oriented towards the image, an optical terminal element 17 is provided which comprises a planar plate 19. Between the planar surface 2b of the lens 12 and the planar plate 19 of the optical terminal element 17, thus at the object oriented surface of the planar plate, and also on the image oriented surface of the planar plate of the terminal element 17 a respective immersion liquid 13b or 13a is provided. The planar plate is thus in contact with the immersion liquids 13a and 13b on both sides. By this configuration it is assured that contaminations within the immersion liquid 13a disposed on the image oriented side do not impair the planar convex lens 12. Replacing the terminal element 17 or the planar plate 19 of the terminal element 17, however, is easily possible, as soon as their imaging properties become insufficient through contamination or other impairments.

Abstract translation: 用于微光刻的投影物镜的组件11包括多个光学元件和孔14.在朝向图像定向的最后一个光学元件之前的组件11的光学元件是平面凸透镜12 ，其凸面2b朝向物体取向，并且其平面表面2a朝向图像取向。 作为朝向图像定向的组件11的最后一个光学元件，提供包括平面板19的光学终端元件17.因此，在透镜12的平面表面2b和光学终端元件17的平面平板19之间 在平面板的物体定向表面上以及在终端元件17的平面板的图像定向表面上提供相应的浸没液体13b或13a。 因此平面板在两侧与浸液13a和13b接触。 通过这种配置，可以确保设置在图像取向侧的浸液13a内的污染不会损害​​平面凸透镜12.然而，更换端子元件17或端子元件17的平板19是容易的， 只要其成像特性因污染或其他损伤而变得不足。

公开(公告)号：WO2006125617A3

公开(公告)日：2007-04-26

申请号：PCT/EP2006004929

申请日：2006-05-24

Applicant: ZEISS CARL SMT AG ,  CONRADI OLAF ,  FELDMANN HEIKO ,  RICHTER GERALD ,  BLEIDISTEL SASCHA ,  FROMMEYER ANDREAS ,  GRUNER TORALF ,  HUMMEL WOLFGANG

Inventor： CONRADI OLAF ,  FELDMANN HEIKO ,  RICHTER GERALD ,  BLEIDISTEL SASCHA ,  FROMMEYER ANDREAS ,  GRUNER TORALF ,  HUMMEL WOLFGANG

IPC: G03F7/20

CPC classification number: G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50) , wherein the projection objective has a plurality of lenses (Ll, L2, L3 , L4 , L5 , L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract translation: 本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 物镜平面和图像平面，多个透镜中的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 所述多个透镜还被分配至少一个第二操纵器，并且所述第二透镜除了所述第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：WO2012041807A1

公开(公告)日：2012-04-05

申请号：PCT/EP2011/066667

申请日：2011-09-26

Applicant: CARL ZEISS SMT GMBH ,  RUOFF, Johannes ,  FELDMANN, Heiko

Inventor： RUOFF, Johannes ,  FELDMANN, Heiko

IPC: G03F7/20

CPC classification number: G02B5/0891 ,  G03F7/70066 ,  G03F7/70225 ,  G03F7/70283

Abstract: A mirror (20) for EUV radiation (14) comprises a mirror body, which has at least one EUV radiation-reflecting region (23) and at least two EUV radiation-permeable regions (22). As a result, a spatial separation of the illumination and imaging beam paths is also possible with small angles of incidence and a large object-side numerical aperture.

Abstract translation: 用于EUV辐射的反射镜（20）（14）包括具有至少一个EUV辐射反射区域（23）和至少两个EUV辐射透射区域（22）的镜体。 结果，照射和成像光束路径的空间分离也可以具有小的入射角和大的物体侧数值孔径。

公开(公告)号：WO2009013230A1

公开(公告)日：2009-01-29

申请号：PCT/EP2008/059435

申请日：2008-07-18

Applicant: CARL ZEISS SMT AG ,  MÜLLER, Ralf ,  GRUNER, Toralf ,  TOTZECK, Michael ,  FELDMANN, Heiko ,  PAUL, Hans-Jochen

Inventor： MÜLLER, Ralf ,  GRUNER, Toralf ,  TOTZECK, Michael ,  FELDMANN, Heiko ,  PAUL, Hans-Jochen

IPC: G03F7/20

CPC classification number: G03F7/70308 ,  G02B5/205 ,  G02B5/283 ,  G02B26/001 ,  G02B26/0825 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70566

Abstract: The invention concerns an optical system of a microlithographic projection exposure apparatus. To permit comparatively flexible and fast influencing of intensity distribution and/or the polarization state, an optical system according to the invention comprises at least one layer system (120, 200) which is at least one-side bounded by a lens or a mirror, wherein said layer system (120, 200) is an interference layer system of several layers and has at least one liquid or gaseous layer portion (123, 220) whose maximum thickness is at a maximum 1 micrometer (μm), and a manipulator (105) for manipulation of the thickness profile of said layer portion (123, 220).

Abstract translation: 本发明涉及一种微光刻投影曝光装置的光学系统。 为了允许强度分布和/或偏振状态的相对灵活和快速的影响，根据本发明的光学系统包括至少一个由透镜或反射镜限定的一个层系统（120,200） 其中所述层系统（120,200）是几层的干涉层系统，并且具有至少一个最大厚度最大为1微米（μm）的液体或气体层部分（123,220）和机械手（105） ），用于操纵所述层部分（123,220）的厚度分布。

公开(公告)号：WO2008064845A1

公开(公告)日：2008-06-05

申请号：PCT/EP2007/010244

申请日：2007-11-26

Applicant: CARL ZEISS SMT AG ,  FELDMANN, Heiko ,  GRUNER, Toralf ,  EPPLE, Alexander

Inventor： FELDMANN, Heiko ,  GRUNER, Toralf ,  EPPLE, Alexander

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

Abstract: A method of manufacturing a projection objective including the steps of defining an initial design for a projection objective and optimizing the design using a merit function having a plurality of merit function components AB, IRRAD EFP, each of which reflects a particular quality parameter. One of that merit function components defines a maximum irradiance requirement requiring that a normalized effective irradiance value representing an effective irradiance AB, IRRAD EFF normalized to an effective irradiance in an image surface of the projection objective does not exceed a predefined irradiance threshold value IRR TV on each optical surface of the projection objective except for a last optical surface directly adjacent to an image surface of the projective objective. Optical surfaces positioned within caustic regions and/or critically small effective sub-apertures on optical surfaces are thereby systematically avoided.

Abstract translation: 一种制造投影物镜的方法，包括以下步骤：定义投影物镜的初始设计，并使用具有多个优点函数分量AB，IRRAD EFP的优值函数优化设计，每个优点函数分量反映了特定的质量参数。 其中一个优点功能组件定义了最大辐照度要求，要求表示在投影物镜的图像表面中归一化为有效辐照度的有效辐照度AB，IRRAD EFF的归一化有效辐照度值不超过预定的辐照度阈值IRR TV 投影物镜的每个光学表面除了与投影物镜的图像表面直接相邻的最后光学表面之外。 因此系统地避免了位于苛性区域内的光学表面和/或光学表面上的临界小的有效子孔。

公开(公告)号：WO2007131161A2

公开(公告)日：2007-11-15

申请号：PCT/US2007068227

申请日：2007-05-04

Applicant: ZEISS CARL SMT AG ,  SHAFER DAVID ,  DODOC AURELIAN ,  FELDMANN HEIKO ,  ZELLNER JOHANNES ,  ULRICH WILHELM ,  WALTER HOLGER ,  LOERING ULRICH ,  KRAEHMER DANIEL ,  GUERTER GERHARD

Inventor： SHAFER DAVID ,  DODOC AURELIAN ,  FELDMANN HEIKO ,  ZELLNER JOHANNES ,  ULRICH WILHELM ,  WALTER HOLGER ,  LOERING ULRICH ,  KRAEHMER DANIEL ,  GUERTER GERHARD

CPC classification number: G02B13/143 ,  G02B13/26 ,  G03F7/70241

Abstract: In general, in one aspect, the invention features a system that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in the projection objective are disclosed.

Abstract translation: 通常，在一个方面，本发明的特征在于一种系统，其包括配置成在多个汞发射线处发射辐射的水银光源，被设置为接收由水银光源发射的辐射的投影物镜，以及被配置为定位晶片 相对于投影物镜。 在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。 公开了用于投影物镜的光学透镜系统。

公开(公告)号：WO2007071565A1

公开(公告)日：2007-06-28

申请号：PCT/EP2006/069406

申请日：2006-12-07

Applicant: CARL ZEISS SMT AG ,  BEDER, Susanne ,  KRÄHMER, Daniel ,  FELDMANN, Heiko

Inventor： BEDER, Susanne ,  KRÄHMER, Daniel ,  FELDMANN, Heiko

IPC: G03F7/20

CPC classification number: G02B13/14 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70966

Abstract: A projection objective (100) of a microlithographic projection exposure apparatus, serving to project an image of a mask that can be set in position in an object plane (OP) onto a light-sensitive coating layer that can be set in position in an image plane (IP), wherein the projection objective is designed to operate in an immersion mode, produces at least one intermediate image (IMI) and comprises an optical subsystem (130) on the image-plane side which projects said intermediate image (IMI) into the image plane with an image-plane-side projection ratio β i , wherein said image-plane-side projection ration β i ,has an absolute value of at least 0.3.

Abstract translation: 一种微光刻投影曝光装置的投影物镜（100），用于将可设置在物平面（OP）中的位置的掩模的图像投影到可设置在图像中的位置的感光涂层上 平面（IP），其中所述投影物镜被设计为以浸没模式操作，产生至少一个中间图像（IMI），并且包括将所述中间图像（IMI）投影到所述图像平面侧上的光学子系统（130） 具有图像平面侧投影比率β像素的图像平面，其中所述图像平面侧投影比例ßN i具有至少0.3的绝对值。

公开(公告)号：WO2007025783A2

公开(公告)日：2007-03-08

申请号：PCT/EP2006/008605

申请日：2006-09-04

Applicant: CARL-ZEISS SMT AG ,  KAMENOV, Vladimir ,  KRÄHMER, Daniel ,  GRUNER, Toralf ,  WEISSENRIEDER, Karl-Stefan ,  FELDMANN, Heiko ,  ZIRKEL, Achim ,  PAZIDIS, Alexandra ,  THOME, Bruno ,  SIX, Stephan

Inventor： KAMENOV, Vladimir ,  KRÄHMER, Daniel ,  GRUNER, Toralf ,  WEISSENRIEDER, Karl-Stefan ,  FELDMANN, Heiko ,  ZIRKEL, Achim ,  PAZIDIS, Alexandra ,  THOME, Bruno ,  SIX, Stephan

IPC: G03F7/20

CPC classification number: G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

Abstract: Eine mikrolithographische Projektionsbelichtungsanlage enthält ein optisches Element (36), das zur Verringerung oder Erhöhung des Reflexionsvermögens eine Antireflex- Beschichtung (32) bzw. eine Reflex-Beschichtung trägt. Erfindungsgemäß ist die Antiref lex-Beschichtung derart ausgelegt, daß über einen Einfallswinkelbereich von 70° hinweg sich die Transmissionskoeffizienten der Antire- flex-Beschichtung für zueinander orthogonale Polarisationszustände (42p 42s) um nicht mehr als 10%, vorzugsweise um nicht mehr als 3%, weiter vorzugsweise um nicht mehr als 1%, voneinander unterscheiden. Entsprechendes gilt für den Reflexionskoeffizienten der Reflex-Beschichtung. Zu Korrektur von Fehlern, die durch größere Winkelabhängigkeiten des mittleren Transmissions- oder Ref lexionskoeffizienten und der Wirkung auf die Phase verursacht sind, enthält die Projektionsbelichtungsanlage Mittel (50) zur Homogenisierung einer Intensitätsverteilung, die vorzugsweise in oder in der Nähe einer Feld- oder Pupillenebene angeordnet sind.

Abstract translation:

的微光刻投射曝光设备包含BEAR为lt光学元件（36）用于减少或玉儿＆OUML;反射率＆OUML的红;一族的防反射涂层（32）和反射涂层TR＆AUML; GT。 发明＆AUML;大街 例如，抗反射涂层被设计成使得？ 在70°的入射角范围内。 中的时间，Antire-柔性涂层˚F导航用途r的传输系数相互正交的偏振不超过10％的状态HANDS（42P 42S），优选不超过3％，更优选不超过1％，从彼此不同。 这同样适用于反射涂层的反射系数。 对于由GR＆ouml错误校正;道路ERE引起所述相位中间传动或REF lexionskoeffizienten和效果的角度依赖性BEAR包含保持所述投射曝光系统的装置（50），用于在均质化的强度BEAR tsverteilung，优选 或者在场或瞳孔飞机附近。

公开(公告)号：WO2006131242A1

公开(公告)日：2006-12-14

申请号：PCT/EP2006/005168

申请日：2006-05-31

Applicant: CARL ZEISS SMT AG ,  KAISER, Winfried ,  ULRICH, Wilhelm ,  FELDMANN, Heiko ,  DODOC, Aurelian

Inventor： KAISER, Winfried ,  ULRICH, Wilhelm ,  FELDMANN, Heiko ,  DODOC, Aurelian

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70066 ,  G03F7/7025

Abstract: In the case of a projection exposure method for exposing substrates, arranged in the region of an image plane of a projection objective, with at least one image of a pattern, arranged in the region of an object plane of the projection objective, of a mask, a first exposure configuration is optionally set for exposing a substrate given a first image-side numerical aperture NA1 in a first image field with a first image field size IFS1, or a second exposure configuration is optionally set for exposing substrates given a second image-side numerical aperture NA2, differing from the first image-side numerical aperture NA1, in a second image field with a second image field size IFS2 differing from the first image field size.

Abstract translation: 在曝光基板的投影曝光方法的情况下，其布置在投影物镜的像面的区域中，具有布置在投影物镜的物平面的区域中的图案的至少一个图像的掩模 可选地，第一曝光配置被设置用于在具有第一图像场尺寸IFS1的第一图像场中暴露给定第一图像侧数值孔径NA1的基板，或者可选地设置第二曝光配置以曝光给定第二图像 - 在与第一图像场尺寸不同的第二图像场尺寸IFS2的第二图像场中，与第一图像侧数值孔径NA1不同的边侧数值孔径NA2。