公开(公告)号：WO2008096981A1

公开(公告)日：2008-08-14

申请号：PCT/KR2008/000599

申请日：2008-01-31

Applicant: SOSUL CO., LTD. ,  KOMICO LTD. ,  LEE, Hee-Se ,  KIM, Geun-Ho ,  PARK, Seung-Il ,  LEE, Kwang-Hee ,  YUN, Soo-Won ,  RHA, Kwan-Goo

Inventor： LEE, Hee-Se ,  KIM, Geun-Ho ,  PARK, Seung-Il ,  LEE, Kwang-Hee ,  YUN, Soo-Won ,  RHA, Kwan-Goo

IPC: H01L21/205

CPC classification number: H01L21/6719 ,  C23C16/4412 ,  C23C16/45557 ,  C23C16/45589 ,  C23C16/46 ,  H01L21/67017

Abstract: An apparatus for forming a layer includes a chamber, a partition member, a supporting member, a reaction gas-providing member and an insulation member. The chamber has an inner space into which a substrate is loaded. The partition member is arranged in the inner space of the chamber to partition the inner space into a reaction region for receiving the substrate and a non-reaction region. The supporting member is placed in the reaction region to support the substrate. The reaction gas-providing member is positioned over the supporting member to provide a reaction gas to the reaction region. The insulation member is detachably combined with the partition member to isolate the reaction region and the non-reaction region from each other. Thus, heat loss from a heater in the supporting member through the non-reaction region via the partition member may be suppressed.

Abstract translation: 用于形成层的装置包括室，分隔构件，支撑构件，反应气体供给构件和绝缘构件。 腔室具有内部空间，衬底被加载到该内部空间中。 分隔构件布置在室的内部空间中，以将内部空间分隔成用于接收基板和非反应区域的反应区域。 将支撑构件放置在反应区域中以支撑基板。 反应气体供给构件位于支撑构件上方，以向反应区域提供反应气体。 绝缘构件与分隔构件可拆卸地组合以将反应区域和非反应区域彼此隔离。 因此，可以抑制从支撑构件中的加热器经由分隔构件通过非反应区域的热损失。

公开(公告)号：WO2011149220A2

公开(公告)日：2011-12-01

申请号：PCT/KR2011003737

申请日：2011-05-20

Applicant: KOMICO LTD ,  PARK HYUN-KYU

Inventor： PARK HYUN-KYU

IPC: G01N33/483 ,  G01N27/30 ,  G01N33/49

CPC classification number: G01N27/3272

Abstract: Provided are a multi-analysis sensor and a multi-analysis method using same, which enable the quick and efficient analysis of a sample. The multi-analysis sensor comprises: a sample separation unit including a separation pattern for separating a measured sample from an injected sample, and a chamber for storing the measure sample; a reaction unit for analyzing the measured sample; and a measurement gauge including an electrode. The sensor and method can provide good reliability and accuracy in the diagnosis of diseases and enable the simultaneous measurements of various items.

Abstract translation: 提供了一种多分析传感器和使用其的多分析方法，其能够快速和有效地分析样品。 多分析传感器包括：样品分离单元，其包括用于从被注入的样品分离测量的样品的分离图案和用于存储测量样品的室; 用于分析测量样品的反应单元; 和包括电极的测量计。 传感器和方法可以在疾病诊断中提供良好的可靠性和准确性，并能够同时测量各种物品。

公开(公告)号：WO2011062358A3

公开(公告)日：2011-08-04

申请号：PCT/KR2010006222

申请日：2010-09-14

Applicant: KOMICO LTD ,  CHOI SONG-HO ,  HAN KI-MOON

Inventor： CHOI SONG-HO ,  HAN KI-MOON

IPC: H01M8/12 ,  H01B1/02 ,  H01B1/06 ,  H01M8/02 ,  H01M8/24

CPC classification number: H01M8/1246 ,  H01M4/8889 ,  H01M8/243 ,  Y02E60/525 ,  Y02P70/56

Abstract: Disclosed is a method for manufacturing a flat tubular solid oxide fuel cell. The disclosed method for manufacturing a flat tubular solid oxide fuel cell comprises: laminating an electrolyte sheet, a fuel electrode sheet, and a channel unit sheet having an opening, in order to form a multilayer sheet; sintering the multilayer sheet to form a channel support layer having a flow channel, a fuel electrode layer, and a tubular electrolyte layer which covers the channel support layer and the fuel electrode layer; and forming a tubular air electrode layer which covers the electrolyte layer. The flat tubular solid oxide fuel cell of the present invention has both the structural advantage of the flat tubular solid oxide fuel cell and the work advantage of a flat plate solid oxide fuel cell.

Abstract translation: 公开了一种扁平管状固体氧化物燃料电池的制造方法。 所公开的扁平管状固体氧化物燃料电池的制造方法包括：层压电解质片，燃料电极片和具有开口的通道单元片，以形成多层片; 烧结所述多层片材以形成具有流路的沟道支撑层，燃料电极层和覆盖所述沟道支撑层和所述燃料电极层的管状电解质层; 并形成覆盖电解质层的管状空气电极层。 本发明的扁平管状固体氧化物燃料电池具有扁平管状固体氧化物燃料电池的结构优点和平板固体氧化物燃料电池的工作优点。

公开(公告)号：WO2010147313A2

公开(公告)日：2010-12-23

申请号：PCT/KR2010003314

申请日：2010-05-26

Applicant: KOMICO LTD ,  KIM WON-MOOK

Inventor： KIM WON-MOOK

IPC: H05K3/46

CPC classification number: H05K3/4697 ,  H05K3/4629 ,  H05K2203/0278 ,  H05K2203/061 ,  H05K2203/1476 ,  Y10T156/1082

Abstract: A method for producing a laminated ceramic base plate having a cavity comprises: a first compression step in which first and second unsintered sheet stacks are separately formed by respectively compressing a plurality of unsintered ceramic green sheets; a step in which a hole is formed in the second unsintered sheet stack; a step in which the second unsintered sheet stack, in which the hole has been formed, is placed on the first unsintered sheet stack and a preliminary third unsintered sheet stack is formed; a step in which a first thin film and a second thin film for sealing are respectively placed on the upper surface and the lower surface of the preliminary third unsintered sheet stack; a second compression step in which a third unsintered sheet stack is formed by compressing the first and second thin films together with the preliminary third unsintered sheet stack; and a step in which the third unsintered sheet stack is sintered. In this way, a plurality of ceramic green sheets can be laminated through a flat mould without being hindered by the shape of the cavity, and the production process can be simplified and carried out in a stable fashion.

Abstract translation: 一种具有空腔的层叠陶瓷基板的制造方法，其特征在于，包括：第一压缩工序，通过分别压制多个未烧结的陶瓷生片分别形成第一和第二未烧结的片堆叠体; 在第二未烧结片叠中形成有孔的工序; 其中形成有所述孔的所述第二未烧结片材堆叠被放置在所述第一未烧结片材堆叠上并形成初步的第三未烧结片材堆叠的步骤; 将第一薄膜和第二密封薄膜分别放置在预备的第三未烧结薄片叠层的上表面和下表面上的步骤; 第二压缩步骤，其中通过将所述第一和第二薄膜与所述预备的第三未烧结薄片叠层一起压缩而形成第三未烧结薄片叠层; 以及烧结第三未烧结片叠的步骤。 以这种方式，可以通过扁平模具层叠多个陶瓷生片，而不会受到腔的形状的阻碍，并且可以以稳定的方式简化和执行制造过程。

公开(公告)号：WO2009031783A3

公开(公告)日：2009-04-30

申请号：PCT/KR2008005015

申请日：2008-08-27

Applicant: KOMICO LTD ,  CHO SANG-BUM ,  JUNG BYOUNG-JIN ,  PARK MYUNG-HA ,  PARK JUNG-HYUN

Inventor： CHO SANG-BUM ,  JUNG BYOUNG-JIN ,  PARK MYUNG-HA ,  PARK JUNG-HYUN

IPC: H05K7/20

CPC classification number: H01L21/67103 ,  H01L21/67109 ,  H01L21/6831

Abstract: A substrate support unit of a substrate processing apparatus includes a first support member, a second support member, a buffer member and a tube. The first support member has an electrode and a heater built-in and supports the substrate. The second support member is disposed beneath the first support member to support the first support member. The buffer member is disposed between the first support member and the second support member to form an air gap between the first support member and the second support member so as to reduce heat transfer between the first support member and the second support member. The tube is connected with a lower surface of the first support member. Further, the tube extends through the second support member and receives lines for applying power to the electrode and the heater.

Abstract translation: 基板处理装置的基板支撑单元包括第一支撑构件，第二支撑构件，缓冲构件和管。 第一支撑构件具有内置的电极和加热器，并支撑基板。 第二支撑构件设置在第一支撑构件下方以支撑第一支撑构件。 缓冲构件设置在第一支撑构件和第二支撑构件之间，以在第一支撑构件和第二支撑构件之间形成气隙，以减少第一支撑构件和第二支撑构件之间的热传递。 管与第一支撑构件的下表面连接。 此外，管延伸穿过第二支撑构件并且接收用于向电极和加热器施加电力的线。

公开(公告)号：WO2009031783A2

公开(公告)日：2009-03-12

申请号：PCT/KR2008/005015

申请日：2008-08-27

Applicant: KOMICO LTD. ,  CHO, Sang-Bum ,  JUNG, Byoung-Jin ,  PARK, Myung-Ha ,  PARK, Jung-Hyun

Inventor： CHO, Sang-Bum ,  JUNG, Byoung-Jin ,  PARK, Myung-Ha ,  PARK, Jung-Hyun

IPC: H05K7/20

CPC classification number: H01L21/67103 ,  H01L21/67109 ,  H01L21/6831

Abstract: A substrate support unit of a substrate processing apparatus includes a first support member, a second support member, a buffer member and a tube. The first support member has an electrode and a heater built-in and supports the substrate. The second support member is disposed beneath the first support member to support the first support member. The buffer member is disposed between the first support member and the second support member to form an air gap between the first support member and the second support member so as to reduce heat transfer between the first support member and the second support member. The tube is connected with a lower surface of the first support member. Further, the tube extends through the second support member and receives lines for applying power to the electrode and the heater.

Abstract translation: 衬底处理设备的衬底支撑单元包括第一支撑构件，第二支撑构件，缓冲构件和管。 第一支撑构件具有内置的电极和加热器并支撑基板。 第二支撑构件设置在第一支撑构件下方以支撑第一支撑构件。 缓冲构件设置在第一支撑构件和第二支撑构件之间，以在第一支撑构件和第二支撑构件之间形成气隙，以减少第一支撑构件和第二支撑构件之间的热传递。 该管与第一支撑构件的下表面连接。 此外，管延伸穿过第二支撑构件并接收用于向电极和加热器供电的线。

公开(公告)号：WO2009008626A2

公开(公告)日：2009-01-15

申请号：PCT/KR2008/003930

申请日：2008-07-03

Applicant: KOMICO LTD. ,  JANG, Kyung-Ic ,  YE, Kyung-Hwan ,  KIM, Sam-Woong ,  REIM, Yong-Sup

Inventor： JANG, Kyung-Ic ,  YE, Kyung-Hwan ,  KIM, Sam-Woong ,  REIM, Yong-Sup

IPC: H01L21/265

CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/0206 ,  H01J2237/022

Abstract: An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and includes the same material as that of the substrate.

Abstract translation: 离子注入机包括处理室和涂层。 处理室接收衬底并提供空间以在衬底上执行离子注入处理。 涂层设置在处理室的内壁上以减少衬底的污染，并且包括与衬底相同的材料。

公开(公告)号：WO2008111752A1

公开(公告)日：2008-09-18

申请号：PCT/KR2008/001205

申请日：2008-03-03

Applicant: KOMICO LTD. ,  CHO, Sang-Bum ,  HEO, Kang-Il ,  JUNG, Byoung-Jin ,  AHN, Sung-Don ,  CHANG, Hwi-Souck ,  CHOI, Jung-Ho

Inventor： CHO, Sang-Bum ,  HEO, Kang-Il ,  JUNG, Byoung-Jin ,  AHN, Sung-Don ,  CHANG, Hwi-Souck ,  CHOI, Jung-Ho

IPC: H01L21/68

CPC classification number: H01L21/68707

Abstract: An apparatus for transferring a wafer includes a ceramic blade, an electrode, a plurality of pads, a coating layer and a robot arm. The blade supports the wafer, and the electrode is disposed inside the blade. Electric power is applied to the electrode to generate an electrostatic force for holding the wafer. The pads are disposed on an upper surface of the blade, and thus frictional forces may be provided between the wafer and the pads. The coating layer is disposed on the blade. The robot arm is connected with the blade to move the blade.

Abstract translation: 用于转印晶片的装置包括陶瓷刀片，电极，多个焊盘，涂层和机器人手臂。 刀片支撑晶片，电极设置在刀片内。 向电极施加电力以产生用于保持晶片的静电力。 焊盘设置在叶片的上表面上，因此可以在晶片和焊盘之间设置摩擦力。 涂层设置在刀片上。 机器人臂与刀片连接以移动刀片。

公开(公告)号：WO2008108603A1

公开(公告)日：2008-09-12

申请号：PCT/KR2008/001325

申请日：2008-03-07

Applicant: SOSUL CO., LTD. ,  KOMICO LTD. ,  KIM, Geun-Ho ,  LEE, Jung-Hee ,  JEON, Seon-Kyu

Inventor： KIM, Geun-Ho ,  LEE, Jung-Hee ,  JEON, Seon-Kyu

IPC: H01L21/3065

CPC classification number: H01J37/32449 ,  H01J37/3244 ,  H01J2237/20

Abstract: An apparatus for etching an unwanted layer formed on a back surface of a substrate includes a chamber providing a space to process the substrate, a support member supporting an edge portion of a back surface of the substrate, and a gas supply including a body supplying an etching gas onto the back surface of the substrate through a plurality of holes and a gas supply conduit connected with the holes. High frequency energy is applied to the gas supply to generate a plasma from the etching gas, and the unwanted layer may be removed by the plasma.

Abstract translation: 用于蚀刻形成在基板的背面上的不需要的层的装置包括：提供处理基板的空间的腔室;支撑基板的背面的边缘部分的支撑构件;以及气体供给装置， 通过多个孔将气体蚀刻到基板的背面上，和与孔连接的气体供给导管。 将高频能量施加到气体供应源以从蚀刻气体产生等离子体，并且不需要的层可以被等离子体去除。