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    NARROW-BAND LASER
    41.
    发明申请
    NARROW-BAND LASER 审中-公开
    窄带激光

    公开(公告)号：WO1996031929A1

    公开(公告)日：1996-10-10

    申请号：PCT/JP1996000921

    申请日：1996-04-03

    Applicant: KOMATSU LTD. ,  WAKABAYASHI, Osamu ,  KOMORI, Hiroshi ,  MIZOGUCHI, Hakaru

    Inventor： KOMATSU LTD.

    IPC: H01S03/1055

    CPC classification number: H01S3/225 ,  H01S3/1055

    Abstract: A narrow-band laser comprising: a laser generating section having laser activity and capable of generating laser beam; band narrowing means which is provided on one end side of the laser generating section on the optical axis of the laser beam generated in the laser generating section to narrow the band of the laser beam by means of at least one angle-dispersion wavelength selection element, fold back the laser beam in the narrowed band and output the folded laser beam toward the laser generating section; beam folding means which is provided on the other end of the laser generating section on the optical axis of the laser beam generated in the laser generating section to fold back the input laser beam and reflect the folded laser beam into the laser generating section; and a laser branching optical unit which is provided between the laser generating section and the band narrowing means to permit part of the laser beam input from the laser generating section to pass therethrough into the band narrowing means while deflecting the remaining part of the laser beam and drawing out the same as an output beam. The laser is constructed so that the light which has passed straight through the laser branching optical unit is input into the band narrowing means, thereby stabilizing a resonance system to eliminate multiwavelength oscillation accompanying the vibration.

    Abstract translation: 一种窄带激光器，包括：具有激光活动并能够产生激光束的激光发生部分; 在所述激光发生部产生的激光的光轴上设置在所述激光发生部的一端侧的带状窄窄装置，通过至少一个角度分散波长选择元件使所述激光束的带宽变窄， 折叠在窄带中的激光束并将折叠的激光束输出到激光产生部分; 光束折叠装置，其设置在激光产生部分的另一端上，在激光产生部分中产生的激光束的光轴上折叠输入激光束并将折叠的激光束反射到激光产生部分中; 以及激光分支光学单元，其设置在激光发生部分和带状窄窄装置之间，以允许从激光产生部分输入的激光束的一部分通过其进入带状窄窄装置，同时偏转激光束的剩余部分， 绘出与输出光束相同的图像。 激光器被构造成使直接穿过激光分支光学单元的光被输入到带宽变窄装置中，从而稳定谐振系统以消除伴随振动的多波长振荡。

    WAVELENGTH DETECTOR
    42.
    发明申请
    WAVELENGTH DETECTOR 审中-公开
    波长检测器

    公开(公告)号：WO1990014582A1

    公开(公告)日：1990-11-29

    申请号：PCT/JP1990000640

    申请日：1990-05-18

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  WAKABAYASHI, Osamu; ,  KOWAKA, Masahiko; ,  KOBAYASHI, Yukio;

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: G01J09/02

    CPC classification number: G01J9/0246 ,  G01J3/26

    Abstract: A wavelength detector in which reference light (31) generated in a reference light source (30) and light (11) to be detected are directed to an etalon (62), and the light that has transmitted through the etalon is detected by light detecting means (64). The front focal surface (50) of a collimator lens (61) is irradiated with the reference light and the light to be detected. These lights are converted into parallel rays through the collimator lens and fall on the etalon. The reference light and the light to be detected that have passed through the etalon are focused by focusing lens means (63) on the detecting surface of light detecting means to form thereon interference fringes that correspond to the reference light and the light to be detected. Based on the interference fringes, relative wavelength of the light to be detected to the reference light, i.e., the absolute wavelength of the light to be detected, is measured.

    DEVICE FOR CONTROLLING THE OUTPUT OF EXCIMER LASER
    43.
    发明申请
    DEVICE FOR CONTROLLING THE OUTPUT OF EXCIMER LASER 审中-公开
    用于控制激光激光输出的装置

    公开(公告)号：WO1989002175A1

    公开(公告)日：1989-03-09

    申请号：PCT/JP1988000841

    申请日：1988-08-25

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  WAKABAYASHI, Osamu ,  ITO, Noritoshi ,  KOWAKA, Masahiko

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: H01S03/137

    CPC classification number: G03F7/70025 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/134 ,  H01S3/137 ,  H01S3/225

    Abstract: A device for controlling the output of an excimer laser adapted for use as a source of light particularly for a reduction projection exposure device in which at least two etalons with a large diameter are arranged between a rear mirror and a laser chamber, and the superposition of transmission wavelengths of the etalons is so controlled as to narrow the band of the output laser beam yet maintaining the number of spatial transverse modes. The superposition is controlled by a superposition control device and the intensity for exciting the laser gas is controlled by an excitation intensity control device, while partial exchange of gas is controlled by a gas control device all maintaining predetermined timings.

    Abstract translation: 一种用于控制适于用作光源的准分子激光器的输出的装置，特别是用于还原投影曝光装置，其中至少两个具有大直径的标准具布置在后反射镜和激光室之间，并且叠加 标准具的透射波长受到如此控制，以便缩小输出激光束的带宽，同时保持空间横向模式的数量。 叠加由叠加控制装置控制，并且激发气体的激发强度由激发强度控制装置控制，而部分气体交换由气体控制装置控制，全部保持预定的定时。

    DEVICE FOR CONTROLLING WAVELENGTH OF LASER BEAM
    44.
    发明申请
    DEVICE FOR CONTROLLING WAVELENGTH OF LASER BEAM 审中-公开
    用于控制激光束波长的装置

    公开(公告)号：WO1988007276A1

    公开(公告)日：1988-09-22

    申请号：PCT/JP1988000293

    申请日：1988-03-18

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  AMADA, Yoshiho ,  WAKABAYASHI, Osamu ,  KOWAKA, Masahiko

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: H01S03/137

    CPC classification number: H01S3/137 ,  H01S3/225

    Abstract: According to this invention, the center wavelength in the main peak of a laser beam and the power at either the side band or the center wavelength are detected, and the selectivity of a wavelength selector arranged between a laser chamber and a rear mirror is controlled so that the detected center wavelength will be within a desired allowable range and that the detected power will be either a minimum or a maximum.

    Abstract translation: 根据本发明，检测激光束的主峰的中心波长和在边带或中心波长处的功率，并且控制布置在激光室和后反射镜之间的波长选择器的选择性被控制为 检测到的中心波长将在所需的允许范围内，并且检测到的功率将是最小值或最大值。

    MULTI-MODE NARROW-BAND OSCILLATION EXCIMER LASER
    45.
    发明申请
    MULTI-MODE NARROW-BAND OSCILLATION EXCIMER LASER 审中-公开
    多模式窄带振荡激光激光器

    公开(公告)号：WO1988000767A1

    公开(公告)日：1988-01-28

    申请号：PCT/JP1987000366

    申请日：1987-06-09

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  NOZUE, Yasuhiro ,  ITO, Noritoshi ,  WAKABAYASHI, Osamu ,  FUJIMOTO, Junichi ,  KOWAKA, Masahiko ,  KAJIYAMA, Koichi ,  SAITO, Kaoru ,  ITAKURA, Yasuo

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: H01S03/137

    CPC classification number: G03F7/70575 ,  G03F7/70583 ,  H01S3/1062 ,  H01S3/225

    Abstract: The specifications of an etalon are selected to satisfy the following equation, the etalon being provided for a multi-mode narrow-band oscillation excimer laser that is used as a source of light exposure in photolithography: flambdaWlambdaRlambda(u, v)dlambda alpha where alpha represents an OTF necessary for sensitizing a resist according to a reticule pattern (OTF: Optical Transfer Function), Rlambda(u, v) represents a monochromatic light OTF of the illumination system and a contracting projection lens, and Wlambda represents the weight of a spectral waveform at a given wavelength lambda in a power spectrum of the oscillation laser beam. When the etalon having the above specifications is provided between a rear mirror and a chamber, the angle of inclination of the etalon in the direction of the normal is selected to be, > tan-1 S/2A where S represents the size of a beam on the emission mirror, and A represents a distance between the etalon and the emission mirror, and the oscillation line width K is given by formula (I), where lambdaO denotes a wavelength that is selectted when the beam is incident on the etalon at right angles thereto, and ' denotes the angle of expansion of the beam, and where K X where X denotes a permissible line width of an exposure apparatus using the excimer laser as a source of light.

    LASER APPARATUS
    48.
    发明申请
    LASER APPARATUS 审中-公开
    激光装置

    公开(公告)号：WO2013093577A1

    公开(公告)日：2013-06-27

    申请号：PCT/IB2012/001829

    申请日：2012-09-19

    Applicant: GIGAPHOTON INC. ,  NOWAK, Krzysztof ,  WAKABAYASHI, Osamu

    Inventor： NOWAK, Krzysztof ,  WAKABAYASHI, Osamu

    IPC: H01S3/23 ,  H01S3/10 ,  G02B27/28 ,  G03F7/20

    CPC classification number: H01S3/0078 ,  H01S3/036 ,  H01S3/041 ,  H01S3/076 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/12 ,  H01S2301/02

    Abstract: A laser apparatus (300) includes at least one oscillator (301) configured to output a first laser beam (L1); a filter device (310-1 through 310-n) provided in a beam path of the first laser beam, the filter device including either an optical element having transmittance properties dependant of a polarization direction and a wavelength and a filter device including a wavelength dispersive element; and at least one first amplifier (320-1 through 320-n) configured to amplify a second laser beam (L2) from the filter device and output as a third laser beam (31).

    Abstract translation: 激光装置（300）包括配置成输出第一激光束（L1）的至少一个振荡器（301）。 设置在第一激光束的光束路径中的滤光器装置（310-1至310-n），滤光器装置包括具有取决于偏振方向和波长的透射特性的光学元件和包括波长色散的滤光器件 元件; 以及至少一个第一放大器（320-1至320-n），被配置为从所述滤波器装置放大第二激光束（L2）并作为第三激光束（31）输出。

    ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    49.
    发明申请
    ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    对准系统和极端超紫外光发生系统

    公开(公告)号：WO2013054163A1

    公开(公告)日：2013-04-18

    申请号：PCT/IB2012/001713

    申请日：2012-09-05

    Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

    Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

    IPC: H05G2/00 ,  H01S3/223 ,  H01S3/23

    CPC classification number: H01S3/101 ,  H01S3/005 ,  H01S3/0078 ,  H01S3/2391 ,  H05G2/008

    Abstract: An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.

    Abstract translation: 用于激光装置的对准系统包括：输出导向激光束的导向激光装置，调整引导激光束的行进方向的调节机构和来自激光装置的激光束;光束组合器，控制激光束的行进方向; 所述引导激光束彼此基本一致，从所述光束组合器提供的检测所述激光和引导激光束的第一光学检测单元，基于第一光学检测单元检测结果控制所述调节机构的第一控制器， 控制光束路径组合器的下游，控制激光束和引导激光束的行进方向，第二光学检测单元，在检测引导激光束的光束转向单元的下游;以及第二控制器，其基于第二光学检测器控制光束转向单元 单位检测结果。

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    50.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    极致超紫外光发生系统

    公开(公告)号：WO2012173266A1

    公开(公告)日：2012-12-20

    申请号：PCT/JP2012/065443

    申请日：2012-06-12

    Applicant: Gigaphoton Inc. ,  WAKABAYASHI, Osamu ,  YANAGIDA, Tatsuya

    Inventor： WAKABAYASHI, Osamu ,  YANAGIDA, Tatsuya

    IPC: H05G2/00

    CPC classification number: G21K5/08 ,  G21K5/00 ,  H05G2/008

    Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

    Abstract translation: 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标电源;用于将来自激光装置的激光束聚焦在该区域中的激光束聚焦光学系统;以及光学系统 用于控制激光束的光束强度分布。

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