SEAMLESS HOLOGRAPHIC EMBOSSING SUBSTRATE PRODUCED BY LASER ABLATION
    41.
    发明申请
    SEAMLESS HOLOGRAPHIC EMBOSSING SUBSTRATE PRODUCED BY LASER ABLATION 审中-公开
    由激光雷射产生的无缝全息雕刻基板

    公开(公告)号:WO2005053115A2

    公开(公告)日:2005-06-09

    申请号:PCT/US2004/034814

    申请日:2004-10-20

    IPC: H01S

    Abstract: Laser ablation to direct write dot matrix holographic patterns onto the surface of polymeric coatings deposited on an embossing cylinder is described. The desired holographic pattern is ablated by interfering at least two laser beams directly onto the polymeric coating of the embossing cylinder in the pixel-by-pixel manner. The direct write laser ablation technique eliminates the size limitations of the holographic pattern created on the surface of the embossing cylinder, the need to combine smaller images to create a larger shim and the very need to use the shims, since large seamless embossing cylinders can be directly pixel-by-pixel ablated with larger sized images of great variety. The polymeric coatings for further direct write laser ablation can be deposited onto the embossing cylinder by various methods, including, but not limited to, molding or coating.

    Abstract translation: 描述了激光烧蚀以将写入点阵全息图案直接写在沉积在压花圆筒上的聚合物涂层的表面上。 通过以逐像素的方式将至少两个激光束直接干涉到压花圆筒的聚合物涂层上来消除所需的全息图案。 直接写入激光烧蚀技术消除了在压花圆筒表面上产生的全息图案的尺寸限制,需要组合更小的图像以产生更大的垫片,并且非常需要使用垫片,因为大的无缝压花圆筒可以是 直接逐个像素地消除与大尺寸的图像的大品种。 用于进一步直接写入激光烧蚀的聚合物涂层可以通过各种方法沉积到压花滚筒上,包括但不限于模制或涂覆。

    ホログラム照明方法
    42.
    发明申请
    ホログラム照明方法 审中-公开
    HOLOGRAM照明方法

    公开(公告)号:WO2005036050A1

    公开(公告)日:2005-04-21

    申请号:PCT/JP2004/006968

    申请日:2004-05-21

    Abstract: A hologram illumination method for creating a colorful and fantastic atmosphere in the surroundings utilizing hologram reflection pattern light. An illuminator, e.g. a candle or a miniature bulb, is disposed substantially in the center of a frame cover having inner side face partially reflecting a hologram pattern such that hologram pattern light reflected through irradiation with the illuminator can be enjoyed on the opposite side. Alternatively, an illuminator, e.g. a candle or a miniature bulb, is located substantially in the center and a bottomless frame cover having inner side face partially reflecting a hologram pattern is disposed such that hologram pattern light reflected through irradiation with the illuminator can be enjoyed on the opposite side.

    Abstract translation: 一种全息照明方法,用于利用全息图反射图案光在周围环境中产生色彩缤纷和美妙的气氛。 照明器,例如 蜡烛或微型灯泡大致设置在具有部分地反射全息图图案的内侧面的框架盖的中心,使得可以在相对侧享受通过照射器照射而反射的全息图图案光。 或者,照明器,例如 蜡烛或微型灯泡大致位于中央,并且设置具有部分地反射全息图图案的内侧面的无底框架盖,使得可以在相对侧享受通过照射器照射反射的全息图图案光。

    HOLOGRAPHISCH-OPTISCHES ELEMENT UND VERFAHREN ZU DESSEN HERSTELLUNG
    43.
    发明申请
    HOLOGRAPHISCH-OPTISCHES ELEMENT UND VERFAHREN ZU DESSEN HERSTELLUNG 审中-公开
    全息光学元件与方法研究

    公开(公告)号:WO2004023220A1

    公开(公告)日:2004-03-18

    申请号:PCT/EP2003/008832

    申请日:2003-08-08

    Abstract: Die Erfindung betrifft ein Verfahren zur Herstellung eines holographischoptischen Elementes, bei dem eine photoempfindliche Schicht zumindest einmal mit interferierenden Lichtstrahlen belichtet wird, um eine holographische Struktur zu erzeugen. Erfindungsgemäss ist vorgesehen, loss die photoempfindliche Schicht zumindest einmal in gekrümmtem Zustand belichtet wird. Die Erfindung betrifft weiterhin ein Verfahren zur Herstellung eines holographisch-optischen Elementes mit einem computergenerierten Lichtmuster, bei dem erfindungsgemäss vorgesehen ist, dass zurnindest ein zur Belichtung einer holographischen Struktur zur holographischen Speicherung einer Information auf einer ebenen Fläche berechnetes Lichtmuster derart transformiert wird, dass es einem Lichtmuster entspricht, das erst bei Krümmung der damn belichteten Photoschicht während der Beleuchtung mit Rekonstruktionslicht die gespeicherte Information zeigt, und die Photoschicht in ebenem Zustand mit dem transformierten Lichtmuster belichtet wird. Die Erfindung betrifft weiterhin holographisch-optische Elemente und Prägehologrammstrukturen, die unter Einsatz der erfindungsgemässen Verfahren hergestellt sind.

    Abstract translation: 本发明涉及一种用于制造在其中的感光层与干涉光束以产生全息结构暴露至少一次holographischoptischen元件的方法。 根据本发明,在弯曲状态下的感光层的损失至少一次暴露。 本发明还涉及一种方法,用于生产包括计算机生成的光图案的全息光学元件,其特征在于,根据本发明提供的是zurnindest一个用于曝光的全息图案用于信息在一个平面上的光图案的全息存储计算被变换,使得 光图案对应,与重建的光仅示出了当曲率的照明期间该死曝光的光刻胶层,并且所述感光板是暴露在平坦的状态与光的经变换的图形所存储的信息。 本发明还涉及到全息光学元件和模压全息图结构,其使用本发明的工艺制造的。

    METHOD OF PRODUCING PRINTING OR EMBOSSING CYLINDERS HAVING A PATTERNED SURFACE
    45.
    发明申请
    METHOD OF PRODUCING PRINTING OR EMBOSSING CYLINDERS HAVING A PATTERNED SURFACE 审中-公开
    用于生产国土EYED表面上具有印刷或冲压钢瓶

    公开(公告)号:WO1997048022A1

    公开(公告)日:1997-12-18

    申请号:PCT/EP1997002975

    申请日:1997-06-07

    Abstract: Proposed is a method of patterning the surface of printing or embossing cylinders, the method calling for the cylinder surface to be exposed to a beam corresponding to the desired pattern and the suface then patterned in accordance with the exposure. In order to be able to produce particularly fine features on the surface, the invention proposes that the dots of light on the surface are produced by beams which are modified, before they impinge on the surface, by a beam-forming element to form fine features corresponding to the desired pattern, the pattern formed by each dot imaged or projected on the surface being moved in synchronism with the movement of the surface as the cylinder turns.

    Abstract translation: 公开了一种用于印刷或压花滚筒的表面上,其中,所述圆筒的表面照射对应于所需图案的曝光束,然后的空间图案形成的方法形成图案对应于曝光的表面上。 为了实现这里所述气缸表面的特别精细结构,所以建议的照射点的表面暴露的服务是由束装置产生撞击气缸的表面上波束形成用于通过的手段形成根据所希望的图案的精细结构之前 其中,所述滚筒表面或各个照射点的投影的图案上所显示的元素被同步地移动到对应于旋转滚筒表面的其运动被改变。

    EMBOSSING TOOL
    46.
    发明申请
    EMBOSSING TOOL 审中-公开
    刺绣工具

    公开(公告)号:WO9201973A3

    公开(公告)日:1992-03-19

    申请号:PCT/US9105085

    申请日:1991-07-18

    Inventor: MCGREW STEPHEN P

    Abstract: A method and apparatus for producing durable embossing tools is disclosed. An anisotropic etching process, such as ion etching, is used to etch a relief pattern into a hard substrate. A transfer layer is formed overlaying a generally smooth, seamless surface region of a substrate. A desired relief pattern is formed in the transfer layer, by exposing a photoresist, embossing, or the like. The substrate having the photoresist thereon is subjected to an anisotropic etch. The anisotropic etch continues until the transfer layer is completely removed and the relief pattern is formed in the upper surface of the embossing tool. The relative etch rates between the transfer layer and the surface region of the embossing tool are selected to provide the desired depth modulation in the surface of the embossing tool. An embossing tool produced according to the invention has a relatively hard surface and may thus be used for the mass production of holographic images without significant degradation of the pattern. Because the embossing tool can be made from an extremely hard material such as chromium or hardened steel, materials which previously could not be economically embossed with holograms, such as aluminum or steel, may now be embossed by an embossing tool made according to this invention.

    HOLOGRAPHIC DISPLAY MEANS
    47.
    发明申请
    HOLOGRAPHIC DISPLAY MEANS 审中-公开
    全景显示手段

    公开(公告)号:WO1987000954A1

    公开(公告)日:1987-02-12

    申请号:PCT/GB1986000479

    申请日:1986-08-07

    Abstract: A holographic display means for displaying an image holographically embodied in a hologram, comprises (a) a hologram support for receiving and supporting a hologram in a viewing position; (b) a reference light source disposed adjacent the hologram support in a predetermined position such that light emanating from the source when energised cannot fall directly on to a hologram supported on the support; and (c) a light reflecting means disposed adjacent a boundary of the support and arranged to direct light from the source on to a hologram supported on the support so as to be incident on the hologram at a predetermined reference angle, which angle corresponds substantially to the angle of incidence relative to the hologram of a predetermined reference light used in producing that hologram. Preferably, light is reflected not more than twice before it becomes incident on the hologram, and advantageously, it is reflected only once. Reflecting surfaces may be planar, or curved in one or more directions. Holograms in a variety of different forms may be illuminated, for example, planar, cylindrical, convex or concave form, or in any combination of such forms.

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