公开(公告)号：WO2013173152A1

公开(公告)日：2013-11-21

申请号：PCT/US2013/040246

申请日：2013-05-09

Applicant: VEECO INSTRUMENTS INC. ,  BARRISS, Louise, S. ,  COMUNALE, Richard, A. ,  FREMGEN, Roger, P. ,  GURARY, Alexander, I. ,  LUSE, Todd, A. ,  MILGATE, III, Robert, White ,  POLLOCK, John, D.

Inventor： BARRISS, Louise, S. ,  COMUNALE, Richard, A. ,  FREMGEN, Roger, P. ,  GURARY, Alexander, I. ,  LUSE, Todd, A. ,  MILGATE, III, Robert, White ,  POLLOCK, John, D.

IPC: C23C16/44 ,  C23C16/52

CPC classification number: C23C16/4584 ,  C23C16/4586 ,  C23C16/46 ,  C23C16/52 ,  H01L21/68785 ,  H01L21/68792

Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.

Abstract translation: 用于化学气相沉积的旋转盘式反应器包括真空室和铁磁流体馈通，其包括使马达轴进入真空室的上部和下部铁磁流体密封件。 电动机联接到电动机轴并且位于上部和下部铁磁流体密封件之间的大气区域中。 转盘位于真空室中并联接到电动机轴，使得电动机以期望的转速旋转转台。 电介质支撑件联接到转盘，使得转盘在被轴驱动时旋转电介质支架。 衬底载体位于用于化学气相沉积处理的真空室中的电介质支撑体上。 加热器位于基板载体附近，将基板载体的温度控制到用于化学气相沉积的所需温度。