公开(公告)号：WO2011028597A1

公开(公告)日：2011-03-10

申请号：PCT/US2010/046783

申请日：2010-08-26

Applicant: VEECO INSTRUMENTS, INC. ,  PARANJPE, Ajit ,  LUSE, Todd, Arthur ,  FREMGEN, Roger, P. ,  SRINIVASAN, Narasimhan ,  ROOK, Katrina ,  DRUZ, Boris, L. ,  CELARU, Adrian

Inventor： PARANJPE, Ajit ,  LUSE, Todd, Arthur ,  FREMGEN, Roger, P. ,  SRINIVASAN, Narasimhan ,  ROOK, Katrina ,  DRUZ, Boris, L. ,  CELARU, Adrian

IPC: G11B5/65

CPC classification number: G11B5/855 ,  C23C14/042 ,  C23C14/046 ,  C23C14/505 ,  H01L21/67173 ,  H01L21/67709 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67742 ,  H01L21/67754

Abstract: An inline processing system for patterning magnetic recording layers on hard discs for use in a hard disc drive. Discs are processed on both sides simultaneously in a vertical orientation, in round plate-like holders called MDCs. A plurality (as many as 10) discs are held in a dial carrier of the MDC, and transferred from one process station to another. The dial carrier of the MDC may be rotated and/or angled at up to 70° from normal in each process station, so that one or a plurality of process sources may treat the discs simultaneously. This configuration provides time savings and a reduction in the number and size of process sources needed. A mask enhancement process for patterning of magnetic media, and a filling and planarizing process used therewith, are also disclosed.

Abstract translation: 一种用于在用于硬盘驱动器的硬盘上图案化磁记录层的在线处理系统。 光盘在垂直方向同时处理，在称为MDC的圆盘状支架中。 多个（多达10个）盘被保存在MDC的拨号载体中，并从一个处理站传送到另一个处理站。 MDC的拨号盘可以在每个处理站中与正常旋转和/或成角度高达70°，使得一个或多个处理源可以同时处理盘。 此配置可节省时间并减少所需的进程源的数量和大小。 还公开了用于磁性介质图案化的掩模增强工艺，以及与其一起使用的填充和平坦化工艺。

公开(公告)号：WO2013173152A1

公开(公告)日：2013-11-21

申请号：PCT/US2013/040246

申请日：2013-05-09

Applicant: VEECO INSTRUMENTS INC. ,  BARRISS, Louise, S. ,  COMUNALE, Richard, A. ,  FREMGEN, Roger, P. ,  GURARY, Alexander, I. ,  LUSE, Todd, A. ,  MILGATE, III, Robert, White ,  POLLOCK, John, D.

Inventor： BARRISS, Louise, S. ,  COMUNALE, Richard, A. ,  FREMGEN, Roger, P. ,  GURARY, Alexander, I. ,  LUSE, Todd, A. ,  MILGATE, III, Robert, White ,  POLLOCK, John, D.

IPC: C23C16/44 ,  C23C16/52

CPC classification number: C23C16/4584 ,  C23C16/4586 ,  C23C16/46 ,  C23C16/52 ,  H01L21/68785 ,  H01L21/68792

Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.

Abstract translation: 用于化学气相沉积的旋转盘式反应器包括真空室和铁磁流体馈通，其包括使马达轴进入真空室的上部和下部铁磁流体密封件。 电动机联接到电动机轴并且位于上部和下部铁磁流体密封件之间的大气区域中。 转盘位于真空室中并联接到电动机轴，使得电动机以期望的转速旋转转台。 电介质支撑件联接到转盘，使得转盘在被轴驱动时旋转电介质支架。 衬底载体位于用于化学气相沉积处理的真空室中的电介质支撑体上。 加热器位于基板载体附近，将基板载体的温度控制到用于化学气相沉积的所需温度。

公开(公告)号：WO2012033639A1

公开(公告)日：2012-03-15

申请号：PCT/US2011/048996

申请日：2011-08-24

Applicant: VEECO PROCESS EQUIPMENT, INC. ,  QUINN, William E. ,  GURARY, Alexander ,  PARANJPE, Ajit ,  FERREIRA, Maria D. ,  FREMGEN, Roger P. ,  ARMOUR, Eric A.

Inventor： QUINN, William E. ,  GURARY, Alexander ,  PARANJPE, Ajit ,  FERREIRA, Maria D. ,  FREMGEN, Roger P. ,  ARMOUR, Eric A.

IPC: H01L21/67 ,  C23C16/52 ,  C23C16/455 ,  C23C16/54 ,  C30B35/00 ,  C23C16/44

CPC classification number: C30B25/025 ,  C23C16/4412 ,  C23C16/45561 ,  C23C16/52 ,  C23C16/54 ,  C30B25/02 ,  C30B25/08 ,  C30B25/10 ,  C30B25/12 ,  C30B25/14 ,  C30B29/40 ,  C30B35/005 ,  G03G15/751 ,  H01L21/0262 ,  H01L21/67017 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67727 ,  H01L21/67748 ,  H01L21/67751

Abstract: A linear cluster deposition system includes a plurality of reaction chambers positioned in a linear horizontal arrangement. First and second reactant gas manifolds are coupled to respective process gas input port of each of the reaction chambers. An exhaust gas manifold having a plurality of exhaust gas inputs is coupled to the exhaust gas output port of each of the plurality of reaction chambers. A substrate transport vehicle transports at least one of a substrate and a substrate carrier that supports at least one substrate into and out of substrate transfer ports of each of the reaction chambers. At least one of a flow rate of process gas into the process gas input port of each of the reaction chambers and a pressure in each of the reaction chambers being chosen so that process conditions are substantially the same in at least two of the reaction chambers.

Abstract translation: 线性簇沉积系统包括以线性水平布置定位的多个反应室。 第一和第二反应物气体歧管连接到每个反应室的相应工艺气体输入端口。 具有多个排气输入的废气歧管与多个反应室中的每一个的废气输出端口相连。 基板输送车辆将基板和基板载体中的至少一个输送到每个反应室的基板输送口中的至少一个基板。 选择每个反应室的工艺气体进入工艺气体输入口的流量和每个反应室中的压力中的至少一个，使得工艺条件在至少两个反应室中基本相同。

公开(公告)号：WO2009039261A1

公开(公告)日：2009-03-26

申请号：PCT/US2008/076835

申请日：2008-09-18

Applicant: VEECO INSTRUMENTS INC. ,  DRUZ, Boris ,  FREMGEN, Roger, P., Jr. ,  HAYES, Alan, V. ,  KANAROV, Viktor ,  KRAUSE, Robert ,  REISS, Ira ,  SFERLAZZO, Piero

Inventor： DRUZ, Boris ,  FREMGEN, Roger, P., Jr. ,  HAYES, Alan, V. ,  KANAROV, Viktor ,  KRAUSE, Robert ,  REISS, Ira ,  SFERLAZZO, Piero

IPC: H01J37/317 ,  H01J37/305 ,  H01J37/20 ,  H01J37/08 ,  C23C14/34 ,  C23C14/50

CPC classification number: C23C14/505 ,  C23C14/221 ,  C23C14/46 ,  C23C14/542 ,  H01J37/08 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221

Abstract: Method and apparatus for processing a substrate (44) with an energetic particle beam (42). Features (66) on the substrate (44) are oriented relative to the energetic particle beam (42) and the substrate (44) is scanned through the energetic particle beam (42). The substrate (44) is periodically indexed about its azimuthal axis (45) of symmetry, while shielded from exposure to the energetic particle beam (42), to reorient the features (66) relative to the major dimension (49) of the beam (42).

Abstract translation: 用能量粒子束（42）处理衬底（44）的方法和装置。 衬底（44）上的特征（66）相对于能量粒子束（42）定向，衬底（44）通过能量粒子束（42）扫描。 衬底（44）周围围绕其对称轴的方位角（45）进行索引，同时防止暴露于能量粒子束（42），以相对于梁的主要尺寸（49）重新定向特征（66） 42）。