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    PHOTOACTIVABLE NITROGEN BASES
    2.
    发明申请
    PHOTOACTIVABLE NITROGEN BASES 审中-公开
    可摄氮

    公开(公告)号：WO2003033500A1

    公开(公告)日：2003-04-24

    申请号：PCT/EP2002/011238

    申请日：2002-10-08

    Applicant: CIBA SPECIALTY CHEMICALS HOLDING INC. ,  BAUDIN, Gisèle ,  DIETLIKER, Kurt ,  JUNG, Tunja

    Inventor： BAUDIN, Gisèle ,  DIETLIKER, Kurt ,  JUNG, Tunja

    IPC: C07D487/04

    CPC classification number: C07D487/04 ,  B33Y70/00 ,  G03F7/0045 ,  G03F7/0295 ,  G03F7/031

    Abstract: Compounds of the formula I R7"N-R6 RS-C,N-R4 H C, R'/ I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,-C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,-C,ehaloalkyl, N02, NR,OR , CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R∼-N' R6 1 R5-C,N.R4 H I C - R3 I R2 (II) and which on absorption brings about a photoelimination which leads to the generation of an amidine group, R2 and R3 independently of one another are hydrogen, C,-C,ealkyl or phenyl which is unsubstituted or is substituted one or more times by C,-C,8alkyl, CN, OR,2, SR,2, halogen or C,-C,ehaloalkyl; R5 is C,-C,ealkyl or NR8R9; R4, R6, R,, R8, R9, R,o and R inde-pendently of one another are hydrogen or C,-C,8alkyl; or R4 and R6 together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or R5 and R,, independently of R4 and R6, together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or, if R5 is a radi-cal NR8R9, R, and R9 together form a C2-C,2alkylene bridge which is unsubstituted or is sub-stituted by one or more C1-C4alkyl radicals; and R,2, R,3 and R,4 independently of one another are hydrogen or C,-C,ealkyl; are suitable as photoinitiators for compounds which react under base catalysis.

    Abstract translation: 式I R7“N-R6RS-C，N-R4H HC，R'/ IR，3R2（I）的化合物，其中R 1是能够吸收波浪中的光的芳族或杂芳族基团， 长度范围为200nm至650nm，其未被取代或被C 1 -C 8烷基，C 2 -C 6烯基，C 2 -C 8炔基，C 1 -C 8卤代烷基，N 2 NR，OR ，CN，OR，2，SR，2，C（O）R，3，C（O）OR 4，卤素或式II的基团R 1 -C 6R 5 R 5 -C - R3 I R2（II），其吸收引起导致脒基的生成的光致游离，R 2和R 3彼此独立地是氢，C 1 -C 6烷基或未取代或被取代的苯基 C 1 -C 8烷基，CN，OR 2，SR 2，卤素或C 1 -C 6卤代烷基; R 5为C 1 -C 6烷基或NR 8 R 9; R 4，R 6， R 1，R 2，R 3和R 4彼此独立地是氢或C 1 -C 8烷基;或者R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥 自由基; 或R 5和R 7独立于R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 或者如果R 5是辐射级NR 8 R 9，则R 3和R 9一起形成未被取代或由一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 和R，2，R 3和R 4彼此独立地是氢或C 1 -C 6烷基; 适用于在碱催化下反应的化合物的光引发剂。

    ENZYMATIC PROCESS FOR PREPARING ORGANOSILICON GROUP CONTAINING PHOTOINITIATORS
    3.
    发明申请
    ENZYMATIC PROCESS FOR PREPARING ORGANOSILICON GROUP CONTAINING PHOTOINITIATORS 审中-公开
    用于制备含有光敏剂的有机硅基团的酶法

    公开(公告)号：WO2003074718A1

    公开(公告)日：2003-09-12

    申请号：PCT/EP2003/001896

    申请日：2003-02-25

    Applicant: CIBA SPECIALTY CHEMICALS HOLDING INC. ,  ÖHRLEIN, Reinhold ,  SCHÖNING, Kai-Uwe ,  BAISCH, Gabriele ,  HARTWIG, Jemima ,  BAUDIN, Gisèle ,  JUNG, Tunja

    Inventor： ÖHRLEIN, Reinhold ,  SCHÖNING, Kai-Uwe ,  BAISCH, Gabriele ,  HARTWIG, Jemima ,  BAUDIN, Gisèle ,  JUNG, Tunja

    IPC: C12P9/00

    CPC classification number: C07F7/0889 ,  C12P9/00

    Abstract: The invention relates to a process for preparing organosilicon group containing photoinitiators of the formula (I), wherein m is a number from 1 to 200; q is 0 or 1; A is IN-C(O)-O-CHR 3 -Y- or IN-C(O)-NH-CHR 3 -Y-; A’ is A or R 1 ’; R 1 and R 1 ’, R 2 and R 2 ’ are C 1 -C 18 alkyl or phenyl, or -(O) q -SiR 1 R 1 ’R2; R 3 is hydrogen or C 1 -C 6 alkyl, Y is a divalent group selected from C 1 -C 10 alkeylene, C 2 -C 10 alkenylene or -(CH 2 ) b -O-(CH 2 ) a -; and b are each independently of the other a number of 1 to 6; IN is a photolabile functional moiety of the formula (II) or (III), wherein R 4 is hydrogen or -C(O)-C(O)-OH or -C(O)-C(O)-OC 1 -C 6 alkyl and n is 1-3; R 5 and R 6 are C 1 -C 12 alkyl or together are cycloC 5 -C 7 alkyl; R 7 is hydroxy, C 1 -C 6 alkoxy or morpholinyl; X is -(CH 2 ) a -, -(CH 2 ) b -O-(CH 2 ) a - or -(CH 2 ) b -O-CO-(CH 2 ) a -; a and b are each independently of the other a number of 1 to 6; whereby the process is characterized in that a photolabile functional moiety containing a carboxy group (IN-COOH) or an alkoxycarbonyl group (IN-CO-OC 1 -C 6 alkyl) is reacted with a carbinol- or amino terminated organosilicon compound of the formula (IV), wherein m, R 1 and R 1 ’, R 2 and R 2 ’ are as defined above and B is -Y-CHR 3 -OH or -Y-CHR 3 -NH 2 ; B’ is B or R 1 ’, in the presence of an enzyme which catalyzes the esterification, transesterification or amidation reaction.

    Abstract translation: 本发明涉及一种制备含有式（I）的光引发剂的有机硅基团的方法，其中m为1至200的数; q为0或1; A是IN-C（O）-O-CHR 3 -Y-或IN-C（O）-NH-CHR 3 -Y-; A'是A或R1'; R1和R1'，R2和R2'是C1-C18烷基或苯基，或 - （O）q-SiR1R1'R2; R 3是氢或C 1 -C 6烷基，Y是选自C 1 -C 10亚乙烯基，C 2 -C 10亚烯基或 - （CH 2）b -O-（CH 2）a - 的二价基团。 和b各自独立地为1至6的数; IN是式（II）或（III）的光不稳定官能部分，其中R4是氢或-C（O）-C（O）-OH或-C（O）-C（O）-OC1-C6烷基， n为1-3; R5和R6是C1-C12烷基或一起是环C 5 -C 7烷基; R7是羟基，C1-C6烷氧基或吗啉基; X是 - （CH 2）a - ， - （CH 2）b -O-（CH 2）a-或 - （CH 2）b -O-CO-（CH 2）a-; a和b各自独立地为1至6的数; 其特征在于含有羧基（IN-COOH）或烷氧基羰基（IN-CO-OC1-C6烷基）的光不稳定官能部分与式（IV）的甲醇或氨基封端的有机硅化合物反应， 其中m，R1和R1'，R2和R2'如上所定义，B是-Y-CHR 3 -OH或-Y-CHR 3 -NH 2; 在催化酯化，酯交换反应或酰胺化反应的酶存在下，B'是B或R1'。

    SURFACE-ACTIVE SILOXANE PHOTOINITIATORS
    4.
    发明申请
    SURFACE-ACTIVE SILOXANE PHOTOINITIATORS 审中-公开
    表面活性硅氧烷光敏剂

    公开(公告)号：WO2003066688A1

    公开(公告)日：2003-08-14

    申请号：PCT/EP2003/000820

    申请日：2003-01-28

    Applicant: CIBA SPECIALTY CHEMICALS HOLDING INC. ,  BAUDIN, Gisèle ,  JUNG, Tunja

    Inventor： BAUDIN, Gisèle ,  JUNG, Tunja

    IPC: C08F2/50

    CPC classification number: C08F2/50 ,  B33Y70/00

    Abstract: Compounds of the formula (I) are suitable photoinitiators which accumulates at the surface of the formulation (I), in which R is for example phenyl and A is a surface-active radical of the formula (III), Y is a divalent group C 3 -C 12 cycloalkylene, C 6 -C 12 bicycloalkylene; C 1 -C 6 alkylene-C 3 -C 12 cycloalkylene, C 1 -C 6 alkylene-C 6 -C 12 bicycloalkylene or C 1 -C 10 alkylene interrupted by one or more non-consecutive C 3 -C 12 cycloalkylene, -U-C 3 -C 12 Cycloalkylene, C 6 -C 12 bicycloalkylene or -U-C 6 -C 12 bicycloalkylene; C 1 -C 10 alkylene interrupted by one or more non-consecutive O and C 3 -C 12 Cycloalkylene, -U-C 3 -C 12 cycloalkylene, C 6 -C 12 bicycloalkylene and/or -U-C 6 -C 12 bicycloalkylene; -(CH 2 ) a -CH-CH 2 -OH or -(CH 2 ) b -O-(CH 2 ) a -CH-CH 2 -OH; or -(CH 2 ) a -CH(OH)-CH 2 - or -(CH 2 ) b -O-(CH 2 ) a CH(OH)-CH 2 -. U is U' or U" U' is -(CH 2 ) a COO-; U" is -Si(CH 3 )(CH 3 )- or -(CH 2 ) a -Si(CH 3 )(CH 3 )- , a is a number from 1 to 10; b is a number from 0 to 10; with the proviso that they are, however, at least 1 if the methylene group in question is between two oxygen atoms .

    Abstract translation: 式I的化合物是在制剂I的表面积聚的合适的光引发剂，其中R是例如苯基，A是式III的表面活性基团，Y是二价基团C 3 -C 12亚环烷基，C 6 -C 12亚环烷基 C 1 -C 6亚烷基-C 3 -C 12亚环烷基，被一个或多个非连续C 3 -C 12亚环烷基断开的C 1 -C 6亚烷基-C 6 -C 12亚环烷基或C 1 -C 10亚烷基，-U-C 3 -C 12亚环烷基，C 6 -C 12二环
    烃基或-U-C 6 -C 12二环烷基C1- -C 1 -C 10亚烷基被一个或多个不连续的O和C 3 -C 12亚环烷基，-U-C 3 -C 12亚环烷基，C 6 -C 12二环烷基和/或-U-C 6 -C 12二环
    烃基-CH 2 a -CH-CH 2 -OH或-CH 2 b -O-CH 2 - CH-CH 2 -OH或-CH 2 a-CHOH -CH 2 - 或-CH 2 b -O-CH 2 CH CHOH-CH 2 - 。 U是U'或U“U'是-CH 2 aCOO-U”是-SiCH 3 CH 3 - 或-CH 2 a-SiCH 3 CH 3 - ，a是1至10 b的数字是0至10的数，条件是它们是 如果所讨论的亚甲基在两个氧原子之间，则至少为1。

    SURFACE-ACTIVE PHOTOINITIATORS
    5.
    发明申请
    SURFACE-ACTIVE PHOTOINITIATORS 审中-公开

    公开(公告)号：WO2003066687A3

    公开(公告)日：2003-08-14

    申请号：PCT/EP2003/000819

    申请日：2003-01-28

    Applicant: CIBA SPECIALTY CHEMICALS HOLDING INC. ,  BAUDIN, Gisèle ,  JUNG, Tunja

    Inventor： BAUDIN, Gisèle ,  JUNG, Tunja

    IPC: C08F2/46

    Abstract: Compounds of the formula la, Ib and Ic are suitable photoinitiators which accumulate at the surface of the formulation (Ic), in which R, R 1 , and R 2 a are e.g.phenyl substituted by at least one siloxane group A-X-, R a and R are e.g. phenylene is a surface-active radical of the formula III A 3 is a radical of the formula III in which n is from 2 to 1000; X and X 1 are -U-C 3 -C 12 cycloalkylene, -U-C 6 -C 12 bicycloalkylene, U-C 3 -C 12 cyclo-alkylene-C l -C 6 alkylene, U-C 6 - C 12 bicycloalkylene-C,-C 6 alkylene;- - or a group selected from -(CH 2 ) a CH-CH 2 -OH or -(CH 2 ) a O-(CH 2 ) b -CH-CH 2 -OH; I I O-CO-(CH 2 ) b - O-CO-(CH 2 ) c or -(CH 2 ) a .-CH(OH)-CH 2 -O-CO-(CH 2 ) b - or -(CH 2 ) b -O-(CH 2 ) a CH(OH)-CH 2 -O-CO-(CH 2 ) c ; and U is e.g. -COO-, -(CH 2 ) a C00-; Y is hydrogen; unsubstituted C 1 -C 20 alkyl or C 1 -C 20 alkyl substituted by A-X-.; Y 1 is e.g. C 1 -C 12 -alkylene.

    FLUORINATED PHOTOINITIATORS IN HIGHLY FLUORINATED MONOMERS
    10.
    发明申请
    FLUORINATED PHOTOINITIATORS IN HIGHLY FLUORINATED MONOMERS 审中-公开
    高荧光单体中的荧光光敏元件

    公开(公告)号：WO2003066693A1

    公开(公告)日：2003-08-14

    申请号：PCT/EP2003/000818

    申请日：2003-01-28

    Applicant: CIBA SPECIALTY CHEMICALS HOLDING INC. ,  BAUDIN, Gisèle ,  JUNG, Tunja

    Inventor： BAUDIN, Gisèle ,  JUNG, Tunja

    IPC: C08F220/24

    CPC classification number: C08F20/24

    Abstract: The invention provides photopolymerizable compositions comprising (A) at least one ethylenically unsaturated photopolymerizable fluocarbon compound selected from polyfluoroalkyl monoacrylates, polyfluoroalkyl monomethacrylatesor polyfluoroalkyl­diacrylates and (B) at least one photoinitiator of the formula (I) R is a radical of the formula (II) s is a number of 1 to 4, r is a number of 1 to 2; Y is a single bond or is a divalent linker group A if s is 1, is a radical A 0 , where A 0 is C 1 -C3oalkyl, C 1 -C 30 alkenyl, C 1 -C 30 alkynyl or C 1 -C 30 aralkyl the radicals being substituted by at least two fluorine atoms and optionally further substituted by OH-, C 1 -C 4 alkoxy-, phenyl-, naphthyl-, halogen-, CN-, SR 7 -, NR 8 R 9 - and/or -O(CO)R 10 -; and the radical A 0 is uninterrupted or interrupted by one or more -O-, -S- or -NR 12 -; A if s is > 1, is a radical A 1 ; where A 1 is C 1 -C 30 alkylene, C 1 -C 3 oalkenylene, C l -C 3 oalkynylene or C 1 -C 30 aralkylene, the radicals being substituted by at least two fluorine atoms and optionally further substituted by OH-, C 1 -C 4 alkoxy-, phenyl-, naphthyl-, halogen-, CN-, SR 7 -, NR 8 R 9 - and/or -O(CO)R 10 -; and the radical A 1 is uninterrupted or interrupted by one or more -0-, -S- or -NR 12 -.

    Abstract translation: 本发明提供了可光聚合组合物，其包含A至少一种选自多氟烷基单丙烯酸酯，多氟烷基单甲基丙烯酸酯或多氟烷基二丙烯酸酯和至少一种式IR的光引发剂的烯键式不饱和光聚合性氟化烃化合物，式II的基团是1至4的数，r 是1〜2的数，Y是单键，如果s是1，则为二价连接基团A，为基团A0，其中A0为C1-C3烷基，C1-C30烯基，C1-C30炔基或C1-C30芳烷基，基团为 被至少两个氟原子取代并任选进一步被OH - ，C 1 -C 4烷氧基 - ，苯基 - ，萘基 - ，卤素 - ，CN-，SR 7 - ，NR 8 R 9 - 和/或-OCOR 10-取代，并且基团A 0不间断或 如果s> 1，则被一个或多个-O - ， - S-或-NR 12 - A中断，是基团A1，其中A 1是C 1 -C 30亚烷基，C 1 -C 30亚烯基，C 1 -C 30亚炔基或C 1 -C 30亚烷基，该基团被取代 通过至少两个氟原子和任选的f 还被OH-，C 1 -C 4烷氧基 - ，苯基 - ，萘基 - ，卤素 - ，CN-，SR 7 - ，NR 8 R 9 - 和/或-OCOR 10 - 取代，并且基团A1不间断或被一个或多个-O-， -S-或-NR 12 - 。

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