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    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS
    1.
    发明申请
    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
    光固化制剂氧化还原固定光敏酰胺基的研究

    公开(公告)号：WO2009095282A2

    公开(公告)日：2009-08-06

    申请号：PCT/EP2009/050066

    申请日：2009-01-06

    Applicant: CIBA HOLDING INC. ,  STUDER, Katia ,  DIETLIKER, Kurt ,  JUNG, Tunja

    Inventor： STUDER, Katia ,  DIETLIKER, Kurt ,  JUNG, Tunja

    IPC: C08F2/50 ,  G03F7/031 ,  C07D487/04

    CPC classification number: C08F2/50 ,  G03F7/031

    Abstract: The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.

    Abstract translation: 本发明涉及用于可自由基固化制剂的氧化还原固化的潜光脒碱，即包含（a1）潜光脒碱的组合物; 或（a2）潜光胺碱; 或（a3）（a1）和（a2）的混合物; 和（b）可自由基聚合的化合物; 和（c）能够被胺和/或脒还原的自由基引发剂，特别是过氧化物。

    PHOTOACTIVABLE NITROGEN BASES
    3.
    发明申请
    PHOTOACTIVABLE NITROGEN BASES 审中-公开
    可摄氮

    公开(公告)号：WO2008119688A1

    公开(公告)日：2008-10-09

    申请号：PCT/EP2008/053456

    申请日：2008-03-25

    Applicant: CIBA HOLDING INC. ,  DIETLIKER, Kurt ,  MISTELI, Katharina ,  STUDER, Katia ,  JUNG, Tunja ,  ENGELBRECHT, Lothar Alexander

    Inventor： DIETLIKER, Kurt ,  MISTELI, Katharina ,  STUDER, Katia ,  JUNG, Tunja ,  ENGELBRECHT, Lothar Alexander

    IPC: G03F7/004 ,  G03F7/038 ,  C07C1/00 ,  C07D487/00 ,  C08F2/50

    CPC classification number: G03F7/0382 ,  C07D487/04 ,  C08F2/50 ,  G03F7/0045

    Abstract: Compounds of the Formula (I), (II) and (III) wherein Aris for example phenylene, biphenyleneor naphthylene, all of which areunsubsti- tuted or substituted by C 1 -C 4 -alkyl, C 2 -C 4 -alkenyl, CN, OR 11 , SR 11 , CH 2OR 11 , COOR 12 , CONR 12 R 13 or halogen; R 1 , R 2 , R 7 and R 8 independently of one another other are hydrogen or C 1 -C 6 -alkyl;R 3 and R 5 together and R 4 and R 6 together form a C 2 -C 6 -alkylene bridge which is unsubstituted or substituted by one ore more C 1 -C 4 -alkyl; R 11 is hydrogen or C 1 -C 6 -alkyl; R 12 and R 13 independently of one another forexample are hydrogen, phenyl, C 1 -C 18 -alkyl, C 1 -C 18 -alkyl which is interrupted by one or more O; n is 1-10;X is O, S or NR 10 ; A and A 1 are suitable linking groups;are suitable as photolatent bases.

    Abstract translation: 式（I），（II）和（III）的化合物，其中Aris例如亚苯基，联苯基亚萘基，所有这些都被C 1 -C 4亚烷基取代或取代， C 1 -C 6烷基，C 2 -C 4 - 烯基，CN，OR 11，SR 11，CH 2OR 11，COOR 12，CONR 12 R 13或卤素; R 1，R 2，R 7和R 8各自独立地是氢或C 1个C 6 -C 6 - 烷基; R 3和R 5一起和R 4和...和 R 6一起形成未被取代或被一个或多个C 1 -C 6亚烷基取代的C 2 -C 6亚烷基桥， SUB> -C 4 - 烷基; R 11是氢或C 1 -C 6 - 烷基; R 12和R 13彼此独立地是例如氢，苯基，C 1 -C 18 - 烷基 被一个或多个O中断的C 1 -C 18 - 烷基; n为1-10; X为O，S或NR 10; A和A 1是适合的连接基团;适合作为光引发剂碱。

    PHOTOACTIVABLE NITROGEN BASES
    4.
    发明申请
    PHOTOACTIVABLE NITROGEN BASES 审中-公开
    可摄氮

    公开(公告)号：WO2003033500A1

    公开(公告)日：2003-04-24

    申请号：PCT/EP2002/011238

    申请日：2002-10-08

    Applicant: CIBA SPECIALTY CHEMICALS HOLDING INC. ,  BAUDIN, Gisèle ,  DIETLIKER, Kurt ,  JUNG, Tunja

    Inventor： BAUDIN, Gisèle ,  DIETLIKER, Kurt ,  JUNG, Tunja

    IPC: C07D487/04

    CPC classification number: C07D487/04 ,  B33Y70/00 ,  G03F7/0045 ,  G03F7/0295 ,  G03F7/031

    Abstract: Compounds of the formula I R7"N-R6 RS-C,N-R4 H C, R'/ I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,-C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,-C,ehaloalkyl, N02, NR,OR , CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R∼-N' R6 1 R5-C,N.R4 H I C - R3 I R2 (II) and which on absorption brings about a photoelimination which leads to the generation of an amidine group, R2 and R3 independently of one another are hydrogen, C,-C,ealkyl or phenyl which is unsubstituted or is substituted one or more times by C,-C,8alkyl, CN, OR,2, SR,2, halogen or C,-C,ehaloalkyl; R5 is C,-C,ealkyl or NR8R9; R4, R6, R,, R8, R9, R,o and R inde-pendently of one another are hydrogen or C,-C,8alkyl; or R4 and R6 together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or R5 and R,, independently of R4 and R6, together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or, if R5 is a radi-cal NR8R9, R, and R9 together form a C2-C,2alkylene bridge which is unsubstituted or is sub-stituted by one or more C1-C4alkyl radicals; and R,2, R,3 and R,4 independently of one another are hydrogen or C,-C,ealkyl; are suitable as photoinitiators for compounds which react under base catalysis.

    Abstract translation: 式I R7“N-R6RS-C，N-R4H HC，R'/ IR，3R2（I）的化合物，其中R 1是能够吸收波浪中的光的芳族或杂芳族基团， 长度范围为200nm至650nm，其未被取代或被C 1 -C 8烷基，C 2 -C 6烯基，C 2 -C 8炔基，C 1 -C 8卤代烷基，N 2 NR，OR ，CN，OR，2，SR，2，C（O）R，3，C（O）OR 4，卤素或式II的基团R 1 -C 6R 5 R 5 -C - R3 I R2（II），其吸收引起导致脒基的生成的光致游离，R 2和R 3彼此独立地是氢，C 1 -C 6烷基或未取代或被取代的苯基 C 1 -C 8烷基，CN，OR 2，SR 2，卤素或C 1 -C 6卤代烷基; R 5为C 1 -C 6烷基或NR 8 R 9; R 4，R 6， R 1，R 2，R 3和R 4彼此独立地是氢或C 1 -C 8烷基;或者R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥 自由基; 或R 5和R 7独立于R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 或者如果R 5是辐射级NR 8 R 9，则R 3和R 9一起形成未被取代或由一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 和R，2，R 3和R 4彼此独立地是氢或C 1 -C 6烷基; 适用于在碱催化下反应的化合物的光引发剂。

    ALPHA-HYDROXYKETONES
    5.
    发明申请
    ALPHA-HYDROXYKETONES 审中-公开
    α-羟基

    公开(公告)号：WO2008122504A1

    公开(公告)日：2008-10-16

    申请号：PCT/EP2008/053458

    申请日：2008-03-25

    Applicant: CIBA HOLDING INC. ,  DIETLIKER, Kurt ,  MURER, Peter ,  HÜSLER, Rinaldo ,  JUNG, Tunja

    Inventor： DIETLIKER, Kurt ,  MURER, Peter ,  HÜSLER, Rinaldo ,  JUNG, Tunja

    IPC: C07D211/32 ,  C07D241/04 ,  C07C49/543 ,  C07C62/30 ,  C07C229/46 ,  C07F7/08

    CPC classification number: C07D211/32 ,  C07C49/83 ,  C07C49/835 ,  C07C49/84 ,  C07C62/38 ,  C07C69/757 ,  C07C219/12 ,  C07C235/82 ,  C07C2601/14 ,  C07D295/185 ,  C07D305/12 ,  C07F7/0836 ,  C07F7/0854 ,  C07F7/1868 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40

    Abstract: Compounds of theFormula (I) wherein x is an integer from 1-4; p is an integer from 1-3; q is an integer from 0-3; Ar is phenyl, naphthyl, anthryl or phenanthryl each of which optionally is substituted by one or more Cl, CN, OR 5 , C 3 -C 5 alkenyl or C 1 -C 6 alkyl which optionally is substituted by one or more OR 6 , COOR or halogen; R 1 ifx is 1, is OR 7 , O- X + , NR 8 R 9 , C 1 -C 20 alkyl optionally substituted by one or more COOR 10 , or is C 2 -C 20 alkyl interrupted by one ore more O, or is C 2 -C 5 alkenyl or phenyl-C 1 -C 4 alkyl; R 1 ifx is 2, is for example C 1 -C 20 alkylene; R 1 ifx is 3, is for example a tri- valent radical; R 1 if x is 4, is for example a tetravalent radical; R 2 and R 3 are hydrogen or C 1 - C 8 alkyl, or R 2 and R 3 together are O, C 1 -C 3 alkylene or CH=CH; R 4 is C 1 -C 4 alkyl; R 5 , R 6 , R 7 , R 8 , R 9 and R 10 are for example hydrogen or C 1 -C 4 alkyl; and X is a x-valent cationic counter ion; are in particular suitable as photoinitiators forthe curing with UV-A light (320-450 nm).

    Abstract translation: 式（I）的化合物，其中x是1-4的整数; p是1-3的整数; q是0-3的整数; Ar是苯基，萘基，蒽基或菲基，其各自任选被一个或多个Cl，CN，OR 5，C 3 -C 5 - 任选被一个或多个OR 6，COOR或卤素取代的亚烷基或C 1 -C 6 -C 6烷基; R 1 x 1是1，是OR 7，O-X +，NR 8 R 9 或任选被一个或多个COOR 10取代的C 1 -C 20烷基或C 2 -C 20烷基， 被一个或多个O取代的C 1 -C 20烷基或C 2 -C 5 - 烯基或苯基-C 1 -C 4 烷基; R 1，如果x为2，则为例如C 1 -C 20亚烷基; R 1是3，例如是3价基团; 如果x为4，则R 1为例如四价基团; R 2和R 3是氢或C 1 -C 8烷基，或R 2， R 3和R 3一起是O，C 1 -C 3亚烷基或CH = CH; R 4是C 1 -C 4烷基; R 4是C 1 -C 4烷基; R 5，R 6，R 7，R 8，R 9和R 9和 R 10是例如氢或C 1 -C 4烷基; X为x-阳离子抗衡离子; 特别适用于用UV-A光（320-450nm）固化的光引发剂。

    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS
    9.
    发明申请
    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
    用于氧化固化的光固化胺基

    公开(公告)号：WO2009095282A3

    公开(公告)日：2009-11-12

    申请号：PCT/EP2009050066

    申请日：2009-01-06

    Applicant: BASF SE ,  STUDER KATIA ,  DIETLIKER KURT ,  JUNG TUNJA

    Inventor： STUDER KATIA ,  DIETLIKER KURT ,  JUNG TUNJA

    IPC: C08F2/50 ,  C07D487/04 ,  G03F7/031

    CPC classification number: C08F2/50 ,  G03F7/031

    Abstract: The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.

    Abstract translation: 本发明涉及用于自由基可固化制剂的氧化还原固化的照相脒基，即包含（a1）光引发脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。

    METHOD OF BONDING
    10.
    发明申请
    METHOD OF BONDING 审中-公开
    结合方法

    公开(公告)号：WO2008009575A3

    公开(公告)日：2008-03-27

    申请号：PCT/EP2007056917

    申请日：2007-07-09

    Applicant: CIBA SC HOLDING AG ,  STUDER KATJA ,  JUNG TUNJA ,  DIETLIKER KURT

    Inventor： STUDER KATJA ,  JUNG TUNJA ,  DIETLIKER KURT

    IPC: C08K5/34 ,  C09J5/00 ,  C09J175/04

    CPC classification number: C08G18/3876 ,  C08G18/10 ,  C08G18/1841 ,  C08G18/2063 ,  C09J5/00 ,  C09J175/04 ,  C09J2475/00 ,  C08G18/40 ,  C08G18/6618

    Abstract: The invention relates to a first method of bonding a first substrate to a second substrate, comprising the steps of a) applying an UV-curable adhesive resin composition comprising a photolatent base to at least one transparent surface of at least one of said first and second substrates, b) bringing said first and second substrates together with said adhesive composition there between, c) exposing said adhesive composition to actinic radiation to effect curing or alternatively to a second method of bonding a first substrate to a second substrate, comprising the steps of a) applying a UV-curable adhesive resin composition comprising a photolatent base to one surface, b) exposing said adhesive composition to actinic radiation to effect curing, c) bringing said first and second substrates together with said adhesive composition there between.

    Abstract translation: 本发明涉及将第一衬底粘合到第二衬底的第一种方法，包括以下步骤：a）将包含光致变色基底的UV可固化粘合剂树脂组合物施加到所述第一和第二衬底中的至少一个的至少一个透明表面上 衬底，b）将所述第一和第二衬底与其间的所述粘合剂组合物一起，c）将所述粘合剂组合物暴露于光化辐射以实现固化，或者替代地将第一衬底结合到第二衬底的第二种方法，包括以下步骤： a）将包含光致变色基底的UV可固化粘合剂树脂组合物施加到一个表面上，b）将所述粘合剂组合物暴露于光化辐射以进行固化，c）将所述第一和第二基底与其间的所述粘合剂组合物一起使用。

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