Abstract:
The present invention is directed to a high speed, spinning chuck for use in a semiconductor wafer inspection system. The chuck of the present disclosure is configured with a turbulence-reducing lip. Spinning of the chuck produces radial airflows proximal to a surface of the wafer and proximal to the bottom of the chuck. The turbulence-reducing lip of the chuck of the present disclosure directs the radial airflows off of the top surface of the wafer and the bottom surface of the chuck in a manner that minimizes the size of the low pressure zone formed between these radial airflows. The minimization of the low pressure zone reduces air turbulence about the periphery of the chuck and substrate, thereby reducing the possibility of contaminants in the system being directed onto the surface of the substrate by such air turbulence.
Abstract:
The present invention provides a detection reagent for detection of the presence of a substance of interest in a sample. The detection reagent comprises a binding portion, a linking portion, and a catalytic portion. The linking portion comprises a cleavage site for cleavage of the binding portion from the catalytic portion. According to the method, the detection reagent is caused to bind to the substance of interest. The bound reagent is then cleaved by breaking of a bond in the linking portion. Upon cleavage, the catalytic portion is removed from the binding reaction mixture and caused to catalyze a reaction that produces a detectable product.
Abstract:
The present invention provides methods, kits and compositions for the detection of an analyte. In the methods of the invention, a binding molecule coupled to a first polymerase is incubated with a modified polynucleotide template to form a copy of the modified polynucleotide template without any modified nucleotides. The unmodified copy is detected in a second amplification/primer extension reaction using a second polymerase that is unable to amplify the modified polynucleotide template. Detection of the unmodified copy is indicative of the presence and/or amount of the analyte in the sample. In place of the binding molecule coupled to a first polymerase, a pair of analyte-specific probes can also be used. The first analyte specific probe comprises a first binding moiety and a first portion of a first polymerase and the second analyte specific probe comprises a second binding moiety and a second portion of the first polymerase. When the binding moieties are bound to the analyte the first and second portions of the polymerase interact to form a functional polymerase complex that is used to form a copy of the modified polynucleotide template without any modified nucleotides.
Abstract:
Provided herein are methods, compositions and kits for detecting a target nucleic acid. A target nucleic acid can be produced, for example, by a cleavage reaction in an assay for detection of biological samples. In one aspect, a described method comprises the following steps: hybridizing the target nucleic acid having a 5' end and a 3' end to a probe to form a circular hybridization complex; forming a covalent circular target nucleic acid using the probe as a template for nucleic acid synthesis; and detecting the covalent circular target nucleic acid.
Abstract:
Methods and systems for detecting pinholes in a film formed on a wafer or for monitoring a thermal process tool are provided. One method for detecting pinholes in a film formed on a wafer includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. This method also includes detecting the pinholes in the film formed on the wafer using the second output. One method for monitoring a thermal process tool includes generating output responsive to light from a wafer using an inspection system. The output includes the first and second output described above. The wafer was processed by the thermal process tool prior to generating the output. The method also includes monitoring the thermal process tool using the second output.
Abstract:
Methods and systems for detecting pinholes in a film formed on a wafer or for monitoring a thermal process tool are provided. One method for detecting pinholes in a film formed on a wafer includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. This method also includes detecting the pinholes in the film formed on the wafer using the second output. One method for monitoring a thermal process tool includes generating output responsive to light from a wafer using an inspection system. The output includes the first and second output described above. The wafer was processed by the thermal process tool prior to generating the output. The method also includes monitoring the thermal process tool using the second output.
Abstract:
Disclosed herein is an apparatus for providing passive correction for thermal effects on a mounted mechanical component. Further disclosed is a wafer inspection system employing the passive thermal effect correction apparatus.
Abstract:
The present invention provides methods, kits and compositions for the detection of an analyte. The invention is particularly suited for the detection and quantification of analytes in solution. In the methods of the invention a complex is formed between two or more analyte specific probes (ASP) and an analyte. The reactive moieties of the probes interact upon the binding of the analyte specific probes to the analyte. The reactive moieties generate a nucleic acid cleavage product which is detected and indicative of the presence of the analyte.
Abstract:
Disclosed herein is an apparatus for providing passive correction for thermal effects on a mounted mechanical component. Further disclosed is a wafer inspection system employing the passive thermal effect correction apparatus.
Abstract:
Substrate processing method and apparatus are disclosed. The apparatus includes a chuck having a surface with one or more gas flow openings configured to provide a flow of gas to the surface. The surface includes one or more vacuum channels distributed across the surface. The vacuum channels permit vacuum to be drawn therethrough. In the method a substrate may be supported proximate the chuck surface with a back surface of the substrate sufficiently close to the chuck surface that a flow of gas and vacuum can maintain the substrate back surface and the chuck surface in a spaced-apart relationship. Gas flow is provided to the chuck surface through the gas flow openings and vacuum is drawn through one or more vacuum channels. The substrate is moved along a direction substantially perpendicular to the surface of the substrate.