公开(公告)号：WO2008039068A3

公开(公告)日：2008-08-14

申请号：PCT/NL2007050466

申请日：2007-09-25

Applicant: ASML NETHERLANDS BV ,  KONINKL PHILIPS ELECTRONICS NV ,  VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  FRANKEN JOHANNES CHRISTIAAN LE ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  KLUNDER DERK JAN WILFRED ,  DRIESSEN NIELS MACHIEL ,  SOER WOUTER ANTHON

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  FRANKEN JOHANNES CHRISTIAAN LE ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  KLUNDER DERK JAN WILFRED ,  DRIESSEN NIELS MACHIEL ,  SOER WOUTER ANTHON

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G01N21/15 ,  G03F7/70558

Abstract: An optical sensor apparatus (1) for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface (3) and a removal mechanism (5) configured to remove debris (6) from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract translation: 公开了一种用于极紫外光刻系统的光学传感器装置（1）。 该装置包括光学传感器，其包括传感器表面（3）和移除机构（5），其构造成从传感器表面去除碎屑（6）。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：WO2008039068A2

公开(公告)日：2008-04-03

申请号：PCT/NL2007/050466

申请日：2007-09-25

Applicant: ASML NETHERLANDS B.V. ,  KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BANINE, Vadim Yevgenyevich ,  FRANKEN, Johannes Christiaan Leonardus ,  FRIJNS, Olav Waldemar Vladimir ,  KLUNDER, Derk Jan Wilfred ,  DRIESSEN, Niels Machiel ,  SOER, Wouter Anthon

Inventor： VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BANINE, Vadim Yevgenyevich ,  FRANKEN, Johannes Christiaan Leonardus ,  FRIJNS, Olav Waldemar Vladimir ,  KLUNDER, Derk Jan Wilfred ,  DRIESSEN, Niels Machiel ,  SOER, Wouter Anthon

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G01N21/15 ,  G03F7/70558

Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract translation: 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的去除机构。 因此，可以方便地为光刻系统执行剂量和/或污染测量。