Abstract:
A device constructed to generate radiation includes a liquid bath, and a pair of electrodes. At least a part of one of the electrodes is formed by a cable part moveable with respect to the liquid bath. The device also includes an actuator arranged to move the cable part from a liquid-adhering position to an ignition position, and an ignition source configured to trigger a discharge produced radiating plasma from the liquid adherent to the cable part, when the cable part is in the ignition position, by a discharge between the electrodes. The liquid-adhering position is a position for adhering a liquid from the bath to the part of the electrode.
Abstract:
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
Abstract:
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
Abstract:
A transmissive spectral purity filter (100) is configured to transmit extreme ultraviolet radiation. The spectral purity filter (102F) includes a filter part (100) having a plurality of apertures (104) configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture (104) has been manufactured by an anisotropic etching process.
Abstract:
A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.
Abstract:
A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
Abstract:
An optical sensor apparatus (1) for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface (3) and a removal mechanism (5) configured to remove debris (6) from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
Abstract:
A lithographic apparatus includes a radiation source and an object (301) with a first surface (302) which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
Abstract:
A contact detection method (70) involves a navigation of a contact detection tube (20') within an open space of an anatomical region (50) of a body. The contact detection tube includes a tubular wall (21) having an interior surface (23) defining a working channel (24), and an electrode (30) integrated in the tubular wall (21). The electrode (30) electrically connects the contact detection tube (20') to an electrically conductive object (41, 52) (e.g., biological tissue or a medical instrument/tool) in physical contact with an exterior surface (22) of the tubular wall (21) and electrically isolates the working channel (24) from any electrical connection of the tube (20') to the object (41, 52). The method (70) further involves a determination of a contact status of the contact detection tube (20') between an open state (i.e., no physical contact) and a closed state (i.e., physical contact).
Abstract:
A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.