公开(公告)号：WO2009024860A3

公开(公告)日：2009-04-16

申请号：PCT/IB2008002201

申请日：2008-08-20

Applicant: ASML NETHERLANDS BV ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH

Inventor： BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/008

Abstract: A radiation source comprising a chamber (1) and a supply of a plasma generating substance, the source having an interaction point (13) at which the plasma generating substance introduced into the chamber may interact with a laser beam (7) and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit (11) arranged to deliver a buffer gas into the chamber, the conduit having an outlet (12) which is adjacent to the interaction point.

Abstract translation: 一种辐射源，包括室（1）和等离子体产生物质的供应源，所述源具有相互作用点（13），等离子体产生物质引入到所述室中可以与激光束（7）相互作用，从而产生 辐射发射等离子体，其中所述源还包括布置成将缓冲气体输送到所述室中的导管（11），所述导管具有与所述相互作用点相邻的出口（12）。

公开(公告)号：WO2008044925A3

公开(公告)日：2009-03-05

申请号：PCT/NL2007050469

申请日：2007-09-25

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG ,  VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNS ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

Inventor： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNES ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector (10A) and a second radiation dose detector (10B), each detector comprising a secondary electron emission surface (11) configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter (13), connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器（10A）和第二辐射剂量检测器（10B），每个检测器包括二次电子发射表面（11），其被配置为接收辐射通量并由于接收到辐射而发射二次电子 通量，相对于辐射传播方向观察到的相对于第二辐射剂量检测器位于上游的第一辐射剂量检测器和连接到每个检测器的仪表（13），以检测由二次电子产生的电流或电压 从各个电子发射表面发射。

公开(公告)号：WO2008133506A1

公开(公告)日：2008-11-06

申请号：PCT/NL2008/050238

申请日：2008-04-23

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevitch ,  SCHUURMANS, Frank, Jeroen, Pieter ,  KRIVTSUN, Vladimir, Mihailovitch ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus

Inventor： BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevitch ,  SCHUURMANS, Frank, Jeroen, Pieter ,  KRIVTSUN, Vladimir, Mihailovitch ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus

IPC: G21K7/00

CPC classification number: G21K7/00

Abstract: An extreme ultraviolet (EUV) microscope configured to analyze a sample (5). The microscope includes a source (2) of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2 - 6 nm, and an optical system (3) constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating (6) from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in- phase reflection of at least a portion of the radiation in the range of about 2 - 6 nm.

Abstract translation: 配置用于分析样品（5）的极紫外（EUV）显微镜。 显微镜包括EUV辐射源（2），其被构造和布置成产生波长至少在约2-6nm范围内的EUV辐射;以及光学系统（3），被构造和布置成用 EUV辐射并从样品中收集辐射（6）。 光学系统布置有至少一个反射镜，其包括多层结构，用于在约2-6nm的范围内的至少一部分辐射的同相反射。

公开(公告)号：WO2008100143A1

公开(公告)日：2008-08-21

申请号：PCT/NL2008/050082

申请日：2008-02-14

Applicant: ASML NETHERLANDS B.V. ,  KRIVTSUN, Vladimir Mihailovitch ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOROP, Evgeny Dmitrievich ,  KOSHELEV, Konstantin Nikolaevitch ,  SIDELNIKOV, Yurii Victorovitch ,  YAKUSHEV, Oleg

Inventor： KRIVTSUN, Vladimir Mihailovitch ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOROP, Evgeny Dmitrievich ,  KOSHELEV, Konstantin Nikolaevitch ,  SIDELNIKOV, Yurii Victorovitch ,  YAKUSHEV, Oleg

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source (24), and a foil trap (25) provided with a plurality of thin foils (20) that extend substantially parallel to the direction of radiation from the plasma source (20). A grid (22) is disposed between the plasma radiation source (20) and the foil trap (24). A space is located between the grid (22) and the foil trap (24). The apparatus also include an electrical potential application circuit (28) that is constructed and arranged to apply an electrical potential to the grid (22) so that the grid (22) repels electrons emitted by the plasma radiation source (22) and creates a positive space charge between the grid (20) and the foil trap (24) to deflect ions emitted by the plasma radiation source (20) to the foil trap (24).

Abstract translation: 用于形成电磁辐射束的装置包括等离子体辐射源（24）和设置有多个薄箔（20）的箔捕获器（25），其基本平行于等离子体源（20）的辐射方向延伸 ）。 栅极（22）设置在等离子体辐射源（20）和箔阱（24）之间。 一个空间位于网格（22）和箔片陷阱（24）之间。 该装置还包括电位施加电路（28），其构造和布置成向电网（22）施加电势，使得电网（22）排斥由等离子体辐射源（22）发射的电子并产生正的 格栅（20）和箔捕获器（24）之间的空间电荷以将由等离子体辐射源（20）发射的离子偏转到箔捕获器（24）。

公开(公告)号：WO2008079007A1

公开(公告)日：2008-07-03

申请号：PCT/NL2007/050691

申请日：2007-12-21

Applicant: ASML NETHERLANDS B.V. ,  SOER, Wouter Anthon ,  BANINE, Vadim Yevgenyevich ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus

Inventor： SOER, Wouter Anthon ,  BANINE, Vadim Yevgenyevich ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus

IPC: G03F1/14

CPC classification number: G03F7/70283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/34 ,  G21K1/062 ,  G21K2201/067

Abstract: A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change material that is capable of locally undergoing an induced structural phase change into respective ones of a plurality of stable and/or metastable states. Furthermore, the patterning device comprises a radiation reflective structure with periodically arranged layers adjacent to the layer of phase-change material. The radiation reflective structures do not partake in the phase changes. By locally changing the phase of the phase-change material, the reflectivity of the whole structure is modified, for example due to thickness changes in the layer of phase-change material that lead to destructive interference of different components of the reflected light or due to changes in surface roughness of the radiation reflective structure.

Abstract translation: 用于光刻设备的图案形成装置用于通过在从图案形成装置反射期间将辐射束赋予横截面图案来形成图案化的辐射束。 图案形成装置包括相变材料层，其能够局部地经历诱发的结构相变为多个稳定和/或亚稳态中的相应的。 此外，图案形成装置包括具有与相变材料层相邻的周期性排列的层的辐射反射结构。 辐射反射结构不参与相位变化。 通过局部改变相变材料的相位，整个结构的反射率被改变，例如由于相变材料层中的厚度变化导致反射光的不同分量的破坏性干扰或由于 辐射反射结构的表面粗糙度变化。

公开(公告)号：WO2008072959A3

公开(公告)日：2008-06-19

申请号：PCT/NL2007/050598

申请日：2007-11-27

Applicant: ASML NETHERLANDS B.V. ,  WASSINK, Arnoud Cornelis ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOSHELEV, Konstantin Nikolaevitch ,  CADEE, Theodorus Petrus Maria ,  KRIVTSUN, Vladimir Mihailovitch ,  KLUNDER, Derk Jan Wilfred ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BROM, Paul Peter Anna Antonius ,  SOER, Wouter Anthon ,  GLUSHKOV, Denis

Inventor： WASSINK, Arnoud Cornelis ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOSHELEV, Konstantin Nikolaevitch ,  CADEE, Theodorus Petrus Maria ,  KRIVTSUN, Vladimir Mihailovitch ,  KLUNDER, Derk Jan Wilfred ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BROM, Paul Peter Anna Antonius ,  SOER, Wouter Anthon ,  GLUSHKOV, Denis

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/00

Abstract: A radiation system (1) for generating a beam of radiation (2) that defines an optical axis (3) is provided. The radiation system (1) includes a plasma produced discharge source (4) for generating EUV radiation. The discharge source (4) includes a pair of electrodes (5) constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes (5) so as to provide a discharge (7) in the plasma between the electrodes (5). The radiation system (1) also includes a debris catching shield (11) for catching debris (8) from the electrodes (5). The debris catching shield (11) is constructed and arranged to shield the electrodes (5) from a line of sight provided in a predetermined spherical angle relative the optical axis (3), and to provide an aperture (12) to a central area (10) between the electrodes (5) in the line of sight.

公开(公告)号：WO2008069654A1

公开(公告)日：2008-06-12

申请号：PCT/NL2007/050592

申请日：2007-11-26

Applicant: ASML NETHERLANDS B.V. ,  IVANOV, Vladimir, Vitalevitch ,  BANINE, Vadim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevitch ,  KRIVTSUN, Vladimir Mihailovitch

Inventor： IVANOV, Vladimir, Vitalevitch ,  BANINE, Vadim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevitch ,  KRIVTSUN, Vladimir Mihailovitch

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005

Abstract: A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

Abstract translation: 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。

公开(公告)号：WO2008007952A2

公开(公告)日：2008-01-17

申请号：PCT/NL2007050318

申请日：2007-06-28

Applicant: ASML NETHERLANDS BV ,  VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SOER WOUTER ANTHON

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SOER WOUTER ANTHON

IPC: G03F7/20 ,  B08B7/00

CPC classification number: G03F7/70925 ,  G03F7/70916

Abstract: A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

Abstract translation: 光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。 该表面具有吸气剂的功能。 在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。 第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。

公开(公告)号：WO2006135230A2

公开(公告)日：2006-12-21

申请号：PCT/NL2006/000291

申请日：2006-06-13

Applicant: ASML Netherlands B.V. ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  KLUNDER, Derk , Jan, Wilfred

Inventor： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  KLUNDER, Derk , Jan, Wilfred

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces

Abstract translation: 公开了一种光刻设备。 该装置包括用于供应氢自由基的源，与源结合使用的引导件，用于将氢自由基引导到由氢自由基靶向的施加表面。 引导件具有氢自由基复合常数小于0.2的涂层。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用

公开(公告)号：WO2006049489A1

公开(公告)日：2006-05-11

申请号：PCT/NL2005/000680

申请日：2005-09-19

Applicant: ASML NETHERLANDS B.V. ,  BAKKER, Levinus, Pieter ,  BANINE, Vadim, Yevgenyevich ,  WASSINK, Arnoud, Cornelis

Inventor： BAKKER, Levinus, Pieter ,  BANINE, Vadim, Yevgenyevich ,  WASSINK, Arnoud, Cornelis

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70058

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam substantially from a light emitting point. The illumination system includes a contaminant trapping system (CTS) . The trapping system includes a contaminant trap having a central zone (CZ) and a peripheral zone (PZ) . The trap includes a plurality of platelets (PF) that extend substantially outwards through the peripheral zone. The light emitting point (LEP) is in a plane with which the platelets coincide. Each of the platelets has a normal (N) with a component (Ctcz) directed towards the central zone.

Abstract translation: 光刻设备包括被配置为基本上从发光点调节辐射束的照明系统。 照明系统包括污染物捕集系统（CTS）。 捕集系统包括具有中心区（CZ）和周边区（PZ）的污染物捕集器。 捕获器包括多个基本上向外延伸通过周边区域的血小板（PF）。 发光点（LEP）处于与血小板重合的平面。 每个血小板具有正常（N），其中成分（Ctcz）指向中心区。