公开(公告)号：WO2003096497A1

公开(公告)日：2003-11-20

申请号：PCT/US2003/012819

申请日：2003-04-23

Applicant: CYMER, INC. ,  YAGER, Thomas, A. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  PAN, Xiaojiang ,  MELCHIOR, John, T. ,  ALGOTS, John, M. ,  BALL, Matthew ,  ERSHOV, Alexander, I. ,  FLEUROV, Vladimir ,  GILLESPIE, Walter, D. ,  GLATZEL, Holger, K. ,  LUBLIN, Leonard ,  MARSH, Elizabeth ,  MORTON, Richard, D. ,  UJAZDOWKI, Richard, C. ,  WARKENTIN, David, J. ,  WEBB, R., Kyle

Inventor： YAGER, Thomas, A. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  PAN, Xiaojiang ,  MELCHIOR, John, T. ,  ALGOTS, John, M. ,  BALL, Matthew ,  ERSHOV, Alexander, I. ,  FLEUROV, Vladimir ,  GILLESPIE, Walter, D. ,  GLATZEL, Holger, K. ,  LUBLIN, Leonard ,  MARSH, Elizabeth ,  MORTON, Richard, D. ,  UJAZDOWKI, Richard, C. ,  WARKENTIN, David, J. ,  WEBB, R., Kyle

IPC: H01S3/22

CPC classification number: G03F7/7055 ,  H01S3/005 ,  H01S3/225

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF 2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75×10 6 Watts/cm 2 and with peak intensity or greater 3.5×10 6 Watts/cm 2 for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.

Abstract translation: 本发明提供了用于产生高重复率高功率输出光束（38）的模块化高重复率紫外线气体放电激光系统（图1B）的长寿命光学器件。 本发明包括由原始激光系统的输出光束（14C）的高脉冲强度部分（10）（26）中的CaF2光学器件（4260）（422）（424）（426）发现的由申请人发现的表面损伤问题的解决方案 。 实施例包括具有用于束输送数十亿个输出激光脉冲（38）的光束指向控制（40A）（40B）（6））的封闭（4）和净化光束路径（14C）。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲（14A），平均输出脉冲强度大于1.75×10 6瓦/ cm 2，峰值强度或更大的3.5×10 6 与现有技术的元件和模块相比，在这些脉冲强度仅在几分钟之后就失败了，数十亿脉冲（14A）的功率>瓦特/平方厘米（2）。

公开(公告)号：WO03096497A8

公开(公告)日：2004-12-29

申请号：PCT/US0312819

申请日：2003-04-23

Applicant: CYMER INC ,  YAGER THOMAS A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  PAN XIAOJIANG ,  MELCHIOR JOHN T ,  ALGOTS JOHN M ,  BALL MATTHEW ,  ERSHOV ALEXANDER I ,  FLEUROV VLADIMIR ,  GILLESPIE WALTER D ,  GLATZEL HOLGER K ,  LUBLIN LEONARD ,  MARSH ELIZABETH ,  MORTON RICHARD G ,  UJAZDOWKI RICHARD C ,  WARKENTIN DAVID J ,  WEBB R KYLE

Inventor： YAGER THOMAS A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  PAN XIAOJIANG ,  MELCHIOR JOHN T ,  ALGOTS JOHN M ,  BALL MATTHEW ,  ERSHOV ALEXANDER I ,  FLEUROV VLADIMIR ,  GILLESPIE WALTER D ,  GLATZEL HOLGER K ,  LUBLIN LEONARD ,  MARSH ELIZABETH ,  MORTON RICHARD G ,  UJAZDOWKI RICHARD C ,  WARKENTIN DAVID J ,  WEBB R KYLE

IPC: H01S3/034 ,  G03F7/20 ,  H01S3/00 ,  H01S3/225 ,  H01S3/22

CPC classification number: G03F7/7055 ,  H01S3/005 ,  H01S3/225

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75x10 Watts/cm and with peak intensity or greater 3.5x10 Watts/cm for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.

Abstract translation: 本发明提供了用于产生高重复率高功率输出光束（38）的模块化高重复率紫外线气体放电激光系统（图1B）的长寿命光学器件。 本发明包括由原始激光系统的输出光束（14C）的高脉冲强度部分（10）（26）中的CaF2光学器件（4260）（422）（424）（426）发现的由申请人发现的表面损伤问题的解决方案 。 实施例包括具有用于束输送数十亿个输出激光脉冲（38）的光束指向控制（40A）（40B）（6））的封闭（4）和净化光束路径（14C）。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲（14A），平均输出脉冲强度大于1.75×10 6瓦/ cm 2，峰值强度或更大的3.5×10 6 与现有技术的元件和模块相比，在这些脉冲强度仅在几分钟之后就失败了，数十亿脉冲（14A）的功率>瓦特/平方厘米（2）。

公开(公告)号：WO2002093702A1

公开(公告)日：2002-11-21

申请号：PCT/US2002/012200

申请日：2002-04-17

Applicant: CYMER, INC. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

Inventor： PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

IPC: H01S3/22

CPC classification number: G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.

Abstract translation: 具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。 通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。 优选实施例包括热去耦LNP孔元件（70A），以最小化LNP（54）中的热失真。 该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 波导计（7）具有暴露于输出激光束的隔室的特殊吹扫。