公开(公告)号：WO2008010927A2

公开(公告)日：2008-01-24

申请号：PCT/US2007/015653

申请日：2007-07-09

Applicant: CYMER, INC. ,  MELCHIOR, John, T. ,  UJAZDOWSKI, Richard, C. ,  HOWEY, James, K.

Inventor： MELCHIOR, John, T. ,  UJAZDOWSKI, Richard, C. ,  HOWEY, James, K.

IPC: H01S3/08

CPC classification number: H01S3/034 ,  H01S3/0346 ,  H01S3/225

Abstract: A window assembly for a pressurized laser discharge chamber is disclosed and may include a housing that is formed with a recess. The assembly may also include an optic having a first side that is exposed to chamber pressure and an opposed second side, and a compliant member that may be positioned in the recess to space the second side of the optic from the housing under normal chamber operating pressures. For the assembly, the compliant member may be compressible to allow the optic to mechanically abut the assembly housing during a chamber overpressure.

Abstract translation: 公开了一种用于加压激光放电室的窗组件，其可以包括形成有凹部的壳体。 该组件还可以包括具有暴露于腔室压力的第一侧和相对的第二侧的光学部件，以及柔性构件，该柔性构件可以定位在凹槽中以在正常室操作压力下将光学器件的第二侧与壳体隔开 。 对于该组件，柔性构件可以是可压缩的以允许光学元件在腔室超压期间机械地邻接组件壳体。

公开(公告)号：WO2007149282A3

公开(公告)日：2008-11-06

申请号：PCT/US2007013875

申请日：2007-06-11

Applicant: CYMER INC ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N ,  REILEY DANIEL J ,  HOWEY JAMES K ,  AGULIAR STANLEY C

Inventor： FOMENKOV IGOR V ,  PARTLO WILLIAM N ,  REILEY DANIEL J ,  HOWEY JAMES K ,  AGULIAR STANLEY C

IPC: H01S3/22

CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/2256

Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

Abstract translation: 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。

公开(公告)号：WO2005104311A2

公开(公告)日：2005-11-03

申请号：PCT/US2005/006932

申请日：2005-03-04

Applicant: CYMER, INC. ,  SANDSTROM, Richard L. ,  ALGOTS, J. Martin ,  BROWN, Joshua C. ,  CYBULSKY, Raymond F. ,  DUNLOP, John ,  HOWEY, James K. ,  MORTON, Richard G. ,  PAN, Xiaojiang J. ,  PARTLO, William N. ,  PUTRIS, Firas F. ,  WATSON, Tom A. ,  YAGER, Thomas A.

Inventor： SANDSTROM, Richard L. ,  ALGOTS, J. Martin ,  BROWN, Joshua C. ,  CYBULSKY, Raymond F. ,  DUNLOP, John ,  HOWEY, James K. ,  MORTON, Richard G. ,  PAN, Xiaojiang J. ,  PARTLO, William N. ,  PUTRIS, Firas F. ,  WATSON, Tom A. ,  YAGER, Thomas A.

IPC: H01S3/22

CPC classification number: H01S3/02 ,  G01J1/429 ,  G01J9/02 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed which may comprise a fast moving angularly positionable tuning mirror comprising: a mirror mounting frame comprising a first material and a relatively flat mounting surface area; a reflective optic comprising a second material having a coefficient of thermal expansion different from that of the first material of the mounting frame; at least two attachment points of attachment between the mounting frame and the reflective optic on the mounting frame surface; and, at least one flexure mount formed in the mounting frame that is flexible in a flexure axis corresponding to a longitudinal axis of thermal expansion of the mounting frame and the reflective optic, positioned at one of the at least two points of attachment. The flexure mount may comprise: a flexure body formed from the material of the mirror mounting frame and separated from the material of the mirror mounting frame to allow relative movement between the flexure and the mirror mounting frame; at least one flexure arm formed from the material of the mirror mounting frame and attached at one end to the mirror mounting frame and at the other end to the flexure. The apparatus and method may further comprise a flexure force mechanism made of the second material or a third material having a coefficient of thermal expansion that is essentially the same as that of the second material; the flexure force mechanism comprising an elongated rod; a flexure force mechanism slot generally aligned with the flexure axis and sized to snuggly fit the flexure force mechanism between a slot wall at one end of the flexure force mechanism slot and the flexure body at the other end of the flexure force mechanism slot. The force mechanism may pre-stress the flexure. The mirror may be a grating. The grating may have a metallic reflective surface and a protective coating over the reflective coating comprising a dense glassy material that is essentially non-porous to undesired contaminants exposure of which to the reflective coating is desired to be prevented, which may comprise an amorphous silica, a doped amorphous silica, which may be halide doped and the halide may be fluorine. The grating may be actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge.

Abstract translation: 公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其可以包括快速移动的可角度定位的调谐镜，其包括：反射镜安装框架，其包括第一材料和相对平坦的安装表面区域; 反射光学元件，包括具有不同于所述安装框架的第一材料的热膨胀系数的第二材料; 在安装框架和安装框架表面上的反射光学器件之间的至少两个连接附接点; 以及形成在所述安装框架中的至少一个弯曲安装座，所述至少一个弯曲安装件在弯曲轴线上柔性，所述弯曲轴线对应于所述安装框架和所述反射式光学器件的热膨胀的纵向轴线，所述热膨胀轴线位于所述至少两个连接点中的一个上。 挠曲安装件可以包括：由反射镜安装框架的材料形成并且与镜面安装框架的材料分离的弯曲体，以允许挠曲件和反射镜安装框架之间的相对移动; 至少一个弯曲臂由反射镜安装框架的材料形成并且在一端附接到反射镜安装框架，另一端连接到弯曲部。 该装置和方法还可以包括由第二材料制成的挠曲力机构或具有与第二材料基本上相同的热膨胀系数的第三材料; 所述挠曲力机构包括细长杆; 弯曲力机构槽通常与弯曲轴线对准并且尺寸设计成使挠曲力机构紧贴在弯曲力机构槽的一端处的狭槽壁和弯曲力机构槽的另一端处的挠曲体之间。 力机构可以预应力挠曲。 镜子可能是光栅。 光栅可以具有金属反射表面并且在反射涂层上方具有保护涂层，该保护涂层包含致密的玻璃质材料，其基本上是无孔的，以期望防止对反射涂层的不期望的污染物暴露，其可以包含无定形二氧化硅， 掺杂的无定形二氧化硅，其可以是卤化物掺杂的，并且卤化物可以是氟。 可以使用电磁感应元件或磁敏元件来主动调谐光栅。 反射层中金属的氧化物可以通过氢气清除来除去。

公开(公告)号：WO2007149282A2

公开(公告)日：2007-12-27

申请号：PCT/US2007/013875

申请日：2007-06-11

Applicant: CYMER, INC. ,  FOMENKOV, Igor, V. ,  PARTLO, William, N. ,  REILEY, Daniel, J. ,  HOWEY, James, K. ,  AGULIAR, Stanley, C.

Inventor： FOMENKOV, Igor, V. ,  PARTLO, William, N. ,  REILEY, Daniel, J. ,  HOWEY, James, K. ,  AGULIAR, Stanley, C.

IPC: H01S3/10

CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/2256

Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

Abstract translation: 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。

公开(公告)号：WO2008010927A3

公开(公告)日：2008-11-27

申请号：PCT/US2007015653

申请日：2007-07-09

Applicant: CYMER INC ,  MELCHIOR JOHN T ,  UJAZDOWSKI RICHARD C ,  HOWEY JAMES K

Inventor： MELCHIOR JOHN T ,  UJAZDOWSKI RICHARD C ,  HOWEY JAMES K

IPC: H01S3/08

CPC classification number: H01S3/034 ,  H01S3/0346 ,  H01S3/225

Abstract: A window assembly for a pressurized laser discharge chamber is disclosed and may include a housing that is formed with a recess. The assembly may also include an optic having a first side that is exposed to chamber pressure and an opposed second side, and a compliant member that may be positioned in the recess to space the second side of the optic from the housing under normal chamber operating pressures. For the assembly, the compliant member may be compressible to allow the optic to mechanically abut the assembly housing during a chamber overpressure.

Abstract translation: 公开了一种用于加压激光放电室的窗组件，并且可以包括形成有凹部的壳体。 组件还可以包括具有暴露于腔室压力的第一侧面和相对的第二侧面的光学元件，以及柔性构件，其可以定位在凹部中，以在正常室操作压力下将光学元件的第二侧与壳体间隔开 。 对于组件，柔性构件可以是可压缩的，以允许光学器件在腔室超压期间机械地邻接组件壳体。

公开(公告)号：WO2002093702A1

公开(公告)日：2002-11-21

申请号：PCT/US2002/012200

申请日：2002-04-17

Applicant: CYMER, INC. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

Inventor： PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

IPC: H01S3/22

CPC classification number: G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.

Abstract translation: 具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。 通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。 优选实施例包括热去耦LNP孔元件（70A），以最小化LNP（54）中的热失真。 该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 波导计（7）具有暴露于输出激光束的隔室的特殊吹扫。

公开(公告)号：WO2005104311A3

公开(公告)日：2007-03-22

申请号：PCT/US2005006932

申请日：2005-03-04

Applicant: CYMER INC ,  SANDSTROM RICHARD L ,  ALGOTS J MARTIN ,  BROWN JOSHUA C ,  CYBULSKY RAYMOND F ,  DUNLOP JOHN ,  HOWEY JAMES K ,  MORTON RICHARD G ,  PAN XIAOJIANG J ,  PARTLO WILLIAM N ,  PUTRIS FIRAS F ,  WATSON TOM A ,  YAGER THOMAS A

Inventor： SANDSTROM RICHARD L ,  ALGOTS J MARTIN ,  BROWN JOSHUA C ,  CYBULSKY RAYMOND F ,  DUNLOP JOHN ,  HOWEY JAMES K ,  MORTON RICHARD G ,  PAN XIAOJIANG J ,  PARTLO WILLIAM N ,  PUTRIS FIRAS F ,  WATSON TOM A ,  YAGER THOMAS A

IPC: H01S3/22 ,  G01B9/02 ,  G01J1/42 ,  G01J9/02 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/10 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/02 ,  G01J1/429 ,  G01J9/02 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount framed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may prestress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto- sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.

Abstract translation: 公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座 框架在柔性的安装框架中，挠性臂将挠性件连接到安装框架。 该装置可以包括具有细长杆的挠曲力机构。 力机构可以预应力挠曲。 镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。 光栅可能会使用电磁感应元件或磁敏元件进行主动调谐。 可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。