Abstract:
Transparent conductors and methods for fabricating transparent conductors are provided. In one exemplary embodiment, a method for fabricating a transparent conductor comprises forming a dispersion comprising a plurality of conductive components and a solvent, applying the dispersion to a substrate in an environment having a predetermined atmospheric humidity that is based on a selected surface resistivity of the transparent conductor, and causing the solvent to at least partially evaporate such that the plurality of conductive components remains overlying the substrate.
Abstract:
Compositions comprising at least one conductive nanomaterial and at least one rheology control additive are disclosed. These compositions can be used to form a film for uses requiring sufficient conductivity and light transparency. Methods of forming a conductive composition include: providing at least one conductive nanomaterial, providing at least one rheology control additive, and blending the at least one conductive nanomaterial and the at least one rheology control additive together to form the conductive composition. Methods of forming patterned transparent conductive coatings include: providing and applying a layer comprising at least one photosensitive or photoimageable composition to a surface, providing and applying a layer comprising at least one conductive nanomaterial and at least one rheology control additive, exposing and developing the layered material, and treating the layer comprising the at least one rheology control additive in order to remove at least part of the rheology control additive. Coating compositions, films, patterned films and structures containing these films and patterned films are also described.
Abstract:
Transparent conductive materials, articles and films are described herein a) that are easily and efficiently produced, b) can be produced prior to application or in situ, c) are easily applied to surfaces and substrates or formed into articles, d) can be produced and used with materials and methods that are generally accepted by the flat panel display (FPD) industry, along with other industries that produce and utilize microelectronics, e) can be tailored to be photoimageable and patternable using accepted photolithography techniques, f) have superior optical properties and have superior film forming properties, including better adhesion to other adjacent layers, the ability to be laid down in very or ultra thin layers and the ability to remain transparent when laid down as thicker layers. Methods of producing and using these transparent conductive materials are also disclosed.
Abstract:
A thruster (10) for providing thrust for spacecraft positioning, which has a propellant reservoir (12) for storing propellant, a reaction chamber (20) for discharging a vapor for providing thrust, a pump module (14) comprising one or more micropumps (50) for drawing propellant from the reservoir (12) and for systematically metering propellant to the reaction chamber (20) in a controlled manner, and a controller (16) for actuating the pump module (14).
Abstract:
Transparent conductors and methods for fabricating transparent conductors are provided. In one exemplary embodiment, a method for fabricating a transparent conductor comprises forming a dispersion comprising a plurality of conductive components and a solvent, applying the dispersion to a substrate in an environment having a predetermined atmospheric humidity that is based on a selected surface resistivity of the transparent conductor, and causing the solvent to at least partially evaporate such that the plurality of conductive components remains overlying the substrate.
Abstract:
Transparent conductors and methods for fabricating transparent conductors are provided. A method for fabricating a transparent conductor comprises providing a stretchable transparent substrate. A dispersion comprising a plurality of conductive elements and a solvent is formed. The dispersion is applied overlying the stretchable transparent substrate. The solvent is at least partially evaporated to form a transparent conductive coating on the stretchable transparent substrate and the substrate and the transparent conductive coating are stretched.
Abstract:
Transparent conductors and methods for fabricating transparent conductors are provided. A method for fabricating a transparent conductor comprises providing a stretchable transparent substrate. A dispersion comprising a plurality of conductive elements and a solvent is formed. The dispersion is applied overlying the stretchable transparent substrate. The solvent is at least partially evaporated to form a transparent conductive coating on the stretchable transparent substrate and the substrate and the transparent conductive coating are stretched.
Abstract:
Compositions comprising at least one conductive nanomaterial and at least one rheology control additive are disclosed. These compositions can be used to form a film for uses requiring sufficient conductivity and light transparency. Methods of forming a conductive composition include: providing at least one conductive nanomaterial, providing at least one rheology control additive, and blending the at least one conductive nanomaterial and the at least one rheology control additive together to form the conductive composition. Methods of forming patterned transparent conductive coatings include: providing and applying a layer comprising at least one photosensitive or photoimageable composition to a surface, providing and applying a layer comprising at least one conductive nanomaterial and at least one rheology control additive, exposing and developing the layered material, and treating the layer comprising the at least one rheology control additive in order to remove at least part of the rheology control additive. Coating compositions, films, patterned films and structures containing these films and patterned films are also described.
Abstract:
Sintered silicon nitride products comprising predominantly β-silicon nitride grains in combination with from about 0.1 to 30 mole % silicon carbide, and grain boundary secondary phases of scandium oxide and scandium disilicate. Such products have high fracture toughness, resistance to recession, and resistance to oxidation at temperatures of at least 1500°C. Methods for preparing sintered silicon nitride products are also disclosed.