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    DENSE SILICON NITRIDE BODY HAVING HIGH STRENGTH, HIGH WEIBULL MODULUS AND HIGH FRACTURE TOUGHNESS
    1.
    发明申请
    DENSE SILICON NITRIDE BODY HAVING HIGH STRENGTH, HIGH WEIBULL MODULUS AND HIGH FRACTURE TOUGHNESS 审中-公开
    具有高强度，高WEIBULL模块和高断裂韧性的DENSE硅酸盐体

    公开(公告)号：WO2011142789A3

    公开(公告)日：2014-03-27

    申请号：PCT/US2011000104

    申请日：2011-01-20

    Applicant: CERADYNE INC ,  MIKIJELJ BILJANA

    Inventor： MIKIJELJ BILJANA

    IPC: C04B35/00

    CPC classification number: C04B35/584 ,  C04B35/593 ,  C04B35/5935 ,  C04B35/6261 ,  C04B35/645 ,  C04B35/6455 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3215 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3229 ,  C04B2235/3873 ,  C04B2235/3895 ,  C04B2235/5409 ,  C04B2235/668 ,  C04B2235/767 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/85 ,  C04B2235/96 ,  C04B2235/9607

    Abstract: Silicon nitride materials with high strength, fracture toughness values, and Weibull moduli simultaneously, due to unique large grain reinforcing microstructures and well engineered grain boundary compositions. The invention demonstrates that, surprisingly and contrary to prior art, a silicon nitride material can be made which simultaneously has high strength above about 850-900 MPa, a Weibull above about 15 and high fracture toughness (above about 8 and 9 MPa.m1/2), and has reinforcing grains longer than 5 μm, typically longer than 10 μm in the microstructure without compromising its properties and reliability. The product of this invention can be processed using a variety of densification methods, including gas-pressure sintering, hot pressing, hot isostatic pressing, but is not limited to these, and does not require multiple heat treatments for all of these features to be achieved.

    Abstract translation: 由于独特的大颗粒增强微结构和精心设计的晶界组成，同时具有高强度，断裂韧性值和威布尔模量的氮化硅材料。 本发明表明，与现有技术相反，可以制造氮化硅材料，其同时具有高于约850-900MPa的高强度，高于约15的威布尔和高断裂韧性（高于约8和9MPa.m1 / 2），并且在不损害其性能和可靠性的情况下，在微结构中具有长于5μm的增强晶粒，通常长于10μm。 本发明的产品可以使用各种致密化方法进行加工，包括气压烧结，热压，热等静压，但不限于此，并且不需要多次热处理以实现所有这些特征 。

    LABORATORY HEAT PRESS
    2.
    发明申请
    LABORATORY HEAT PRESS 审中-公开
    实验室热压机

    公开(公告)号：WO2013089650A1

    公开(公告)日：2013-06-20

    申请号：PCT/SK2011/000024

    申请日：2011-12-13

    Applicant: ÚSTAV ANORGANICKEJ CHEMIE SAV ,  CENTRUM VEDECKO-TECHNICKYCH INFORMACII SR

    Inventor： ŠAJGALIK, Pavol ,  HNATKO, Miroslav ,  PÁNEK, Zdeno

    IPC: B30B11/02 ,  B30B11/00 ,  B30B15/34

    CPC classification number: B30B15/34 ,  B22F3/03 ,  B22F3/14 ,  B28B3/025 ,  B30B11/005 ,  B30B11/027 ,  C04B35/10 ,  C04B35/46 ,  C04B35/48 ,  C04B35/505 ,  C04B35/5607 ,  C04B35/5611 ,  C04B35/5626 ,  C04B35/575 ,  C04B35/58014 ,  C04B35/5805 ,  C04B35/58071 ,  C04B35/58078 ,  C04B35/581 ,  C04B35/583 ,  C04B35/593 ,  C04B35/597 ,  C04B35/645 ,  C04B2235/6562 ,  C04B2235/96

    Abstract: Laboratory heat press consists of furnace part equipped with dilatometer which is placed beneath removable double-acting pneumatic cylinder anchored on four shafts, of power supply and of computer which regulates process and collects data, while in the working space is situated graphite press die with sample, which is placed on sliding piston holder and the device is equipped with control electronics. Heating equipment is graphite element, and around the element are situated graphite shields made from solid graphite and graphite wool insulation. Outer shell of furnace and both flanges are water cooled. Flanges are equipped with holes for thrust pistons and the furnace shell contains hole for connecting the vacuum pump and hole for installation of the pyrometer. Graphite pressing die with sample is equipped with pistons, which are influenced by power from double-acting pneumatic cylinder, while on the both graphite pistons are graphite radiative rings and between them is graphite wool.

    Abstract translation: 实验室热压机由炉体部分组成，其内装有膨胀计，该膨胀计位于可移动双作用气缸下方，锚固在四个轴上，电源和计算机进行调节过程并收集数据，而在工作空间内设有石墨压模 ，其放置在滑动活塞保持器上，并且该装置配备有控制电子器件。 加热设备是石墨元件，元件周围设有由固体石墨和石墨棉绝缘材料制成的石墨屏蔽。 炉外壳和两个法兰都是水冷的。 法兰装有推力活塞孔，炉壳包含用于连接真空泵和孔的孔，用于安装高温计。 带样品的石墨压模配有活塞，受双作用气动缸的动力影响，而两个石墨活塞均为石墨辐射环，两者之间为石棉。

    DENSE SILICON NITRIDE BODY HAVING HIGH STRENGTH, HIGH WEIBULL MODULUS AND HIGH FRACTURE TOUGHNESS
    3.
    发明申请
    DENSE SILICON NITRIDE BODY HAVING HIGH STRENGTH, HIGH WEIBULL MODULUS AND HIGH FRACTURE TOUGHNESS 审中-公开
    具有高强度，高WEIBULL模块和高断裂韧性的DENSE硅酸盐体

    公开(公告)号：WO2011142789A2

    公开(公告)日：2011-11-17

    申请号：PCT/US2011/000104

    申请日：2011-01-20

    Applicant: CERADYNE, INC. ,  MIKIJELJ, Biljana

    Inventor： MIKIJELJ, Biljana

    IPC: C04B35/584

    CPC classification number: C04B35/584 ,  C04B35/593 ,  C04B35/5935 ,  C04B35/6261 ,  C04B35/645 ,  C04B35/6455 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3215 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3229 ,  C04B2235/3873 ,  C04B2235/3895 ,  C04B2235/5409 ,  C04B2235/668 ,  C04B2235/767 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/85 ,  C04B2235/96 ,  C04B2235/9607

    Abstract: Silicon nitride materials with high strength, fracture toughness values, and Weibull moduli simultaneously, due to unique large grain reinforcing microstructures and well engineered grain boundary compositions. The invention demonstrates that, surprisingly and contrary to prior art, a silicon nitride material can be made which simultaneously has high strength above about 850-900 MPa, a Weibull above about 15 and high fracture toughness (above about 8 and 9 MPa.m 1/2 ), and has reinforcing grains longer than 5 μm, typically longer than 10 μm in the microstructure without compromising its properties and reliability. The product of this invention can be processed using a variety of densification methods, including gas-pressure sintering, hot pressing, hot isostatic pressing, but is not limited to these, and does not require multiple heat treatments for all of these features to be achieved.

    Abstract translation: 由于独特的大颗粒增强微结构和精心设计的晶界组成，同时具有高强度，断裂韧性值和威布尔模量的氮化硅材料。 本发明表明，与现有技术相反，可以制造氮化硅材料，其同时具有高于约850-900MPa的高强度，高于约15的威布尔和高断裂韧性（高于约8和9MPa.m1 / 2），并且在不损害其性能和可靠性的情况下，在微结构中具有长于5μm的增强晶粒，通常长于10μm。 本发明的产品可以使用各种致密化方法进行加工，包括气压烧结，热压，热等静压，但不限于此，并且不需要多次热处理以实现所有这些特征 。

    HOMOGENEISATION HAUTE PRESSION AVEC UNE VALVE EN NITRURE DE SILICIUM
    4.
    发明申请
    HOMOGENEISATION HAUTE PRESSION AVEC UNE VALVE EN NITRURE DE SILICIUM 审中-公开
    用氮化硅阀进行高压均质化

    公开(公告)号：WO2010130938A1

    公开(公告)日：2010-11-18

    申请号：PCT/FR2010/050902

    申请日：2010-05-10

    Applicant: SANOFI-AVENTIS ,  NAKACH, Mostafa

    Inventor： NAKACH, Mostafa

    IPC: F16K25/00

    CPC classification number: F16K25/005 ,  B01F5/0663 ,  B01F5/10 ,  C04B35/584 ,  C04B35/593 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3232 ,  C04B2235/77 ,  C04B2235/96

    Abstract: L'invention est relative à l'utilisation d'une valve d'homogénéisation constituée d'un clapet (1), d'un anneau de choc (3) et d'un siège pour la préparation par la technologie haute-pression à valve d'une nanosuspension d'un principe actif pharmaceutique solide, caractérisée en ce que le matériau constituant le clapet, le siège et éventuellement l'anneau de choc et/ou la surface extérieure d'au moins l'un desdits éléments comprend comme composant majoritaire le nitrure de silicium fritte ou pressé à chaud. L'invention est aussi relatif à un procédé de préparation d'une nanosuspension d'un principe actif pharmaceutique solide par la technologie d'homogénéisation par haute pression du type à valve.

    Abstract translation: 本发明涉及使用均质阀，其包括挡板浇口（1），冲击环（3）和座，以便使用高压阀技术制备固体药物活性成分的纳米悬浮液，其特征在于 构成挡板门，座和任选的冲击环和/或至少一个所述元件的外表面的材料包括烧结或热压氮化硅作为主要成分。 本发明还涉及使用高压阀匀浆技术制备固体药物活性成分的纳米悬浮液的方法。

    HIGH LIFETIME CONSUMABLE SILICON NITRIDE-SILICON DIOXIDE PLASMA PROCESSING COMPONENTS
    5.
    发明申请
    HIGH LIFETIME CONSUMABLE SILICON NITRIDE-SILICON DIOXIDE PLASMA PROCESSING COMPONENTS 审中-公开
    高寿命硅氧化硅二氧化硅等离子体加工组件

    公开(公告)号：WO2009058235A2

    公开(公告)日：2009-05-07

    申请号：PCT/US2008/012173

    申请日：2008-10-27

    Applicant: LAM RESEARCH CORPORATION ,  CERADYNE INC. ,  TAYLOR, Travis R. ,  SRINIVASAN, Mukund ,  KADKHODAYAN, Bobby ,  RAMANUJAM, K. Y. ,  MIKIJELJ, Biljana ,  WU, Shanghua

    Inventor： TAYLOR, Travis R. ,  SRINIVASAN, Mukund ,  KADKHODAYAN, Bobby ,  RAMANUJAM, K. Y. ,  MIKIJELJ, Biljana ,  WU, Shanghua

    IPC: H01L21/3065

    CPC classification number: C04B35/593 ,  C04B2235/3206 ,  C04B2235/3418 ,  C04B2235/72 ,  C04B2235/77 ,  H01J37/32467 ,  H01L21/3065

    Abstract: A method of increasing mean time between cleans of a plasma etch chamber and chamber parts lifetimes is provided. Semiconductor substrates are plasma etched in the chamber while using at least one sintered silicon nitride component exposed to ion bombardment and/or ionized halogen gas. The sintered silicon nitride component includes high purity silicon nitride and a sintering aid consisting of silicon dioxide. A plasma processing chamber is provided including the sintered silicon nitride component. A method of reducing metallic contamination on the surface of a silicon substrate during plasma processing is provided with a plasma processing apparatus including one or more sintered silicon nitride components. A method of manufacturing a component exposed to ion bombardment and/or plasma erosion in a plasma etch chamber, comprising shaping a powder composition consisting of high purity silicon nitride and silicon dioxide and densifying the shaped component.

    Abstract translation: 提供了一种增加等离子体蚀刻室清洁之间的平均时间和室部件寿命的方法。 在使用暴露于离子轰击和/或电离卤素气体的至少一种烧结氮化硅组件的同时，半导体衬底在腔室中进行等离子体蚀刻。 烧结氮化硅组分包括高纯度氮化硅和由二氧化硅组成的烧结助剂。 提供了包括烧结氮化硅组分的等离子体处理室。 提供了一种在等离子体处理期间减少硅衬底表面上的金属污染的方法，该等离子体处理装置包括一个或多个烧结氮化硅组分。 一种在等离子体蚀刻室中制造暴露于离子轰击和/或等离子体侵蚀的部件的方法，包括使由高纯度氮化硅和二氧化硅组成的粉末组合物成形并致密化成形部件。

    窒化ケイ素系複合焼結体及びその製造方法
    7.
    发明申请
    窒化ケイ素系複合焼結体及びその製造方法 审中-公开
    基于氮化硅的复合材料烧制产品及其生产方法

    公开(公告)号：WO2002085812A1

    公开(公告)日：2002-10-31

    申请号：PCT/JP2002/003864

    申请日：2002-04-18

    Applicant: 住友電気工業株式会社 ,  吉村 雅司

    Inventor： 吉村 雅司

    IPC: C04B35/596

    CPC classification number: C04B35/58071 ,  B82Y30/00 ,  C04B35/58014 ,  C04B35/58064 ,  C04B35/583 ,  C04B35/584 ,  C04B35/587 ,  C04B35/591 ,  C04B35/593 ,  C04B35/62615 ,  C04B35/62842 ,  C04B35/6303 ,  C04B35/64 ,  C04B2235/3217 ,  C04B2235/3225 ,  C04B2235/3804 ,  C04B2235/3813 ,  C04B2235/3826 ,  C04B2235/3843 ,  C04B2235/3856 ,  C04B2235/386 ,  C04B2235/3873 ,  C04B2235/3886 ,  C04B2235/404 ,  C04B2235/422 ,  C04B2235/425 ,  C04B2235/46 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/5454 ,  C04B2235/549 ,  C04B2235/666 ,  C04B2235/781 ,  C04B2235/80 ,  C04B2235/85 ,  C04B2235/96

    Abstract: A silicon nitride based composite sintered product which comprises silicon nitride, a titanium based compound and boron nitride, or comprises silicon nitride, a titanium based nitride and/or a titanium based carbide, silicon carbide and graphite and/or carbon, and which exhibits a coefficient of friction under a non-lubrication condition of not more than 0.3 or not more than 0.2, respectively, and has an average particle size of 100 nm or less; and a silicon nitride based composite powder for use as the material of the sintered product, which comprises respective primary particles of silicon nitride, titanium nitride, titanium boride and boron nitride having an average particle size of not more than 20 mu m, or respective primary particles of silicon nitride, a titanium based compound and graphite and/or carbon having an average particle size of not more than 30 mu m, and phases including amorphous phases covering above respective primary particles; and a method for preparing the silicon nitride based composite powder which comprises admixing and pulverizing a raw material powder under an acceleration of 10 to 300 G, at room temperature to 250 DEG C, in a nitrogen atmosphere. The silicon nitride based composite sintered product exhibits excellent mechanical properties at a region of room temperature to a middle or low temperature, has a low coefficient of friction, and is excellent in wear resistance.

    Abstract translation: 一种氮化硅基复合烧结产品，其包括氮化硅，钛基化合物和氮化硼，或包括氮化硅，钛基氮化物和/或钛基碳化物，碳化硅和石墨和/或碳，并且其表现出 非润滑条件下的摩擦系数分别为0.3以下且0.2以下，平均粒径为100nm以下， 以及用作烧结产品材料的氮化硅基复合粉末，其包括平均粒度不大于20μm的氮化硅，氮化钛，硼化钛和氮化硼的初级颗粒，或相应的初级颗粒 氮化硅颗粒，钛基化合物和平均粒径不大于30μm的石墨和/或碳，以及包括覆盖在各自一次颗粒上的无定形相的相; 以及制备氮化硅基复合粉末的方法，该方法包括在室温至250℃下在氮气气氛下将原料粉末在10-300G的加速度下混合和粉碎。 氮化硅基复合烧结体在室温至中低温区域表现出优异的机械性能，摩擦系数低，耐磨耗性优异。

    COMPOSITE MATERIAL
    8.
    发明申请
    COMPOSITE MATERIAL 审中-公开
    复合材料

    公开(公告)号：WO0030996A2

    公开(公告)日：2000-06-02

    申请号：PCT/BE9900145

    申请日：1999-11-16

    Applicant: VESUVIUS CRUCIBLE CO ,  VESUVIUS GROUP SA ,  GUILLO PHILIPPE ,  HOGGARD DALE B

    Inventor： GUILLO PHILIPPE ,  HOGGARD DALE B

    IPC: B22D11/06 ,  C04B35/00 ,  C04B35/58 ,  C04B35/581 ,  C04B35/583

    CPC classification number: C04B35/593 ,  B22D11/0657 ,  C04B35/58014 ,  C04B35/58028 ,  C04B35/581 ,  C04B35/583 ,  C04B35/645

    Abstract: The present invention provides a composite pressure-sintered material comprising a continuous phase of hexagonal boron nitride and, dispersed therein, a second material comprising (a) at least one metal nitride selected from the group consisting of silicon, aluminium and titanium nitrides and (b) at least one stable metal oxide; wherein the amount of metal oxide is such that the second material does not contain more than 35% by weight of oxygen. It has been observed that this material possesses a low thermal expansion coefficient and therefore reveals good thermal shock resistance. Another characteristic of this material is its low wettability by molten steel which is thus responsible for excellent chemical resistance to liquid metal. Finally, this material is exceptionally mechanical wear resistant.

    Abstract translation: 本发明提供一种复合压力烧结材料，其包含六方氮化硼的连续相和分散于其中的第二材料，所述第二材料包含（a）至少一种选自硅，铝和氮化钛​​的金属氮化物和（b） ）至少一种稳定的金属氧化物; 其中金属氧化物的量使得第二材料不含超过35重量％的氧。 据观察，这种材料具有低的热膨胀系数，因此显示出良好的抗热震性。 这种材料的另一个特征是其对钢水的低润湿性，因此对液态金属具有优异的耐化学性。 最后，这种材料是非常机械耐磨的。

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