Abstract:
A thin-film device includes a plurality of circuit components defining an operational region of the thin-film device, an unpatterned channel portion (108, 340) disposed on the plurality of circuit components, and a patterned passivation dielectric (380,385) selectively disposed on the unpatterned channel portion (108, 340) to electrically pattern an active region of the unpatterned channel portion (108,340).
Abstract:
A thin-film transistor (10, 10', 10'') includes a substrate (12) having a substantially outwardly protruding support structure (14) formed thereon such that a portion (18, 20) adjacent to the structure (14) is exposed. The support structure (14) has opposed sidewalls (22, 24) sloped at an angle (theta ?1#191, theta ?2#191) relative to the substrate surface (16). A stack (26) is established over the portion (18, 20) and over a portion of an adjacent opposed sidewall (22, 24). The stack (26) includes an insulating layer (30). A channel material (46) is established on at least a portion of the stack (26), thus forming a channel (52) having a length (L) substantially determined by a thickness of the insulating layer (30) in relation to the adjacent opposed sidewall angle ( theta ?1#191, theta ?2#191).
Abstract:
Embodiments of methods, apparatuses, devices, and/or systems for forming a component (100,120) having dielectric sub-layers (108,128) are described.
Abstract:
Embodiments of methods, apparatuses, devices, and/or systems for forming a substrate with one or more conductive features formed above or thereon by depositing at least one material on or above at least a portion of at least one surface of a substrate and processing at least a portion of the at least one material, which may comprise patterning at least a portion of the deposited material and/or selectively removing at least a portion of the deposited material.
Abstract:
A thin-film device includes a plurality of circuit components defining an operational region of the thin-film device, an unpatterned channel portion (108, 340) disposed on the plurality of circuit components, and a patterned passivation dielectric (380,385) selectively disposed on the unpatterned channel portion (108, 340) to electrically pattern an active region of the unpatterned channel portion (108,340).
Abstract:
An exemplary embodiment includes a semiconductor device. The semiconductor device can include a channel (108, 208) including one or more compounds of the formula A x B x O x , wherein each A is selected from the group of Cu, Ag, Sb, each B is selected from the group of Cu, Ag, Sb, Zn, Cd, Ga, In, Ge, Sn, and Pb, each O is atomic oxygen, each x is independently a non-zero integer, and each of A and B are different.
Abstract:
A method of forming a fuel cell electrode includes providing a substrate (130) and at least one deposition device (110), developing a deposition characteristic profile having at least one porous layer based on pre-determined desired electrode properties, forming a film in accordance with the deposition characteristic profile by sputtering material from the deposition device (110) while varying a relative position of the substrate (130) in relation to the deposition device (110) with respect to at least a first axis.
Abstract:
One exemplary embodiment includes a semiconductor device. The semiconductor device can include a channel including one or more compounds of the formula A x B x O x , wherein each A is selected from the group of Ga, In, each B is selected from the group of Ge, Sn, Pb, each O is atomic oxygen, each x is independently a non-zero integer, and each of A and B are different.
Abstract:
A self-assembled photonic crystal (60, 70, or 80) is formed using a template made by nano-imprint lithography. A layer of imprintable material is deposited (S20) on a substrate, a pattern is imprinted (S30) in the imprintable material to form a template (110) (the pattern of the template being adapted to substantially constrain colloidal particles to a predetermined crystallographic lattice), and colloidal particles (30) are introduced (S40) onto the template, substantially filling the predetermined lattice.